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1. 发明申请

US20150293352A1 METHOD FOR IMPROVING THE IMAGING PROPERTIES OF A PROJECTION OBJECTIVE, AND SUCH A PROJECTION OBJECTIVE 有权
标题翻译：改进投影目标成像特性的方法及其投影目标
公开(公告)号：US20150293352A1
公开(公告)日：2015-10-15
申请号：US14727352
申请日：2015-06-01
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G02B27/00 , G02B3/00 , G03F7/20 , G02B26/08
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配用于主动地变形透镜，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

2. 发明授权

US10241423B2 Method of operating a projection exposure tool for microlithography 有权
公开(公告)号：US10241423B2
公开(公告)日：2019-03-26
申请号：US15226952
申请日：2016-08-03
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Conradi , Michael Totzeck , Ulrich Loering , Dirk Juergens , Ralf Mueller , Christian Wald
IPC分类号： G03B27/54 , G03B27/68 , G03B27/52 , G03F7/20
摘要： A method of operating a projection exposure tool for microlithography is provided. The projection exposure tool has a projection objective for imaging object structures on a mask into an image plane using electromagnetic radiation, during which imaging the electromagnetic radiation causes a change in optical properties of the projection objective. The method comprises the steps of: providing the layout of the object structures on the mask to be imaged and classifying the object structures according to their type of structure, calculating the change in the optical properties of the projection objective effected during the imaging process on the basis of the classification of the object structures, and using the projection exposure tool for imaging the object structures into the image plane, wherein the imaging behavior of the projection exposure tool is adjusted on the basis of the calculated change of the optical properties in order to at least partly compensate for the change of the optical properties of the projection objective caused by the electromagnetic radiation during the imaging process.

3. 发明授权

US09823579B2 Optical system and method of use 有权
公开(公告)号：US09823579B2
公开(公告)日：2017-11-21
申请号：US14597497
申请日：2015-01-15
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Conradi
IPC分类号： G03F7/20
CPC分类号： G03F7/70266 , G03F7/70191 , G03F7/70308 , G03F7/70891
摘要： A method for improving imaging properties of an optical system and an optical system of this type having improved imaging properties are described. The optical system can have a plurality of optical elements. In some embodiments, an optical element is positioned and/or deformed by mechanical force action and by thermal action. In certain embodiments, one optical element is positioned and/or deformed by mechanical force action and another optical element is deformed by thermal action.

4. 发明授权

US09690203B2 Method for adjusting an illumination setting 有权
公开(公告)号：US09690203B2
公开(公告)日：2017-06-27
申请号：US14590210
申请日：2015-01-06
申请人： Carl Zeiss SMT GmbH
发明人： Joerg Zimmermann , Ralf Stuetzle , Paul Graeupner , Olaf Conradi
IPC分类号： G03F7/20 , G02B26/08
CPC分类号： G03F7/70141 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/702
摘要： Method for setting an illumination setting in an illumination optical unit comprising at least one controllable correction device, which includes a multiplicity of adjustable correction elements for influencing the transmission, wherein the illumination setting is varied for adapting a predetermined imaging parameter in the region of an image field.

5. 发明授权

US09146475B2 Projection exposure system and projection exposure method 有权
标题翻译：投影曝光系统和投影曝光法
公开(公告)号：US09146475B2
公开(公告)日：2015-09-29
申请号：US13786134
申请日：2013-03-05
申请人： Carl Zeiss SMT GmbH
发明人： Paul Gräupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
IPC分类号： G03B27/72 , G03F7/20
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
摘要翻译：投影曝光系统包括被配置为用辐射照射掩模的照明系统。投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

6. 发明授权

US09581813B2 Method for improving the imaging properties of a projection objective, and such a projection objective 有权
标题翻译：用于改善投影物镜的成像特性的方法和这种投影物镜
公开(公告)号：US09581813B2
公开(公告)日：2017-02-28
申请号：US14727352
申请日：2015-06-01
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Conradi , Heiko Feldmann , Gerald Richter , Sascha Bleidistel , Andreas Frommeyer , Toralf Gruner , Wolfgang Hummel
IPC分类号： G03B27/32 , G03B27/68 , G02B27/00 , G03F7/20 , G02B3/00 , G02B26/08
CPC分类号： G02B27/0068 , G02B3/0081 , G02B26/0825 , G03F7/7015 , G03F7/70266 , G03F7/70558 , Y10S359/90
摘要： The invention relates to a method for improving the imaging properties of a micro lithography projection objective, wherein the projection objective has a plurality of lenses between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.
摘要翻译：本发明涉及一种用于改善微光刻投影物镜的成像特性的方法，其中所述投影物镜在物平面和像平面之间具有多个透镜，所述多个透镜的第一透镜被分配用于主动地变形透镜，第一透镜被变形以至少部分地校正像差，多个透镜中的至少一个第二透镜进一步被分配至少一个第二操纵器，并且第二透镜除了第一透镜之外也变形。此外，描述了用于选择投影物镜的多个透镜中的至少一个透镜作为主动变形元件和投影物镜的方法。

