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    • 2. 发明授权
    • Low voltage trigger and save area electrostatic discharge device
    • 低电压触发和保存区域静电放电装置
    • US07265422B2
    • 2007-09-04
    • US11215492
    • 2005-08-29
    • Talee YuChi Kang Liu
    • Talee YuChi Kang Liu
    • H01L23/62
    • H01L27/0259
    • Techniques for ESD protection are provided. An ESD protection device includes a first well region and a second well region disposed in a semiconductor substrate, with an isolation region therebetween. N+ implant regions are disposed in the second well region and are coupled in common at a first node. NLDD regions are disposed between the N+ implant regions, and pocket implants underlie each of the NLDD regions. Current discharge paths are defined by corresponding NLDD regions and pocket implants when a voltage of the first node exceeds a breakdown voltage. In a specific embodiment, the breakdown voltage is less than a breakdown voltage for a logic gate oxide.
    • 提供ESD保护技术。 ESD保护装置包括设置在半导体衬底中的第一阱区和第二阱区,其间具有隔离区。 N +注入区域设置在第二阱区域中并且在第一节点处共同耦合。 NLDD区域设置在N +植入区域之间,并且口袋植入物构成每个NLDD区域的基础。 当第一节点的电压超过击穿电压时,当前的放电路径由相应的NLDD区域和口袋植入物限定。 在具体实施例中,击穿电压小于逻辑栅极氧化物的击穿电压。
    • 4. 发明申请
    • INTEGRATED ELECTROSTATIC DISCHARGE (ESD) DEVICE
    • 集成静电放电(ESD)器件
    • US20100027172A1
    • 2010-02-04
    • US12483195
    • 2009-06-11
    • Chi Kang LiuTa Lee YuQuan Li
    • Chi Kang LiuTa Lee YuQuan Li
    • H02H9/04H01L29/739H01L21/331
    • H01L27/0259H01L29/7835
    • A semiconductor device for ESD protection includes a semiconductor substrate of a first conductivity type and a well region of a second conductivity type formed within the substrate. The well region is characterized by a first depth. The device includes an MOS transistor, a first bipolar transistor, and a second bipolar transistor. The MOS transistor includes a first lightly doped drain (LDD) region of a second depth within the well region, and a drain region and an emitter region within in the first LDD region. The emitter region is characterized by a second conductivity type. The first bipolar transistor is associated with the emitter region, the first LDD region, and the well region, and is characterized by a first trigger voltage. The second bipolar transistor is associated with the first LDD region, the well region, and the substrate, and is characterized by a second trigger voltage.
    • 用于ESD保护的半导体器件包括形成在衬底内的第一导电类型的半导体衬底和第二导电类型的阱区。 井区的特征在于第一深度。 该器件包括MOS晶体管,第一双极晶体管和第二双极晶体管。 MOS晶体管包括在阱区内的第二深度的第一轻掺杂漏极(LDD)区域,以及在第一LDD区域内的漏极区域和发射极区域。 发射极区域的特征在于第二导电类型。 第一双极晶体管与发射极区域,第一LDD区域和阱区域相关联,并且其特征在于第一触发电压。 第二双极晶体管与第一LDD区,阱区和衬底相关联,并且其特征在于第二触发电压。
    • 7. 发明授权
    • LCD panel driving circuit having transition slope adjusting means and associated control method
    • LCD面板驱动电路具有过渡斜率调整装置和相关控制方法
    • US08525822B2
    • 2013-09-03
    • US12769901
    • 2010-04-29
    • Chi Kang LiuChin-Wei LinMin-Nan Hsieh
    • Chi Kang LiuChin-Wei LinMin-Nan Hsieh
    • G06F3/038G09G5/00
    • G09G3/3688G09G2330/06
    • A driving circuit on a liquid crystal display (LCD) panel and associated control method is provided. The LCD panel connected to a display control circuit via a flexible print circuit (FPC) includes a master source driver, for inputting a digital image signal in compliance with a first electrical specification via an FPC board and converting the digital image signal to a gate driving signal and a slave source driving signal, which are in compliance with a second electrical specification; a gate driver, for receiving the gate driving signal in compliance with the second electrical specification; and a slave source driver, for receiving the slave source driving signal in compliance with the second electrical specification. The master source driver, the slave source driver and the gate driver drive a thin-film transistor (TFT) on the LCD panel.
