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    • 3. 发明授权
    • Photoconductive imaging members
    • 光导成像构件
    • US06495300B1
    • 2002-12-17
    • US09895453
    • 2001-07-02
    • Yu QiBeng S. OngCheng-Kuo HsiaoPing LiuHuoy-Jen YuhJohn S. ChambersHelen R. Cherniack
    • Yu QiBeng S. OngCheng-Kuo HsiaoPing LiuHuoy-Jen YuhJohn S. ChambersHelen R. Cherniack
    • G03G5047
    • G03G5/14704G03G5/14734G03G5/14739G03G5/14773G03G5/14786
    • A photoconductive imaging member containing an optional supporting substrate, a photogenerating layer, a charge transport layer, and an overcoating layer comprised of a crosslinked composite polysiloxane-silica generated from the reaction of a silyl-functionalized hydroxyalkyl polymer of Formula (I) with an organosilane of Formula (II) in the presence of silica particles and water wherein A, B, D, and F represent the segments of the polymer backbone; E is a hole transporting moiety; X is selected from the group consisting of halide, cyano, alkoxy, acyloxy, and aryloxy; a, b, c, and d each represent mole fractions of the repeating monomer units such that the sum of a+b+c+d is equal to about 1; R is alkyl, substituted alkyl, aryl, or substituted aryl, and R1, R2, and R3 are independently selected from the group consisting of alkyl, aryl, alkoxy, aryloxy, acyloxy, halide, cyano, and amino, subject to the provision that two of R1, R2, and R3 are each independently selected from the group consisting of alkoxy, aryloxy, acyloxy, and halide.
    • 含有任选的支撑基底,光生成层,电荷输送层和外涂层的光导成像构件,其由通式(I)的甲硅烷基官能化羟烷基聚合物与有机硅烷反应生成的交联复合聚硅氧烷 - 二氧化硅 在二氧化硅颗粒和水的存在下,式(II)中,A,B,D和F表示聚合物主链的链段; E是空穴传输部分; X选自卤素,氰基,烷氧基,酰氧基和芳氧基; a,b,c和d各自表示重复单体单元的摩尔分数,使得a + b + c + d的和等于约1; R是烷基,取代的烷基,芳基或取代的芳基,并且R 1,R 2和R 3独立地选自烷基,芳基,烷氧基,芳氧基,酰氧基,卤素,氰基和氨基,条件是 R 1,R 2和R 3中的两个各自独立地选自烷氧基,芳氧基,酰氧基和卤化物。
    • 6. 发明授权
    • Photoconductive imaging members
    • 光导成像构件
    • US06287737B1
    • 2001-09-11
    • US09579491
    • 2000-05-30
    • Beng S. OngPing LiuCheng-Kuo HsiaoHuoy-Jen YuhJohn S. ChambersDamodar M. PaiMarkus R. SilvestriKathleen M. Carmichael
    • Beng S. OngPing LiuCheng-Kuo HsiaoHuoy-Jen YuhJohn S. ChambersDamodar M. PaiMarkus R. SilvestriKathleen M. Carmichael
    • G03G5047
    • G03G5/05G03G5/047G03G5/0542G03G5/0589G03G5/142
    • A photoconductive imaging member comprised of a supporting substrate, a hole blocking layer thereover, a photogenerating layer and a charge transport layer, and wherein the hole blocking layer is comprised of a crosslinked polymer derived from the reaction of a silyl-functionalized hydroxyalkyl polymer of Formula (I) with an organosilane of Formula (II) and water wherein A, B, D, and F represent the segments of the polymer backbone; E is an electron transporting moiety; X is selected from the group consisting of halide, cyano, alkoxy, acyloxy, and aryloxy; a, b, c, and d are mole fractions of the repeating monomer units such that the sum of a+b+c+d is equal to 1; R is alkyl, substituted alkyl, aryl, or substituted aryl; and R1, R2, and R3 are independently selected from the group consisting of alkyl, aryl, alkoxy, aryloxy, acyloxy, halogen, cyano, and amino, subject to the provision that two of R1, R2, and R3 are independently selected from the group consisting of alkoxy, aryloxy, acyloxy, and halide.
