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    • 4. 发明授权
    • Methods of fabricating field effect transistors having protruded active regions
    • 制造具有突出的活性区域的场效应晶体管的方法
    • US08378395B2
    • 2013-02-19
    • US12977811
    • 2010-12-23
    • Ji-Young LeeJun Seo
    • Ji-Young LeeJun Seo
    • H01L29/78
    • H01L29/1037H01L21/76229H01L27/105H01L29/66621H01L29/7834
    • Provided are a field effect transistor, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor may have a structure in which a double gate field effect transistor and a recess channel array transistor are formed in a single transistor in order to improve a short channel effect which occurs as field effect transistors become more highly integrated, a method of manufacturing the same, and an electronic device including the field effect transistor. The field effect transistor can exhibit stable device characteristics even when more highly integrated in such a manner that both the length and width of a channel increase and particularly the channel can be significantly long, and can be manufactured simply.
    • 提供了场效应晶体管,其制造方法以及包括场效应晶体管的电子器件。 场效应晶体管可以具有在单个晶体管中形成双栅极场效应晶体管和凹槽沟道阵列晶体管的结构,以便改善随着场效应晶体管变得更高度集成而发生的短沟道效应, 制造它们,以及包括场效应晶体管的电子器件。 即使当以通道的长度和宽度都增加并且特别是通道可以显着长的方式更高度集成时,场效应晶体管也可以表现出稳定的器件特性,并且可以简单地制造。