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1. 发明授权

US07646906B2 Computer-implemented methods for detecting defects in reticle design data 有权
标题翻译：用于检测标线设计数据缺陷的计算机实现方法
公开(公告)号：US07646906B2
公开(公告)日：2010-01-12
申请号：US11048630
申请日：2005-01-31
申请人： Zain K. Saidin , Yalin Xiong , Lance Glasser , Carl Hess , Moshe E. Preil
发明人： Zain K. Saidin , Yalin Xiong , Lance Glasser , Carl Hess , Moshe E. Preil
IPC分类号： G06K9/00
CPC分类号： G03F1/84 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/705 , G03F7/70533 , G03F7/70616 , G03F7/7065 , G03F7/70666 , G06Q30/0206
摘要： Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.
摘要翻译：提供了用于检测标线设计数据缺陷的计算机实现方法。一种方法包括生成第一模拟图像，其示出如何使用标线制造工艺将掩模版设计数据印刷在掩模版上。该方法还包括使用第一模拟图像生成第二模拟图像。第二模拟图像示出了在晶片印刷过程的一个或多个参数的不同值下如何将掩模版印刷在晶片上。该方法还包括使用第二模拟图像检测掩模版设计数据中的缺陷。除了确定作为不同值的函数的第二模拟图像的特性的变化率之外，另一种方法包括上述生成步骤。该方法还包括基于变化率检测掩模版设计数据中的缺陷。

2. 发明申请

US20060051682A1 Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data 有权
标题翻译：用于模拟标线布局数据，检查标线布局数据以及生成检查标线布局数据的过程的方法
公开(公告)号：US20060051682A1
公开(公告)日：2006-03-09
申请号：US11003291
申请日：2004-12-03
申请人： Carl Hess , Yalin Xiong
发明人： Carl Hess , Yalin Xiong
IPC分类号： G03F1/00
CPC分类号： G03F1/84 , G03F1/36
摘要： Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
摘要翻译：提供了各种计算机实现的方法。用于生成用于检查标线布局数据的处理的一种方法包括识别标线布局数据中的第一区域。第一区域的可印刷性对于工艺参数的改变比在标线布局数据中的第二区域的可印刷性更敏感。该方法还包括将一个或多个检查参数分配给第一区域和第二区域，使得在处理期间将以比第二区域更高的灵敏度对第一区域进行检查。另一种方法包括以比第二区域更高的灵敏度检查第一区域。另外一种方法包括模拟标线布局数据如何打印。利用一个或多个不同的模拟参数来执行第一和第二区域的模拟，使得以比第二区域更高的保真度来模拟第一区域。

3. 发明授权

US08204297B1 Methods and systems for classifying defects detected on a reticle 有权
标题翻译：用于对在掩模版上检测到的缺陷进行分类的方法和系统
公开(公告)号：US08204297B1
公开(公告)日：2012-06-19
申请号：US12394752
申请日：2009-02-27
申请人： Yalin Xiong , Carl Hess
发明人： Yalin Xiong , Carl Hess
IPC分类号： G06K9/00 , G01N21/00
CPC分类号： G01N21/956 , G01N2021/95676 , G03F1/84
摘要： Methods and systems for classifying defects detected on a reticle are provided. One method includes determining an impact that a defect detected on a reticle will have on the performance of a device being fabricated on a wafer based on how at least a portion of the reticle prints or will print on the wafer. The defect is located in the portion of the reticle. The method also includes assigning a classification to the defect based on the impact.
摘要翻译：提供了用于分类在掩模版上检测到的缺陷的方法和系统。一种方法包括基于如何至少一部分标线印刷或将在晶片上印刷，确定在掩模版上检测到的缺陷对于在晶片上制造的器件的性能的影响。缺陷位于光罩的部分。该方法还包括基于影响为缺陷分配分类。

