专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09487869B2 Pattern transfer with self-assembled nanoparticle assemblies 有权
标题翻译：带有自组装纳米颗粒组件的图案转移
公开(公告)号：US09487869B2
公开(公告)日：2016-11-08
申请号：US13907716
申请日：2013-05-31
申请人： Carnegie Mellon University
发明人： Sara Majetich , Tianlong Wen
IPC分类号： C23F1/04 , B05D3/14 , G03F7/00 , B82Y40/00
CPC分类号： C23F1/04 , B05D3/148 , B82Y40/00 , G03F7/0002 , Y10S977/773 , Y10S977/89 , Y10S977/932
摘要： In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
摘要翻译：在一个方面，一种方法包括：提供具有至少一个层的衬底，其中将制造图案化点阵列; 沉积纳米颗粒层，其中所述纳米颗粒层包含一种或多种表面活性剂和用所述一种或多种表面活性剂涂覆的纳米颗粒; 处理涂覆纳米颗粒的一种或多种表面活性剂和填充纳米颗粒之间的空间的一种或多种表面活性剂的部分; 去除填充纳米颗粒之间的空间的一种或多种表面活性剂的部分以暴露要制造图案化点阵列的至少一层的部分; 蚀刻要制造图案化点阵列的至少一个层的暴露部分; 并除去至少一部分纳米颗粒。

2. 发明申请

US20130327636A1 Pattern Transfer With Self-assembled Nanoparticle Assemblies 有权
标题翻译：带有自组装纳米粒子组件的图案转移
公开(公告)号：US20130327636A1
公开(公告)日：2013-12-12
申请号：US13907716
申请日：2013-05-31
申请人： Carnegie Mellon University
发明人： Sara Majetich , Tianlong Wen
IPC分类号： C23F1/04 , B05D3/14
CPC分类号： C23F1/04 , B05D3/148 , B82Y40/00 , G03F7/0002 , Y10S977/773 , Y10S977/89 , Y10S977/932
摘要： In one aspect, a method comprises: providing a substrate having at least one layer in which the patterned dot array is to be fabricated; depositing a nanoparticle layer, wherein the nanoparticle layer comprises one or more surfactants and nanoparticles coated with the one or more surfactants; treating the one or more surfactants that coat the nanoparticles and the portions of the one or more surfactants that fill the spaces among the nanoparticles; removing the portions of the one or more surfactants that fill the spaces among the nanoparticles to expose portions of the at least one layer in which the patterned dot array is to be fabricated; etching the exposed portions of the at least one layer in which the patterned dot array is to be fabricated; and removing at least a portion of the nanoparticles.
摘要翻译：在一个方面，一种方法包括：提供具有至少一个层的衬底，其中将制造图案化点阵列; 沉积纳米颗粒层，其中所述纳米颗粒层包含一种或多种表面活性剂和用所述一种或多种表面活性剂涂覆的纳米颗粒; 处理涂覆纳米颗粒的一种或多种表面活性剂和填充纳米颗粒之间的空间的一种或多种表面活性剂的部分; 去除填充纳米颗粒之间的空间的一种或多种表面活性剂的部分以暴露要制造图案化点阵列的至少一层的部分; 蚀刻要制造图案化点阵列的至少一个层的暴露部分; 并除去至少一部分纳米颗粒。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式