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1. 发明授权

US06613494B2 Imageable element having a protective overlayer 失效
公开(公告)号：US06613494B2
公开(公告)日：2003-09-02
申请号：US09805327
申请日：2001-03-13
申请人： Celin Savariar-Hauck , Gerhard Hauck , Dietmar Frank , Ulrich Fiebag
发明人： Celin Savariar-Hauck , Gerhard Hauck , Dietmar Frank , Ulrich Fiebag
IPC分类号： G03F711
CPC分类号： B41C1/1016 , B41C2201/02 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： Positive-working imageable elements and methods for their preparation are disclosed. The elements comprise a hydrophilic substrate; a bottom layer, which contains a positive-working photosensitive composition; and a protective overlayer, which has an overlayer material that reduces the solubility of the photosensitive composition in an aqueous alkaline developer. The overlayer may be conveniently applied by a dip and rinse procedure.

2. 发明授权

US06562555B2 Method for developing lithographic printing plate precursors using a coating attack-suppressing agent 有权
标题翻译：使用涂层侵蚀抑制剂显影平版印刷版原版的方法
公开(公告)号：US06562555B2
公开(公告)日：2003-05-13
申请号：US09919695
申请日：2001-08-01
申请人： Ulrich Fiebag , Celin Savariar-Hauck , Gerhard Hauck
发明人： Ulrich Fiebag , Celin Savariar-Hauck , Gerhard Hauck
IPC分类号： G03F730
CPC分类号： G03F7/322 , B41C1/1008 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/262 , B41N3/03 , G03F7/3071
摘要： A method for developing exposed lithographic printing plate precursors using a developer and replenisher is disclosed. The replenisher contains a higher concentration of a coating attack-suppressing agent than the developer, so that the aggressiveness of the developer remains substantially constant during the developer loading cycle.
摘要翻译：公开了一种使用显影剂和补充剂显影曝光的平版印刷版原版的方法。补充剂含有比显影剂更高浓度的涂层攻击抑制剂，使得显影剂加载循环期间显影剂的侵蚀性基本上保持恒定。

3. 发明授权

US06649324B1 Aqueous developer for lithographic printing plates 失效
标题翻译：平版印刷版的水性显影剂
公开(公告)号：US06649324B1
公开(公告)日：2003-11-18
申请号：US09690254
申请日：2000-10-17
申请人： Ulrich Fiebag , Celin Savariar-Hauck
发明人： Ulrich Fiebag , Celin Savariar-Hauck
IPC分类号： G03F732
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/26 , B41C2210/262 , B41C2210/264 , B41C2210/266 , G03F7/322
摘要： An aqueous developer for lithographic printing plates and a method for developing the printing plates are disclosed. The developer comprises an organic dispersing agent. The developer develops multi-layer printing plates quickly, with high throughput, but with no sludge formation in the developing process.
摘要翻译：公开了用于平版印刷版的水性显影剂和显影印版的方法。显影剂包括有机分散剂。开发商快速开发多层印刷板，产量高，但在显影过程中没有污泥形成。

