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1. 发明申请

US20190302627A1 METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS 审中-公开
公开(公告)号：US20190302627A1
公开(公告)日：2019-10-03
申请号：US16271073
申请日：2019-02-08
申请人： Carl Zeiss SMT GmbH
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03F7/20
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

2. 发明授权

US09436095B2 Exposure apparatus and measuring device for a projection lens 有权
标题翻译：用于投影透镜的曝光装置和测量装置
公开(公告)号：US09436095B2
公开(公告)日：2016-09-06
申请号：US13682474
申请日：2012-11-20
申请人： Carl Zeiss SMT GmbH
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译：微光刻投影曝光装置包括配置为浸没操作的投影透镜。为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度在浸液中的分布。

3. 发明申请

US20130120723A1 EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 有权
标题翻译：投影镜头的曝光装置和测量装置
公开(公告)号：US20130120723A1
公开(公告)日：2013-05-16
申请号：US13682474
申请日：2012-11-20
申请人： Carl Zeiss SMT GmbH
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.
摘要翻译：微光刻投影曝光装置包括配置为浸没操作的投影透镜。为此，将浸没液体引入位于图像侧的投影透镜的最后一个透镜与待曝光的感光层之间的浸没空间中。为了减少由浸没液体内发生的温度梯度引起的折射率的波动，投影曝光装置包括加热或冷却浸没液的部分体积的传热元件，以便达到至少基本均匀或至少基本上旋转对称的温度在浸液中的分布。

4. 发明授权

US11003088B2 Method and device for the correction of imaging defects 有权
公开(公告)号：US11003088B2
公开(公告)日：2021-05-11
申请号：US16840767
申请日：2020-04-06
申请人： Carl Zeiss SMT GmbH
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/68 , G03F7/20
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

5. 发明申请

US20200233314A1 METHOD AND DEVICE FOR THE CORRECTION OF IMAGING DEFECTS 审中-公开
公开(公告)号：US20200233314A1
公开(公告)日：2020-07-23
申请号：US16840767
申请日：2020-04-06
申请人： Carl Zeiss SMT GmbH
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03F7/20
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

6. 发明授权

US10620543B2 Method and device for the correction of imaging defects 有权
公开(公告)号：US10620543B2
公开(公告)日：2020-04-14
申请号：US16271073
申请日：2019-02-08
申请人： Carl Zeiss SMT GmbH
发明人： Franz Sorg , Peter Deufel , Toralf Gruner
IPC分类号： G03B27/68 , G03F7/20
CPC分类号： G03F7/70308 , G03F7/70825 , G03F7/70933
摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and component.

7. 发明授权

US10197925B2 Optical module for a microlithography objective holding optical elements with supporting devices located in a non-equidistant manner 有权
公开(公告)号：US10197925B2
公开(公告)日：2019-02-05
申请号：US14199758
申请日：2014-03-06
申请人： Carl Zeiss SMT GmbH
发明人： Jens Kugler , Franz Sorg , Yim-Bun Patrick Kwan
IPC分类号： G03B27/70 , G03F7/20 , G02B7/02 , G02B7/00 , G02B7/182 , G02B17/06 , G02B19/00
摘要： An optical module includes: a first holding device with a circumference extending in a first circumferential direction; and a plurality of first supporting devices configured to support a first optical element, the first supporting devices being fixed at the circumference of the first holding device. Along the first circumferential direction, at least one of the first supporting devices is located in a non-equidistant manner between two neighboring first supporting devices. The optical module is configured to be used in a microlithography objective.

8. 发明申请

US20170082930A1 MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS AND MEASURING DEVICE FOR A PROJECTION LENS 审中-公开
公开(公告)号：US20170082930A1
公开(公告)日：2017-03-23
申请号：US15250241
申请日：2016-08-29
申请人： Carl Zeiss SMT GmbH
发明人： Albrecht Ehrmann , Ulrich Wegmann , Rainer Hoch , Joerg Mallmann , Karl-Heinz Schuster , Ulrich Loering , Toralf Gruner , Bernhard Kneer , Bernhard Geuppert , Franz Sorg , Jens Kugler , Norbert Wabra
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70591 , G03F7/70691 , G03F7/7085 , G03F7/70875 , G03F7/70891 , G03F7/70991
摘要： A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

9. 发明申请

US20140254036A1 OPTICAL MODULE FOR AN OBJECTIVE 审中-公开
标题翻译：目标光学模块
公开(公告)号：US20140254036A1
公开(公告)日：2014-09-11
申请号：US14199758
申请日：2014-03-06
申请人： Carl Zeiss SMT GmbH
发明人： Jens Kugler , Franz Sorg , Yim-Bun Patrick Kwan
IPC分类号： G02B7/00 , G02B17/06 , G02B7/182
CPC分类号： G02B19/0023 , G02B7/00 , G02B7/021 , G02B7/023 , G02B7/026 , G02B7/182 , G02B17/0605 , G02B17/0615 , G03F7/70825 , G03F7/70833
摘要： Disclosed is an optical module for a lens, especially a microlithographic apparatus, comprising a first holding device with an inner circumference that extends in a first circumferential direction, and at least one first supporting device which is fastened to the inner circumference of said first holding device and is used for supporting a first optical element, an annular circumferential first assembly space being defined by displacing the first supporting device once in a revolving manner along the first circumferential direction. At least one second supporting device which is fixed to the inner circumference of the first holding device is provided for supporting a second optical element, an annular circumferential second assembly space being defined by displacing the second supporting device once in a revolving manner along the first circumferential direction. The first assembly space intersects the second assembly space.
摘要翻译：公开了一种用于透镜的光学模块，特别是微光刻设备，其包括具有沿第一圆周方向延伸的内圆周的第一保持装置和紧固到所述第一保持装置的内圆周的至少一个第一支撑装置并且用于支撑第一光学元件，通过沿着第一圆周方向以旋转方式移位第一支撑装置来限定环形圆周第一组合空间。设置有固定在第一保持装置的内圆周上的至少一个第二支撑装置用于支撑第二光学元件，环形周向第二组合空间通过沿着第一圆周方向以一定旋转方向移动第二支撑装置而被限定方向。第一组装空间与第二组装空间相交。

10. 发明授权

US11194119B2 Optical assembly having a thermally conductive component 有权
公开(公告)号：US11194119B2
公开(公告)日：2021-12-07
申请号：US16701480
申请日：2019-12-03
申请人： Carl Zeiss SMT GmbH
发明人： Julian Kaller , Franz Sorg , Ralf Winter , Karl-Stefan Weissenrieder
IPC分类号： G02B7/02 , G03F7/20 , G02B7/18
摘要： An optical assembly includes: an optical element, which is transmissive or reflective to radiation at a used wavelength and has an optically used region; and a thermally conductive component, which is arranged outside the optically used region of the optical element. The thermally conductive component can include a material having a thermal conductivity of more than 500 W m−1 K−1. Additionally or alternatively, the product of the thickness of the thermally conductive component in millimeters and the thermal conductivity of the material of the thermally conductive component is at least 1 W mm m−1 K−1.

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