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    • 2. 发明授权
    • Rotating head ellipsometer
    • 旋转头椭偏仪
    • US06882413B2
    • 2005-04-19
    • US10144288
    • 2002-05-13
    • Barry R. Bowman
    • Barry R. Bowman
    • G01N21/21G01N21/00
    • G01N21/211
    • An ellipsometric apparatus provides a rotating focused probe beam directed to impinge a sample in any direction. A rotating stage rotates the wafer into a linear travel range defined by a single linear axis of a single linear stage. As a result, an entire wafer is accessed for measurement with the single linear stage having a travel range of only half the wafer diameter. The reduced single linear travel results in a small travel envelope occupied by the wafer and consequently in a small footprint of the apparatus. The use of a rotating probe beam permits measurement of periodic structures along a preferred direction while permitting the use of a single reduced motion stage.
    • 椭偏仪提供了一个旋转的聚焦探针光束,该探针光束指向一个样品在任何方向上。 旋转台将晶片旋转成由单个线性平台的单个线性轴限定的线性行程范围。 结果,使用整个晶片进行测量,单个线性平台的行程范围仅为晶片直径的一半。 减小的单线性行程导致由晶片占据的小行程信封,因此在该设备的小占地面积内。 使用旋转探针光束允许沿着优选方向测量周期性结构,同时允许使用单个减小运动级。