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    • 1. 发明授权
    • Method for producing color filters
    • 滤色片生产方法
    • US5631111A
    • 1997-05-20
    • US588962
    • 1996-01-19
    • Chao-Wen NiuHsien-Kuang LinHua-Chi ChengPao-Ju Hsieh
    • Chao-Wen NiuHsien-Kuang LinHua-Chi ChengPao-Ju Hsieh
    • C25D13/12G02B5/20
    • G02B5/201C25D13/12
    • An improved method is disclosed for making color filters via electrodeposition or lithographic electrodeposition of a plurality of colored resins onto an electrically conductive substrate. The method comprises the steps of: (a) forming a black-hued pattern on the substrate; (b) dividing the substrate into an intended zone and a conjugate zone, the intended zone being portions of the substrate to be deposited with the colored resins and the conjugate zone being portions of the substrate not to be deposited with the colored resins; (c) forming a permanent insulation film on the conjugate zone of the substrate; and (d) electrodepositing the colored resins onto the intended zone of the substrate. The photosensitive insulation resin is preferably a negative photosensitive resin containing: (i) a resin binder containing a carboxyl (COOH) group; (ii) 1-15 wt %, based on the weight of the resin binder, of a photopolymerization initiator; and (iii) 30-100 wt %, based on the weight of the resin binder, of a photo-reactive monomer or oligomer each containing at least two unsaturated double bonds.
    • 公开了一种改进的方法,用于通过多个着色树脂的电沉积或平版印刷电沉积制成彩色滤光片到导电基底上。 该方法包括以下步骤:(a)在衬底上形成黑色样式; (b)将基材分成预期区域和共轭区域,预期区域是要沉积着色树脂的基材的部分,共轭区域是不沉积着色树脂的基材的部分; (c)在所述基板的共轭区上形成永久绝缘膜; 和(d)将着色树脂电沉积到基底的预期区域上。 感光性绝缘树脂优选为负型感光性树脂,其含有:(i)含有羧基(COOH)基团的树脂粘合剂; (ii)基于树脂粘合剂的重量为1-15重量%的光聚合引发剂; 和(iii)30-100重量%,基于树脂粘合剂的重量,每个含有至少两个不饱和双键的光反应性单体或低聚物。
    • 2. 发明授权
    • Manufacture of color filters by incremental exposure method
    • 通过增量曝光法制造滤色片
    • US5641595A
    • 1997-06-24
    • US591201
    • 1996-01-16
    • Pao-Ju HsiehHsien-Kuang LinJim-Chyuan ShiehChao-Wen NiuChao-Huei TsengHwa-Chi Cheng
    • Pao-Ju HsiehHsien-Kuang LinJim-Chyuan ShiehChao-Wen NiuChao-Huei TsengHwa-Chi Cheng
    • G03F7/00G03F7/20G03F9/00
    • G03F7/0007G03F7/2022
    • A method for making color filters containing a color matrix with at least three desired colored layers comprising the steps of: (a) forming a positive energy-accumulable photoresist layer on a transparent electrically conductive substrate; (b) pre-conditioning the energy-accumulable photoresist layer to form at least three regions of different initial levels of exposure energy, from a highest to a lowest; (c) using a developer solution to develop and remove the region of the photoresist layer with the highest level of initial exposure energy to thereby cause a corresponding area of the electrically conductive substrate underlying the photoresist to be uncovered; (d) electrodepositing a photo-curable resin of a desired color and a predetermined exposure energy required for curing onto the uncovered area of the substrate; (e) overall-exposing the photoresist layer to a light source so as to impart an incremental exposure energy to all regions of the photoresist layer; (f) using a developer solution to develop and remove the region of the photoresist layer which has accumulatively attained the full exposure energy in step (e) and uncover a corresponding area on the substrate; (g) electrodepositing a photo-curable resin of another desired color onto the uncovered area of the substrate formed in step (f); and (h) repeating steps (e) through (g) until all the desired colored layers are selectively developed on the substrate. The incremental exposure energy is provided in step (e) such that: (i) it enables a region with a next highest initial exposure energy to attain full exposure energy, and (ii) it equals to or exceeds the exposure energy required for curing the photo-curable resin to thereby, at the same time, cause the photo-curable resin to become hardened.
