会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明授权
    • Furnace for practising temperature gradient zone melting
    • 用于实施温度梯度区熔化的炉
    • US4097226A
    • 1978-06-27
    • US735513
    • 1976-10-26
    • Carl A. EriksonJohn O. FieldingHarvey E. ClineThomas R. Anthony
    • Carl A. EriksonJohn O. FieldingHarvey E. ClineThomas R. Anthony
    • C30B13/24F24J3/00
    • C30B13/24
    • A furnace for practising temperature gradient zone melting on one or more semiconductor bodies comprises a closable work chamber for receiving semiconductor bodies for processing, a radiant heat source which forms a first closure member and a heat sink which forms a second closure member, the closure members defining the work chamber and being mutually separable by, for example, a hydraulic actuator to allow access to the interior of the work chamber. A reflector is disposed between the heat source and heat sink in surrounding relationship to the semiconductor bodies being processed to ensure the maintenance of a uniform temperature gradient within the work chamber. The reflector and the heat sink are liquid cooled for the effective removal of heat therefrom. The heat sink is further provided with a plurality of radiation attenuating cavities to enhance the performance of the heat sink.
    • 用于在一个或多个半导体主体上实施温度梯度区熔化的炉包括用于接收用于处理的半导体体的可关闭工作室,形成第一闭合构件的辐射热源和形成第二闭合构件的散热器,所述闭合构件 限定工作室,并且可通过例如液压致动器相互分离以允许进入工作室的内部。 反射器设置在热源和散热器之间,与处理的半导体主体相关联,以确保在工作室内保持均匀的温度梯度。 反射器和散热器被液体冷却以有效地从其中去除热量。 散热器还设置有多个辐射衰减腔,以增强散热器的性能。