4. 发明授权

US08151220B2 Methods for simulating reticle layout data, inspecting reticle layout data, and generating a process for inspecting reticle layout data 有权
标题翻译：用于模拟标线布局数据，检查标线布局数据以及生成检查标线布局数据的过程的方法
公开(公告)号：US08151220B2
公开(公告)日：2012-04-03
申请号：US11003291
申请日：2004-12-03
申请人： Carl Hess , Yalin Xiong
发明人： Carl Hess , Yalin Xiong
IPC分类号： G06F17/50 , G06F11/22
CPC分类号： G03F1/84 , G03F1/36
摘要： Various computer-implemented methods are provided. One method for generating a process for inspecting reticle layout data includes identifying a first region in the reticle layout data. A printability of the first region is more sensitive to changes in process parameters than a printability of a second region in the reticle layout data. The method also includes assigning one or more inspection parameters to the first region and the second region such that the first region will be inspected during the process with a higher sensitivity than the second region. Another method includes inspecting the first region with a higher sensitivity than the second region. An additional method includes simulating how the reticle layout data will print. Simulation of the first and second regions is performed with one or more different simulation parameters such that the first region is simulated with a higher fidelity than the second region.
摘要翻译：提供了各种计算机实现的方法。用于生成用于检查标线布局数据的处理的一种方法包括识别标线布局数据中的第一区域。第一区域的可印刷性对于工艺参数的改变比在标线布局数据中的第二区域的可印刷性更敏感。该方法还包括将一个或多个检查参数分配给第一区域和第二区域，使得在处理期间将以比第二区域更高的灵敏度对第一区域进行检查。另一种方法包括以比第二区域更高的灵敏度检查第一区域。另外一种方法包括模拟标线布局数据如何打印。利用一个或多个不同的模拟参数来执行第一和第二区域的模拟，使得以比第二区域更高的保真度来模拟第一区域。

5. 发明申请

US20060236294A1 Computer-implemented methods for detecting defects in reticle design data 有权
标题翻译：用于检测标线设计数据缺陷的计算机实现方法
公开(公告)号：US20060236294A1
公开(公告)日：2006-10-19
申请号：US11048630
申请日：2005-01-31
申请人： Zain Saidin , Yalin Xiong , Lance Glasser , Carl Hess , Moshe Preil
发明人： Zain Saidin , Yalin Xiong , Lance Glasser , Carl Hess , Moshe Preil
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G03F1/36 , G03F7/70433 , G03F7/70441 , G03F7/705 , G03F7/70533 , G03F7/70616 , G03F7/7065 , G03F7/70666 , G06Q30/0206
摘要： Computer-implemented methods for detecting defects in reticle design data are provided. One method includes generating a first simulated image illustrating how the reticle design data will be printed on a reticle using a reticle manufacturing process. The method also includes generating second simulated images using the first simulated image. The second simulated images illustrate how the reticle will be printed on a wafer at different values of one or more parameters of a wafer printing process. The method further includes detecting defects in the reticle design data using the second simulated images. Another method includes the generating steps described above in addition to determining a rate of change in a characteristic of the second simulated images as a function of the different values. This method also includes detecting defects in the reticle design data based on the rate of change.
摘要翻译：提供了用于检测标线设计数据缺陷的计算机实现方法。一种方法包括生成第一模拟图像，其示出如何使用标线制造工艺将掩模版设计数据印刷在掩模版上。该方法还包括使用第一模拟图像生成第二模拟图像。第二模拟图像示出了在晶片印刷过程的一个或多个参数的不同值下如何将掩模版印刷在晶片上。该方法还包括使用第二模拟图像检测掩模版设计数据中的缺陷。除了确定作为不同值的函数的第二模拟图像的特性的变化率之外，另一种方法包括上述生成步骤。该方法还包括基于变化率检测掩模版设计数据中的缺陷。