    • 一种制备包含具有至少三个所需着色层的彩色矩阵的滤色器的方法,包括以下步骤:(a)在透明导电基底上形成正的可蓄积的光致抗蚀剂层; (b)预处理能量可聚合的光致抗蚀剂层,以形成从最高到最低的不同初始曝光能量的至少三个区域; (c)使用显影剂溶液以最高水平的初始曝光能量显影和去除光致抗蚀剂层的区域,从而使得光致抗蚀剂下面的导电基材的相应区域不被覆盖; (d)将所需颜色的光固化树脂和固化所需的预定曝光能量电沉积到基底的未覆盖区域上; (e)将光致抗蚀剂层全部曝光到光源,以便赋予光致抗蚀剂层的所有区域增加的曝光能量; (f)使用显影剂溶液来显影和去除在步骤(e)中累积获得完全曝光能量的光致抗蚀剂层的区域,并且露出基板上相应的区域; (g)将另一所需颜色的光固化树脂电沉积到在步骤(f)中形成的衬底的未覆盖区域上; 和(h)重复步骤(e)至(g),直到所有所需的着色层在衬底上选择性地显影。 在步骤(e)中提供增量曝光能量,使得:(i)它能够使具有下一个最高初始曝光能量的区域获得完全的曝光能量,和(ii)它等于或超过固化所需的曝光能量 光固化树脂,从而同时使光固化树脂变硬。
    • 3. 发明授权
    • Weak base developable positive photoresist composition containing
quinonediazide compound
    • 含有醌二叠氮化合物的弱碱显影性正性光致抗蚀剂组合物
    • US5645970A
    • 1997-07-08
    • US547753
    • 1995-10-25
    • Hua-Chi ChengChao H. TsengPao-Ju Hsieh
    • Hua-Chi ChengChao H. TsengPao-Ju Hsieh
    • C08G8/04G03F7/023
    • C08G8/04G03F7/0236
    • A positive photoresist composition is disclosed which comprises a photosensitive compound, a phenolic resin, and an organic solvent. The phenolic resin is prepared from a monomeric composition comprises formaldehyde and a mixture of phenol monomers. The mixture of phenol monomers comprises: (a) no more than 98 mole percent of a mixture of monohydroxy phenols, the mixture of monohydroxy phenols comprises: (I) about 50.about.80 mole percent of meta-methylphenol; (ii) about 10.about.30 mole percent of 2,5-dimethylphenol; and (iii) about 10.about.40 mole percent of 2,3,5-trimethylphenol; and (b) at least 2 mol percent of at least one polyhydroxybenzene which is presented by the following formula: ##STR1## wherein n is an integer of 1 or 2. Preferably, the polyhydroxybenzene is a mixture of trihydroxybenzene and dihydroxybenzene in a molar ratio of about 40 to 60. The photoresist composition can be developed using a weak basic solution which causes images of sharp contrast to be developed; it can also be advantageously used in making color filters for use in color liquid crystal displays in a multiple development process in conjunction with an electrodeposition lithography.
