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    • 7. 发明授权
    • Method for fabricating solar cells
    • 制造太阳能电池的方法
    • US06277667B1
    • 2001-08-21
    • US09391257
    • 1999-09-07
    • Chorng-Jye HuangCheng-Ting ChenChien-sheng HuangLee-Ching Kuo
    • Chorng-Jye HuangCheng-Ting ChenChien-sheng HuangLee-Ching Kuo
    • H01L2100
    • H01L31/022425H01L31/18Y02E10/50
    • This invention discloses a novel method for fabricating solar cells. Using the existing screen-printing, masking or photolithography techniques, a P-type or N-type diffusion source is coated on the sites of an N-type or P-type silicon wafer desired for forming electrodes. Then, a low dose P-type or N-type diffusion source is in situ diffused into the N-type or P-type silicon wafer together with the P-type or N-type diffusion source coated on the N-type or P-type silicon wafer in the furnace. Thereafter, a P−/P+ or N−/N+ diffusion region is formed within the N-type or P-type silicon wafer. Finally, electrodes aligned to the P+ or N+ diffusion region are formed by means of screen-printing. Then, a solar cell with high photocurrent and low series resistance can be obtained.
    • 本发明公开了一种制造太阳能电池的新方法。 使用现有的丝网印刷,掩模或光刻技术,在形成电极所需的N型或P型硅晶片的位置上涂覆P型或N型扩散源。 然后,将低剂量P型或N型扩散源原位扩散到N型或P型硅晶片以及涂覆在N型或P-型硅晶片上的P型或N型扩散源, 在炉中形成硅晶片。 此后,在N型或P型硅晶片内形成P- / P +或N- / N +扩散区。 最后,通过丝网印刷形成与P +或N +扩散区对准的电极。 然后,可以获得具有高光电流和低串联电阻的太阳能电池。