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    • 2. 发明授权
    • Aqueous phase process for preparing N-substituted imidazoles
    • 制备N-取代咪唑的水相方法
    • US5877326A
    • 1999-03-02
    • US914187
    • 1997-08-19
    • Gisela HieberKlaus EbelJurgen SchroderToni DocknerCarsten GroningBernd Ruge
    • Gisela HieberKlaus EbelJurgen SchroderToni DocknerCarsten GroningBernd Ruge
    • C07D233/58B01J21/12B01J27/16C07D233/54C07D233/68C07D233/90C07D233/91C07D233/92C07D235/06C07D235/08C07D233/56
    • C07D235/08C07D233/54C07D233/56C07D233/64C07D233/68C07D233/90C07D233/91C07D233/92C07D235/06
    • A process for preparing substituted imidazoles of the formula I ##STR1## R.sup.1, R.sup.2 and R.sup.3 are identical or different and are each hydrogen, halogen, NO.sub.2, CN or a C.sub.1 -C.sub.20 -hydrocarbon radical which is unsubstituted or substituted by one or more halogens or R.sup.1 and R.sup.2 together are members of a 3- to 20-membered hydrocarbon ring which is unsubstituted or substituted by one or more halogens and/or C.sub.1 -C.sub.8 -alkyl groups and which may contain 1, 2 or 3 heteroatoms from the group consisting of nitrogen, oxygen and sulfur, andR.sup.4 is a C.sub.1 -C.sub.20 -hydrocarbon radical which is unsubstituted or substituted by one or more halogens,comprises using an aqueous phase of the imidazoles of the formula II ##STR2## where R.sup.1, R.sup.2 and R.sup.3 are as defined above with compounds of the formula IIIR.sup.4 --O--R.sup.5 IIIwhereR.sup.4 is as defined above andR.sup.5 is hydrogen or R.sup.4, it being possible in the latter case for the two R.sup.4 substituents to be identical or different,and reacting it at from 200.degree. to 550.degree. C. in the presence of a catalyst comprising oxides and/or phosphates of one or more metals of the 2nd, 3rd and 4th main group and the 4th subgroup of the Periodic Table in the presence or absence of phosphoric acid and/or phosphoric esters.
    • 制备式I的取代咪唑的方法R1,R2和R3相同或不同,各自为氢,卤素,NO2,CN或C1-C20-烃基,其未被取代或被一个或多个 卤素或R 1和R 2一起是3至20元烃环的成员,其未被取代或被一个或多个卤素和/或C 1 -C 8烷基取代,并且可以含有1,2或3个来自该基团的杂原子 由氮,氧和硫组成,R4是未被取代或被一个或多个卤素取代的C 1 -C 20烃基,包括使用式II的咪唑的水相,其中R 1,R 2和 R 3如上所定义,与式III的R4-O-R5III化合物,其中R 4如上定义,R 5是氢或R 4,在后一种情况下,两个R 4取代基可以相同或不同, 在约200℃〜550℃下, 在磷酸和/或磷酸酯存在或不存在的条件下,包含第2,第3和第4主族和第4族的周期表中的一种或多种金属的氧化物和/或磷酸盐。