7. 发明授权

US09442381B2 Method of operating a projection exposure tool for microlithography 有权
标题翻译：操作用于微光刻的投影曝光工具的方法
公开(公告)号：US09442381B2
公开(公告)日：2016-09-13
申请号：US13939859
申请日：2013-07-11
申请人： Carl Zeiss SMT GmbH
发明人： Olaf Conradi , Michael Totzeck , Ulrich Loering , Dirk Juergens , Ralf Mueller , Christian Wald
IPC分类号： G03B27/54 , G03B27/68 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70891 , G03F7/70141 , G03F7/70483 , G03F7/70516 , G03F7/708
摘要： A method of operating a projection exposure tool for microlithography is provided. The projection exposure tool has a projection objective for imaging object structures on a mask into an image plane using electromagnetic radiation, during which imaging the electromagnetic radiation causes a change in optical properties of the projection objective. The method comprises the steps of: providing the layout of the object structures on the mask to be imaged and classifying the object structures according to their type of structure, calculating the change in the optical properties of the projection objective effected during the imaging process on the basis of the classification of the object structures, and using the projection exposure tool for imaging the object structures into the image plane, wherein the imaging behavior of the projection exposure tool is adjusted on the basis of the calculated change of the optical properties in order to at least partly compensate for the change of the optical properties of the projection objective caused by the electromagnetic radiation during the imaging process.
摘要翻译：提供了一种操作用于微光刻的投影曝光工具的方法。投影曝光工具具有用于使用电磁辐射将掩模上的对象结构成像为图像平面的投影物镜，在此期间成像电磁辐射导致投影物镜的光学特性的变化。该方法包括以下步骤：在要成像的掩模上提供对象结构的布局，并根据其结构类型对对象结构进行分类，计算在成像过程中对投影物镜的光学特性的变化，基于对象结构的分类，以及使用用于将对象结构成像到图像平面中的投影曝光工具，其中基于所计算的光学性质的改变来调整投影曝光工具的成像行为，以便至少部分地补偿由成像过程中的电磁辐射引起的投影物镜的光学特性的变化。

8. 发明授权

US09097984B2 Microlithography projection objective 有权
公开(公告)号：US09097984B2
公开(公告)日：2015-08-04
申请号：US14337475
申请日：2014-07-22
申请人： Carl Zeiss SMT GmbH
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
IPC分类号： G03F7/20 , G02B17/08
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.

9. 发明申请

US20150153652A1 METHOD FOR ADJUSTING AN ILLUMINATION SETTING 有权
标题翻译：调整照明设置的方法
公开(公告)号：US20150153652A1
公开(公告)日：2015-06-04
申请号：US14590210
申请日：2015-01-06
申请人： Carl Zeiss SMT GmbH
发明人： Joerg Zimmermann , Ralf Stuetzle , Paul Graeupner , Olaf Conradi
IPC分类号： G03F7/20
CPC分类号： G03F7/70141 , G02B26/0833 , G03F7/70075 , G03F7/70116 , G03F7/70191 , G03F7/702
摘要： Method for setting an illumination setting in an illumination optical unit comprising at least one controllable correction device, which includes a multiplicity of adjustable correction elements for influencing the transmission, wherein the illumination setting is varied for adapting a predetermined imaging parameter in the region of an image field.
摘要翻译：用于设置照明光学单元中的照明设置的方法，包括至少一个可控校正装置，其包括用于影响透射的多个可调校正元件，其中改变照明设置以适应图像区域中的预定成像参数领域。

10. 发明申请

US20140293256A1 MICROLITHOGRAPHY PROJECTION OBJECTIVE 审中-公开
标题翻译：微观投影目标
公开(公告)号：US20140293256A1
公开(公告)日：2014-10-02
申请号：US14300592
申请日：2014-06-10
申请人： Carl Zeiss SMT GmbH
发明人： Heiko Feldmann , Daniel Kraehmer , Jean-Claude Perrin , Julian Kaller , Aurelian Dodoc , Vladimir Kamenov , Olaf Conradi , Toralf Gruner , Thomas Okon , Alexander Epple
IPC分类号： G03F7/20
CPC分类号： G03F7/70225 , G02B17/08 , G03F7/702 , G03F7/70283 , G03F7/70941
摘要： Microlithography projection objectives for imaging into an image plane a pattern arranged in an object plane are described with respect to suppressing false light in such projection objectives.
摘要翻译：关于在这样的投影物镜中抑制假光，描述用于成像到平面中的布置在物体平面中的图案的微光刻投影物镜。

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