会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 5. 发明申请
    • WIRELESS LOCALIZATION METHOD BASED ON AN EFFICIENT MULTILATERATION ALGORITHM OVER A WIRELESS SENSOR NETWORK AND A RECORDING MEDIUM IN WHICH A PROGRAM FOR THE METHOD IS RECORDED
    • 基于无线传感器网络的有效多路由算法的无线本地化方法和记录方法的程序的记录介质
    • US20130045750A1
    • 2013-02-21
    • US13337653
    • 2011-12-27
    • Seong Cheol KIMJung Kyu LEE
    • Seong Cheol KIMJung Kyu LEE
    • H04W64/00
    • G01S5/14G01S5/0289G01S11/06
    • A wireless localization technology using efficient multilateration in a wireless sensor network is disclosed. After calculating estimated distances from each of at least three reference nodes to a blind node using received signal strength of wireless signals that the at least three reference nodes received from the blind node, the estimated location of the blind node is obtained through multilateration using the calculated estimated distances. To correct error in the estimated location, the estimated distances are used, and the error correction direction and error correction distance for the estimated location are calculated by applying a largest weight to the reference node closest to the estimated location. The error of the estimated location is corrected by move the estimated location of the blind node by the calculated error correction direction and error correction distance. Calculation for the error correction is very simple and fast.
    • 公开了一种在无线传感器网络中使用高效多边测量的无线定位技术。 在使用从盲节点接收到的至少三个参考节点的无线信号的接收信号强度来计算从至少三个参考节点中的每一个到盲节点的估计距离之后,通过使用计算出的 估计距离 为了校正估计位置的误差,使用估计的距离,并且通过对最靠近估计位置的参考节点应用最大权重来计算估计位置的误差校正方向和误差校正距离。 通过将计算的误差校正方向和误差校正距离移动盲节点的估计位置来校正估计位置的误差。 纠错的计算非常简单快捷。
    • 7. 发明申请
    • METHOD FOR FABRICATING VIA HOLE AND THROUGH-SILICON VIA
    • 通过孔和通过硅制造的方法
    • US20120129341A1
    • 2012-05-24
    • US13187845
    • 2011-07-21
    • Seung Hee JOSeong Cheol KIM
    • Seung Hee JOSeong Cheol KIM
    • H01L21/28H01L21/311
    • H01L21/76898H01L23/481H01L2924/0002H01L2924/00
    • A method for fabricating a via hole includes forming a first mask pattern on a first surface of a wafer exposing a portion of the first surface of the wafer, forming a passivation region within the wafer by implanting impurities into the exposed portion of the wafer using the first mask pattern as an ion implantation barrier layer, forming an etching stop layer on the first surface of the wafer including the passivation regions, forming a second mask pattern on a second surface of the wafer faces away from the first surface of the wafer, wherein the second mask pattern exposes a portion of the second surface of the wafer over an area between the passivation regions, and forming a via hole by etching the wafer using the second mask pattern as an etching mask.
    • 一种用于制造通孔的方法包括在晶片的第一表面上形成第一掩模图案,该第一表面露出晶片的第一表面的一部分,通过将晶体中的杂质注入到晶片的暴露部分中,通过使用 第一掩模图案作为离子注入阻挡层,在包括钝化区的晶片的第一表面上形成蚀刻停止层,在晶片的第二表面上形成第二掩模图案,远离晶片的第一表面,其中 第二掩模图案将晶片的第二表面的一部分暴露在钝化区之间的区域上,并且使用第二掩模图案作为蚀刻掩模通过蚀刻晶片形成通孔。