    • 提供了液晶显示器(LCD)面板上的驱动电路和相关的控制方法。 通过柔性印刷电路(FPC)连接到显示控制电路的LCD面板包括主源驱动器,用于经由FPC板输入符合第一电气规格的数字图像信号,并将数字图像信号转换为栅极驱动 信号和从源驱动信号,其符合第二电气规范; 门驱动器,用于接收符合第二电气规范的门驱动信号; 和从源驱动器,用于接收符合第二电气规范的从源驱动信号。 主源驱动器,从源驱动器和栅极驱动器驱动LCD面板上的薄膜晶体管(TFT)。
    • 8. 发明授权
    • Device and methods for electrostatic discharge protection
    • 静电放电保护装置及方法
    • US08368186B2
    • 2013-02-05
    • US13076269
    • 2011-03-30
    • Ta Lee YuChi Kang LiuJing Liu
    • Ta Lee YuChi Kang LiuJing Liu
    • H01L23/552
    • H01L27/0255H01L24/05H01L2924/12036H01L2924/13034H01L2924/14H01L2924/00
    • An ESD device includes a first and second well regions disposed in a semiconductor substrate. The first well region comprises a plurality of N wells spaced at a predetermined length. A heavily doped P+ region and a heavily doped N+ region are disposed in each of the N wells. The heavily doped N+ region is coupled to Vdd and a heavily doped P+ region in an N well is electrically coupled to the heavily doped N+ region in an adjacent N well. The second well region comprises a P well abutting an N well. A heavily doped P+ region and a heavily doped N+ region are disposed in the P well. The heavily doped N+ region in the P well is electrically coupled to the heavily doped P+ region of the adjacent N well in common with an I/O circuit, and the heavily doped P+ region is coupled to Vss.
    • ESD器件包括设置在半导体衬底中的第一和第二阱区。 第一阱区域包括以预定长度间隔开的多个N阱。 重掺杂的P +区域和重掺杂的N +区域设置在每个N个阱中。 重掺杂N +区域耦合到Vdd,并且N阱中的重掺杂P +区域电耦合到相邻N阱中的重掺杂N +区域。 第二井区域包括邻接N井的P井。 在P阱中设置重掺杂P +区和重掺杂N +区。 P阱中的重掺杂N +区域与I / O电路共同地电耦合到相邻N阱的重掺杂P +区域,并且重掺杂P +区域耦合到Vss。
    • 9. 发明申请
    • DEVICE AND METHODS FOR ELECTROSTATIC DISCHARGE PROTECTION
    • 静电放电保护装置及方法
    • US20120074539A1
    • 2012-03-29
    • US13076269
    • 2011-03-30
    • Ta Lee YuChi Kang LiuJing Liu
    • Ta Lee YuChi Kang LiuJing Liu
    • H01L23/552
    • H01L27/0255H01L24/05H01L2924/12036H01L2924/13034H01L2924/14H01L2924/00
    • An ESD device includes a first and second well regions disposed in a semiconductor substrate. The first well region comprises a plurality of N wells spaced at a predetermined length. A heavily doped P+ region and a heavily doped N+ region are disposed in each of the N wells. The heavily doped N+ region is coupled to Vdd and a heavily doped P+ region in an N well is electrically coupled to the heavily doped N+ region in an adjacent N well. The second well region comprises a P well abutting an N well. A heavily doped P+ region and a heavily doped N+ region are disposed in the P well. The heavily doped N+ region in the P well is electrically coupled to the heavily doped P+ region of the adjacent N well in common with an I/O circuit, and the heavily doped P+ region is coupled to Vss.
    • ESD器件包括设置在半导体衬底中的第一和第二阱区。 第一阱区域包括以预定长度间隔开的多个N阱。 重掺杂的P +区域和重掺杂的N +区域设置在每个N个阱中。 重掺杂N +区域耦合到Vdd,并且N阱中的重掺杂P +区域电耦合到相邻N阱中的重掺杂N +区域。 第二井区域包括邻接N井的P井。 在P阱中设置重掺杂P +区和重掺杂N +区。 P阱中的重掺杂N +区域与I / O电路共同地电耦合到相邻N阱的重掺杂P +区域,并且重掺杂P +区域耦合到Vss。
    • 10. 发明授权
    • Integrated electrostatic discharge (ESD) device
    • 集成静电放电(ESD)器件
    • US08891213B2
    • 2014-11-18
    • US13244292
    • 2011-09-24
    • Chi Kang LiuTa Lee YuQuan Li
    • Chi Kang LiuTa Lee YuQuan Li
    • H02H9/00H01L27/02H01L29/78H02H3/22H02H3/02H02H3/08
    • H01L27/0259H01L29/7835
    • A semiconductor device for ESD protection includes a semiconductor substrate of a first conductivity type and a well region of a second conductivity type formed within the substrate. The well region is characterized by a first depth. The device includes an MOS transistor, a first bipolar transistor, and a second bipolar transistor. The MOS transistor includes a first lightly doped drain (LDD) region of a second depth within the well region, and a drain region and an emitter region within in the first LDD region. The emitter region is characterized by a second conductivity type. The first bipolar transistor is associated with the emitter region, the first LDD region, and the well region, and is characterized by a first trigger voltage. The second bipolar transistor is associated with the first LDD region, the well region, and the substrate, and is characterized by a second trigger voltage.
    • 用于ESD保护的半导体器件包括形成在衬底内的第一导电类型的半导体衬底和第二导电类型的阱区。 井区的特征在于第一深度。 该器件包括MOS晶体管,第一双极晶体管和第二双极晶体管。 MOS晶体管包括在阱区内的第二深度的第一轻掺杂漏极(LDD)区域,以及在第一LDD区域内的漏极区域和发射极区域。 发射极区域的特征在于第二导电类型。 第一双极晶体管与发射极区域,第一LDD区域和阱区域相关联,并且其特征在于第一触发电压。 第二双极晶体管与第一LDD区,阱区和衬底相关联,并且其特征在于第二触发电压。