6. 发明授权

US08611637B2 Wafer plane detection of lithographically significant contamination photomask defects 有权
标题翻译：晶圆平面检测光刻显着污染光掩模缺陷
公开(公告)号：US08611637B2
公开(公告)日：2013-12-17
申请号：US12871813
申请日：2010-08-30
申请人： Ruifang Shi , Yalin Xiong
发明人： Ruifang Shi , Yalin Xiong
IPC分类号： G06K9/00
CPC分类号： G03F1/84
摘要： Provided are novel methods and systems for inspecting photomasks to identify lithographically significant contamination defects. Inspection may be performed without a separate reference image provided from a database or another die. Inspection techniques described herein involve capturing one or more test images of a photomask and constructing corresponding test “simulation” images using specific lithographic and/or resist models. These test simulation images simulate printable and/or resist patterns of the inspected photomask. Furthermore, the initial test images are used in parallel operations to generate “synthetic” images. These images represent a defect-free photomask pattern. The synthetic images are then used for generating reference simulation images, which are similar to the test simulation images but are free from lithographically significant contamination defects. Finally, the reference simulation images are compared to the test simulation images to identify the lithographically significant contamination defects on the photomask.
摘要翻译：提供了用于检查光掩模以识别光刻显着的污染缺陷的新颖方法和系统。可以在没有从数据库或另一个芯片提供的单独的参考图像的情况下执行检查。本文描述的检查技术涉及捕获光掩模的一个或多个测试图像，并使用特定光刻和/或抗蚀剂模型构建对应的测试“模拟”图像。这些测试模拟图像模拟被检查光掩模的可打印和/或抗蚀图案。此外，初始测试图像用于并行操作以产生“合成”图像。这些图像表示无缺陷的光掩模图案。然后，合成图像用于产生参考模拟图像，其类似于测试模拟图像，但是没有光刻显着的污染缺陷。最后，将参考模拟图像与测试模拟图像进行比较，以识别光掩模上的光刻显着的污染缺陷。

7. 发明申请

US20110118132A1 Enzymatic Assays Using Umbelliferone Substrates with Cyclodextrins in Droplets of Oil 有权
标题翻译：使用伞形酮底物与环糊精在油滴中的酶检测
公开(公告)号：US20110118132A1
公开(公告)日：2011-05-19
申请号：US13012831
申请日：2011-01-25
申请人： Theodore Winger , Allen E. Eckhardt , Carrie Graham , Ramakrishna Sista , Vamsee K. Pamula , Tong Wang , Yalin Xiong , Ning Wu , Sanjay Saha , Gajendrasinh Balvantsinh Raolji , Raveendra Dayam
发明人： Theodore Winger , Allen E. Eckhardt , Carrie Graham , Ramakrishna Sista , Vamsee K. Pamula , Tong Wang , Yalin Xiong , Ning Wu , Sanjay Saha , Gajendrasinh Balvantsinh Raolji , Raveendra Dayam
IPC分类号： C40B30/00 , C12Q1/00
CPC分类号： C12Q1/00
摘要： The invention is directed to droplet actuator devices and assay methods. The method may include, among other things, a method of conducting enzymatic assays using umbelliferone substrates with cyclodextrins in droplets in oil, the method including incubating a droplet in oil, the droplet preferably comprising an umbelliferone substrate, a sample, and a cyclodextrin compound. The methods may further include a method of substantially eliminating cross-contamination between droplets in enzymatic containing substrate-based bioassays. The method may include immobilization of the enzymatic substrate including forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the inclusion complex may be formed using cyclodextrins. In yet another embodiment, the invention may provide a method of enhancing hydrolysis of enzymatic substrates. The methods may further include a method of forming an inclusion complex with the substrate for stabilizing the substrate within an aqueous environment, wherein the substrate may be a 4-MU- or HMU containing substrate. The inclusion complex may be formed using cyclodextrin.
摘要翻译：本发明涉及液滴致动器装置和测定方法。该方法尤其可以包括使用具有环糊精的伞形酮底物在油中的液滴进行酶测定的方法，所述方法包括将液滴在油中孵育，所述液滴优选包含伞形酮底物，样品和环糊精化合物。所述方法还可以包括基本上消除含酶底物生物测定中的液滴之间的交叉污染的方法。该方法可以包括固定酶底物，包括与底物形成包合物以使其在水性环境中稳定，其中包合物可以使用环糊精形成。在另一个实施方案中，本发明可提供增强酶底物水解的方法。所述方法还可以包括在水性环境中与基材形成包含配合物以稳定基材的方法，其中所述基材可以是含有4-MU-或HMU的底物。包合物可以使用环糊精形成。