    • 一种感光成像构件,包括支撑衬底,其上的空穴阻挡层,光生代层和电荷输送层,并且其中空穴阻挡层由衍生自式(I)的甲硅烷基官能化羟烷基聚合物的交联聚合物组成, (I)与式(II)的有机硅烷和水,其中A,B,D和F表示聚合物主链的链段; E是电子传输部分; X选自卤素,氰基,烷氧基,酰氧基和芳氧基; a,b,c和d是重复单体单元的摩尔分数,使得+ b + c + d的和等于1; R是烷基,取代的烷基,芳基或取代的芳基; 并且R 1,R 2和R 3独立地选自烷基,芳基,烷氧基,芳氧基,酰氧基,卤素,氰基和氨基,条件是R 1,R 2和R 3中的两个独立地选自 烷氧基,芳氧基,酰氧基和卤化物组成的组。
    • 7. 发明授权
    • Undercoating layer for imaging member
    • 成像构件的底漆层
    • US06277535B1
    • 2001-08-21
    • US09549612
    • 2000-04-14
    • Ping LiuYu QiBeng S. OngCheng-Kuo HsiaoHelen R. CherniackHuoy-Jen Yuh
    • Ping LiuYu QiBeng S. OngCheng-Kuo HsiaoHelen R. CherniackHuoy-Jen Yuh
    • G03G514
    • G03G5/142
    • An electrophotographic imaging member includes a supporting substrate, an undercoating layer, an optional adhesive layer, a photogenerating layer, and a charge transporting layer. The undercoating layer is derived from the reaction of a silyl-functionalyzed polymer (III) with a silane coupling agent (I) and an optional silane coupling agent (II): (RO)3Si—A—Si(OR)3  (I) where R is alkyl, substituted alkyl, aryl, or substituted aryl, acyl, and the like; A is selected from alkylene, arylene, and alkylenearyl; X is alkyl, substituted alkyl, aryl, or substituted aryl; R1, R2, and R3 are independently selected from alkyl aryl, alkoxy, aryloxy, acyloxy, halide, cyano, amino, and the like; R4, R5, and R6 are hydrogen and alkyl; Z is selected from chloride, bromide, iodine, cyano, alkoxy, and acyloxy; B is preferably selected from halide, cyano, aryl, alkoxycarbonyl, aryloxycarbonyl and the like; D and E are preferably selected from alkyleneoxycarbonyl, arylene, alkylenearyl, aryleneoxycarbonyl, and alkylenearyloxycarbonyl; a, b, and c are the mole fractions of the repeating units of the polymer such that a+b+c=1.
    • 电子照相成像构件包括支撑基底,底涂层,任选的粘合剂层,光生成层和电荷输送层。 底涂层衍生自甲硅烷基官能化聚合物(III)与硅烷偶联剂(I)和任选的硅烷偶联剂(II)的反应:其中R是烷基,取代的烷基,芳基或取代的芳基,酰基 ,等等; A选自亚烷基,亚芳基和亚烷基硬脂基; X是烷基,取代的烷基,芳基或取代的芳基; R 1,R 2和R 3独立地选自烷基芳基,烷氧基,芳氧基,酰氧基,卤素,氰基,氨基等; R4,R5和R6是氢和烷基; Z选自氯化物,溴化物,碘,氰基,烷氧基和酰氧基; B优选选自卤素,氰基,芳基,烷氧基羰基,芳氧基羰基等; D和E优选选自亚烷基氧基羰基,亚芳基,亚烷基硬脂基,亚芳基氧基羰基和亚烷基氧基羰基; a,b和c是聚合物的重复单元的摩尔分数,使得+ b + c = 1。