4. 发明申请

US20100159393A1 METHOD OF DEVELOPING LITHOGRAPHIC PRINTING PLATE PRECURSORS 审中-公开
标题翻译：开发平版印刷机前驱体的方法
公开(公告)号：US20100159393A1
公开(公告)日：2010-06-24
申请号：US12063123
申请日：2006-08-18
申请人： Ulrich Fiebag , Gerhard Hauck , Hans-Joachim Timpe , Friederike Von Gyldenfeldt
发明人： Ulrich Fiebag , Gerhard Hauck , Hans-Joachim Timpe , Friederike Von Gyldenfeldt
IPC分类号： G03F7/20
CPC分类号： G03F7/322 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： The invention relates to a method for making a lithographic printing plate which comprises imagewise exposing a lithographic printing plate precursor comprising one or more layers at least one of which is associated with one or more unsubstituted or substituted triarylmethane dyes and at least one of which layers is radiation-sensitive, and developing the imagewise exposed printing plate precursor with an aqueous alkaline developing composition, wherein the composition comprises at least one amphoteric surfactant of formula (I):—wherein R1 is an unsubstituted alkyl group; each R2 and each R3 are independently selected from H, hydroxy and an unsubstituted or substituted alkyl group; R4 and R5 are independently selected from an unsubstituted alkyl group or one Of R4 and R5 may be the group —(CH2)m—Y—R1; X− is selected from COO−, SO3−, OSO3−, PO3H−, PO3Z−, OPO3H− and OPO3Z−, wherein Z is a monovalent cation; Y is selected from CONH, NHCO, COO, OCO, NHCONH and O; l is 0 or 1; m is an integer from 1 to 10; and n is an integer from 1 to 5, The use of the composition for the development of radiation-sensitive positive- or negative-printing plate precursors depresses sludge formation associated with the presence of the triarylmethane dyes, thereby increasing developing capacity, and also prevents coloration of components in the developing section of the processor caused by the presence of such dyes.
摘要翻译：本发明涉及一种制备平版印刷版的方法，该方法包括成像曝光包含一层或多层的平版印刷版前体，其中至少一层与一种或多种未取代或取代的三芳基甲烷染料相连，其中至少一层是辐射敏感，并用含水碱性显影组合物显影成像曝光的印版前体，其中所述组合物包含至少一种式（I）的两性表面活性剂：其中R1是未取代的烷基; 每个R 2和R 3各自独立地选自H，羟基和未取代或取代的烷基; R4和R5独立地选自未取代的烷基，或者R4和R5之一可以是基团 - （CH2）m-Y-R1; X选自COO-，SO 3 - ，OSO 3 - ，PO 3 - ，PO 3 - ，OPO 3 - 和OPO 3 Z-，其中Z是一价阳离子; Y选自CONH，NHCO，COO，OCO，NHCONH和O; l为0或1; m为1〜10的整数; 并且n是1至5的整数。用于开发辐射敏感的正片或负片印版前体的组合物抑制与三芳基甲烷染料的存在相关的污泥形成，从而增加显影能力，并且还防止由于这种染料的存在，在处理器的显影部分中的组分着色。

5. 发明授权

US07524613B2 Material for the treatment of lithographic substrates and lithographic printing plates 失效
标题翻译：用于处理平版印刷基板和平版印刷版的材料
公开(公告)号：US07524613B2
公开(公告)日：2009-04-28
申请号：US11813678
申请日：2006-01-12
申请人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
发明人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
IPC分类号： G03C1/76 , G03F7/09 , G03F7/11 , G03F7/40 , C08G77/30
CPC分类号： C08G77/30 , B41N1/083 , B41N1/086 , B41N1/14 , B41N3/038 , B41N3/08 , C08G77/395 , C08K5/5406 , Y10S430/145
摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
摘要翻译：膦酰取代的硅氧烷适用于平版印刷基板中的中间层材料，并用于后处理显影的平版印刷版，其通过使（a）通式（I）的第一有机硅化合物和（b）第二有机硅化合物与通式（二）。

6. 发明申请

US20080206666A1 Material For The Treatment Of Lithographic Substrates And Lithographic Printing Plates 失效
标题翻译：用于光刻基板和平版印刷板的处理材料
公开(公告)号：US20080206666A1
公开(公告)日：2008-08-28
申请号：US11813678
申请日：2006-01-12
申请人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
发明人： Harald Baumann , Bernd Strehmel , Ulrich Fiebag , Friederike Von Gyldenfeldt , Tanja Ebhardt , Ulrike Dallmann , Dietmar Frank
IPC分类号： B32B13/04 , G03F7/004
CPC分类号： C08G77/30 , B41N1/083 , B41N1/086 , B41N1/14 , B41N3/038 , B41N3/08 , C08G77/395 , C08K5/5406 , Y10S430/145
摘要： Phosphono-substituted siloxanes suitable as interlayer material in lithographic substrates and for post-treating developed lithographic printing plates, obtainable by reacting (a) a first organosilicon compound of the general formula (I) and (b) a second organosilicon compound of the general formula (II).
摘要翻译：膦酰取代的硅氧烷适用于平版印刷基板中的中间层材料，并用于后处理显影的平版印刷版，其通过使（a）通式（I）的第一有机硅化合物和（b）第二有机硅化合物与通式（二）。