    • 公开了一种正型光致抗蚀剂组合物,其包含光敏化合物,酚醛树脂和有机溶剂。 酚醛树脂由包含甲醛和苯酚单体的混合物的单体组合物制备。 苯酚单体的混合物包括:(a)不超过98摩尔%的单羟基酚的混合物,单羟基酚的混合物包含:(I)约50摩尔%的间甲基苯酚; (ii)约10%(重量)的30摩尔%的2,5-二甲基苯酚; 和(iii)约10%差异的40摩尔%的2,3,5-三甲基苯酚; 和(b)至少2mol%的由下式表示的至少一种多羟基苯:其中n是1或2的整数。优选地,多羟基苯是三羟基苯和二羟基苯的摩尔比的混合物 约40至60.光致抗蚀剂组合物可以使用弱碱性溶液显影,这导致形成鲜明对比度的图像; 在电沉积光刻中,也可以有利地用于在多重显影工艺中制造用于彩色液晶显示器的滤色器。
    • 4. 发明授权
    • Methods for manufacturing color filters
    • 彩色滤光片制造方法
    • US6110625A
    • 2000-08-29
    • US248375
    • 1999-02-10
    • Chun-Hsiang WenShu-Huei ChengHua-Chi ChengYaw-Ting WuMing-Shiang JanPao-Ju HsiehJun-Ichi YasukawaHajime Kuwahara
    • Chun-Hsiang WenShu-Huei ChengHua-Chi ChengYaw-Ting WuMing-Shiang JanPao-Ju HsiehJun-Ichi YasukawaHajime Kuwahara
    • G02B5/20G02F1/1335
    • G02B5/201
    • The invention relates to a method for manufacturing color filters utilizing a color electrodeposition coating which contains an anionic electrodeposition resin having a low acid value. Said method comprises coating a layer of positive photoresist onto a transparent electrically conductive substrate, exposing the substrate under a photomask or photomasks to form regions of different initial levels of exposure energy, exposing the entire surface of the substrate through an energy-incrementing way to, progressively, allow all regions of the substrate to achieve an energy sufficient to completely expose the photoresist on each corresponding region, developing stepwise each region with a same developer solution to cause the electrically conductive substrate of the corresponding region uncovered, electrodepositing said region with a color electrodeposition coating containing an anionic electrodeposition resin having a low acid value to finish the pixel arrangements of the desired colors and completely exposing the substrate. The low acid value anionic electrodeposition resin utilized in the invention has an acid value of 1 to 70 mg KOH/g. The method of the invention shows the advantages of having a high degree of freedom in pattern figures and a wide process window. Moreover, the manufacture color filters of large surface and the perfect yield rate of products are possible.
    • 本发明涉及一种使用含有酸度低的阴离子电沉积树脂的彩色电沉积涂料制造滤色器的方法。 所述方法包括将一层正性光致抗蚀剂涂覆在透明导电基板上,将光刻掩模或光掩模下的基板曝光以形成不同初始曝光能量的区域,通过能量递增方式暴露基板的整个表面, 逐渐地允许衬底的所有区域实现足以完全暴露每个对应区域上的光致抗蚀剂的能量,用相同的显影剂溶液逐步展开每个区域以使对应区域的导电衬底未被覆盖,用颜色电沉积所述区域 电沉积涂层含有具有低酸值的阴离子电沉积树脂以完成所需颜色的像素排列并完全曝光基底。 本发明中使用的低酸值阴离子电沉积树脂的酸值为1至70mg KOH / g。 本发明的方法显示了在图案图形和宽的工艺窗口中具有高自由度的优点。 此外,制造大面积的滤色片和产品的完美产率是可能的。
    • 6. 发明授权
    • Method for broadening bandwidth of cholesteric liquid crystal
    • 胆甾型液晶带宽扩大的方法
    • US06669999B2
    • 2003-12-30
    • US09871397
    • 2001-05-30
    • Pao-Ju HsiehHui-Lung Kuo
    • Pao-Ju HsiehHui-Lung Kuo
    • C09K1900
    • C09K19/38C09K19/3068C09K2019/0448G02B5/3016Y10T428/1036
    • A method for making broadband cholesteric liquid crystals with improved bandwidth. The method includes the main steps of: (a) preparing a polymerization mixture containing first and second chiral liquid crystals, wherein the first chiral liquid crystal possesses a cholesteric liquid crystal phase and the second chiral liquid crystal possesses a helix-inversion characteristic, and at least one of the first or second chiral liquid crystals contains a polymerizable functional group; and (b) subjecting the polymerization mixture to a polymerization reaction, wherein the polymerization reaction is conducted such that the first chiral liquid crystal will go through a helix-inversion phenomenon. In a preferred embodiment, the second chiral liquid crystal has a temperature-dependent helicity which exhibits a helix inversion characteristic at a helix inversion temperature.
    • 制造带宽提高的宽带胆甾型液晶的方法。 该方法包括以下主要步骤:(a)制备含有第一和第二手性液晶的聚合混合物,其中第一手性液晶具有胆甾型液晶相,第二手性液晶具有螺旋反转特性, 第一或第二手性液晶中的至少一个含有可聚合官能团; 和(b)使聚合混合物进行聚合反应,其中进行聚合反应,使得第一手性液晶将经历螺旋反转现象。 在优选的实施方案中,第二手性液晶具有在螺旋反转温度下呈现螺旋反转特性的温度依赖性螺旋度。