会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • METAL OXIDE TFT WITH IMPROVED SOURCE/DRAIN CONTACTS
    • 具有改进源/漏联系的金属氧化物薄膜
    • US20140151694A1
    • 2014-06-05
    • US14175521
    • 2014-02-07
    • Chan- Long ShiehGang YuFatt Foong
    • Chan- Long ShiehGang YuFatt Foong
    • H01L29/786
    • H01L29/7869H01L21/428H01L29/45H01L29/66969H01L29/78606
    • A method of forming ohmic source/drain contacts in a metal oxide semiconductor thin film transistor includes providing a gate, a gate dielectric, a high carrier concentration metal oxide semiconductor active layer with a band gap and spaced apart source/drain metal contacts in a thin film transistor configuration. The spaced apart source/drain metal contacts define a channel region in the active layer. An oxidizing ambient is provided adjacent the channel region and the gate and the channel region are heated in the oxidizing ambient to reduce the carrier concentration in the channel area. Alternatively or in addition each of the source/drain contacts includes a very thin layer of low work function metal positioned on the metal oxide semiconductor active layer and a barrier layer of high work function metal is positioned on the low work function metal.
    • 在金属氧化物半导体薄膜晶体管中形成欧姆源极/漏极接触的方法包括提供栅极,栅极电介质,具有带隙的高载流子浓度金属氧化物半导体有源层,并且具有薄的源极/漏极金属触点 薄膜晶体管配置。 间隔开的源极/漏极金属触点限定有源层中的沟道区。 在沟道区域附近提供氧化环境,并且栅极和沟道区域在氧化环境中被加热以降低沟道区域中的载流子浓度。 或者或另外每个源极/漏极触点包括位于金属氧化物半导体有源层上的非常薄的低功函数金属层,并且高功函数金属的势垒层位于低功函数金属上。
    • 5. 发明申请
    • PIXELATED IMAGER WITH MOTFET AND PROCESS
    • 像素图像与MOTFET和过程
    • US20140167046A1
    • 2014-06-19
    • US13713744
    • 2012-12-13
    • Chan- Long ShiehGang Yu
    • Chan- Long ShiehGang Yu
    • H01L31/20H01L31/0368H01L31/0376
    • H01L31/20H01L27/1225H01L27/1463H01L27/14632H01L27/14663H01L27/14687H01L27/14692H01L31/0368H01L31/0376Y02E10/50
    • A method of fabricating a pixelated imager includes providing a substrate with bottom contact layer and sensing element blanket layers on the contact layer. The blanket layers are separated into an array of sensing elements by trenches isolating adjacent sensing elements. A sensing element electrode is formed adjacent each sensing element overlying a trench and defining a TFT. A layer of metal oxide semiconductor (MOS) material is formed on a dielectric layer overlying the electrodes and on an exposed upper surface of the blanket layers defining the sensing element adjacent each TFT. A layer of metal is deposited on each TFT and separated into source/drain electrodes on opposite sides of the sensing element electrode. The metal forming one of the S/D electrodes contacts the MOS material overlying the exposed surface of the semiconductor layer, whereby each sensing element in the array is electrically connected to the adjacent TFT by the MOS material.
    • 制造像素化成像器的方法包括在接触层上提供底层接触层和感测元件覆盖层。 橡皮布层通过隔离相邻感测元件的沟槽分离成感测元件的阵列。 感测元件电极邻近覆盖沟槽的每个感测元件形成并且限定TFT。 一层金属氧化物半导体(MOS)材料形成在覆盖电极的电介质层上,并且在覆盖层的暴露的上表面上形成与每个TFT相邻的感测元件。 一层金属沉积在每个TFT上,并分离成在感测元件电极的相对侧上的源极/漏极。 形成S / D电极之一的金属接触覆盖半导体层的暴露表面的MOS材料,由此阵列中的每个感测元件通过MOS材料电连接到相邻的TFT。