7. 发明授权

US08105755B2 Method for processing of photopolymer printing plates with overcoat 有权
标题翻译：用外涂层加工光聚合物印版的方法
公开(公告)号：US08105755B2
公开(公告)日：2012-01-31
申请号：US12300206
申请日：2007-06-05
申请人： Harald Baumann , Christopher D. Simpson , Ulrich Fiebag , Bernd Strehmel
发明人： Harald Baumann , Christopher D. Simpson , Ulrich Fiebag , Bernd Strehmel
IPC分类号： G03F7/00 , G03F7/26 , G03C5/26 , B41N1/00
CPC分类号： B41C1/1008 , B41C1/1016 , B41C2201/02 , B41C2201/14 , B41C2210/04 , B41C2210/06 , B41C2210/08 , B41C2210/22 , B41C2210/24 , G03F7/09 , G03F7/322
摘要： Method is described for producing an imaged lithographic printing plate from a precursor comprising a free-radical polymerizable coating and an oxygen-impermeable overcoat, characterized in that removing the overcoat, developing and gumming is carried out in one single step.
摘要翻译：描述了用于从包含自由基可聚合涂层和不透氧外涂层的前体制备成像平版印刷版的方法，其特征在于，在一个单一步骤中进行外涂层，显影和涂胶的去除。

8. 发明授权

US06541188B2 Developer for alkaline-developable lithographic printing plates 失效
公开(公告)号：US06541188B2
公开(公告)日：2003-04-01
申请号：US09853358
申请日：2001-05-11
申请人： Ulrich Fiebag , Hans-Joachim Timpe , Uwe Tondock , Andreas Vihs
发明人： Ulrich Fiebag , Hans-Joachim Timpe , Uwe Tondock , Andreas Vihs
IPC分类号： G03F732
CPC分类号： G03F7/322
摘要： An aqueous alkaline developing system for alkaline-developable lithographic printing plates and a method for its use are disclosed. The developing system comprises one or more water-soluble suppressors of the following structure: R1 (CHOH)nR2 in which: n is 4 to 7; and either (i) R1 is hydrogen, aryl, or CH2OH; and R2 is alkyl group having 1 to 4 carbon atoms, CH2OR3 in which R3 is an alkyl group having 1 to 4 carbon atoms, CH2N(R4R5) in which R4 and R5 are each independently hydrogen or an alkyl group having 1 to 4 carbon atoms, or CO2H; or (ii) R1 and R2 together form a carbon-carbon single bond. The developing system is especially suited for developing imageable elements useful as lithographic printing plates. The developing system is especially suited for use with elements in which (1) the imageable layer comprises at least one phenolic resin or at least one polymeric compound having pendent sulfonamide groups, and (2) the substrate is aluminum or and an aluminum alloy.

9. 发明授权

US06383717B1 Aqueous developer for negative working lithographic printing plates 失效
公开(公告)号：US06383717B1
公开(公告)日：2002-05-07
申请号：US09686458
申请日：2000-10-11
申请人： Ulrich Fiebag , Harald Baumann , Hans-Joachim Timpe
发明人： Ulrich Fiebag , Harald Baumann , Hans-Joachim Timpe
IPC分类号： G03F730
CPC分类号： G03F7/322
摘要： An aqueous developer for imageable elements that contain a radiation-sensitive initiator system and at least one free radical polymerizable material is disclosed. The developer develops these plates quickly, with high throughput, but with no sludge formation in the developing process. The developer contains water, a buffer, and one or more filter dyes and/or one of more free radical inhibitors. The imageable elements are useful as printing plates.

10. 发明授权

US07553607B2 Interlayer for lithographic printing plates 失效
标题翻译：平版印刷版中间层
公开(公告)号：US07553607B2
公开(公告)日：2009-06-30
申请号：US11573793
申请日：2005-08-25
申请人： Ulrich Fiebag , Hans-Joachim Timpe , Ursula Muller
发明人： Ulrich Fiebag , Hans-Joachim Timpe , Ursula Muller
IPC分类号： G03F7/26 , G03C1/00
CPC分类号： B41N3/038 , B41C1/1008 , B41C1/1058 , B41C1/1066 , B41C1/1091 , B41C2210/02 , B41C2210/04 , B41C2210/06 , B41C2210/22 , B41C2210/24 , C09D183/08
摘要： Lithographic substrate comprising (a) a dimensionally stable plate- or foil-shaped support, (b) an aluminum oxide layer provided on at least one side of the support (a), and (c) a hydrophilic layer applied onto the aluminum oxide layer comprising at least one phosphono-substituted siloxane of the general formula (I).
摘要翻译：平版印刷基材包括（a）尺寸稳定的板状或箔状载体，（b）设置在载体（a）的至少一侧的氧化铝层，和（c）施加到氧化铝层上的亲水层包含至少一种通式（I）的膦酰取代的硅氧烷。

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