8. 发明授权

US06754379B2 Aligning rectilinear images in 3D through projective registration and calibration 有权
标题翻译：通过投影注册和校准对齐3D中的直线图像
公开(公告)号：US06754379B2
公开(公告)日：2004-06-22
申请号：US10370280
申请日：2003-02-18
申请人： Yalin Xiong , Ken Turkowski
发明人： Yalin Xiong , Ken Turkowski
IPC分类号： G06K900
CPC分类号： G06T15/506 , G06K9/32 , G06K2009/2045 , G06T3/4038 , G06T7/32 , G06T15/503
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

9. 发明授权

US06434265B1 Aligning rectilinear images in 3D through projective registration and calibration 有权
标题翻译：通过投影注册和校准对齐3D中的直线图像
公开(公告)号：US06434265B1
公开(公告)日：2002-08-13
申请号：US09160822
申请日：1998-09-25
申请人： Yalin Xiong , Ken Turkowski
发明人： Yalin Xiong , Ken Turkowski
IPC分类号： G06K900
CPC分类号： G06T15/506 , G06K9/32 , G06K2009/2045 , G06T3/4038 , G06T7/32 , G06T15/503
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

10. 发明授权

US06359617B1 Blending arbitrary overlaying images into panoramas 有权
标题翻译：将任意叠加图像混合到全景图中
公开(公告)号：US06359617B1
公开(公告)日：2002-03-19
申请号：US09160823
申请日：1998-09-25
申请人： Yalin Xiong
发明人： Yalin Xiong
IPC分类号： G06T1700
CPC分类号： G06T3/4038 , G06T3/0068 , G06T5/50 , G06T7/30 , G06T15/10
摘要： An improved apparatus and method for creating high quality virtual reality panoramas is disclosed that yields dramatic improvements during the authoring and projecting cycles, with speeds up to several orders of magnitude faster than prior systems. In a preferred embodiment, a series of rectilinear images taken from a plurality of rows are pairwise registered with one another, and locally optimized using a pairwise objective function (local error function) that minimizes certain parameters in a projective transformation, using an improved iterative procedure. The local error function values for the pairwise registrations are then saved and used to construct a quadratic surface to approximate a global optimization function (global error function). The chain rule is used to avoid the direct evaluation of the global objective function, saving computation. In one embodiment concerning the blending aspect of the present invention, an improved procedure is described that relies on Laplacian and Gaussian pyramids, using a blend mask whose boundaries are determined by the grassfire transform. An improved iterative procedure is disclosed for the blending that also determines at what level of the pyramid to perform blending, and results in low frequency image components being blended over a wider region and high frequency components being blended over a narrower region. Human interaction and input is also provided to allow manual projective registration, initial calibration and feedback in the selection of photos and convergence of the system.
摘要翻译：公开了一种用于创建高质量虚拟现实全景的改进的装置和方法，其在创作和投影周期期间产生显着的改进，其速度比现有系统快达几个数量级。在优选实施例中，从多个行中取出的一系列直线图像彼此成对配准，并且使用使投影变换中的某些参数最小化的成对目标函数（局部误差函数）进行局部优化，使用改进的迭代程序。然后保存成对注册的局部误差函数值，并用于构造二次曲面以近似全局优化函数（全局误差函数）。链规则用于避免对全局目标函数的直接评估，从而节省计算量。在关于本发明的混合方面的一个实施例中，描述了依赖于拉普拉斯算子和高斯金字塔的改进方法，其使用边界由草火变换确定的混合掩模。公开了一种改进的迭代过程，用于混合，其也确定在什么级别的金字塔进行混合，并且导致低频图像分量在较宽区域上混合，并且高频分量被混合在较窄区域上。还提供人工交互和输入，以便在选择照片和系统融合时进行手动投影注册，初始校准和反馈。

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