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    • 7. 发明授权
    • Reduced area intersection between electrode and programming element
    • 电极与编程元件之间的减少交点
    • US06673700B2
    • 2004-01-06
    • US09895020
    • 2001-06-30
    • Charles H. DennisonGuy C. WickerTyler A. LowreyStephen J. HudgensChien ChiangDaniel Xu
    • Charles H. DennisonGuy C. WickerTyler A. LowreyStephen J. HudgensChien ChiangDaniel Xu
    • H01L21326
    • H01L27/2463G11C13/0004H01L27/2409H01L45/06H01L45/1233H01L45/126H01L45/144H01L45/16
    • A method comprising forming a sacrificial layer over less than the entire portion of a contact area on a substrate, the sacrificial layer having a thickness defining an edge over the contact area, forming a spacer layer over the spacer, the spacer layer conforming to the shape of the first sacrificial layer such that the spacer layer comprises an edge portion over the contact area adjacent the first sacrificial layer edge, removing the sacrificial layer, while retaining the edge portion of the spacer layer over the contact area, forming a dielectric layer over the contact area, removing the edge portion, and forming a programmable material to the contact area formerly occupied by the edge portion. An apparatus comprising a volume of programmable material, a conductor, and an electrode disposed between the volume of programmable material and the conductor, the electrode having a contact area at one end coupled to the volume of programmable material, wherein the contact area is less than the surface area at the one end.
    • 一种方法,包括在小于衬底上的接触区域的整个部分上形成牺牲层,所述牺牲层具有限定在所述接触区域上的边缘的厚度,在所述间隔物上形成间隔层,所述隔离层符合形状 的第一牺牲层,使得间隔层包括邻近第一牺牲层边缘的接触区域上的边缘部分,去除牺牲层,同时将间隔物层的边缘部分保持在接触区域上方,形成介于第 接触区域,去除边缘部分,并且将可编程材料形成到以前由边缘部分占据的接触区域。 一种包括可编程材料体积,导体和设置在所述可编程材料体积与所述导体之间的电极的装置,所述电极在一端与所述可编程材料的体积相连接的接触区域,其中所述接触面积小于 一端的表面积。