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1. 发明授权

US09430597B2 Method for estimating patterns to be printed on a plate or mask by means of electron-beam lithography and corresponding printing device 有权
标题翻译：用于通过电子束光刻法和对应的印刷装置估计印刷在印版或掩模上的图案的方法
公开(公告)号：US09430597B2
公开(公告)日：2016-08-30
申请号：US14100484
申请日：2013-12-09
申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT , ASELTA NANOGRAPHICS
发明人： Jerome Belledent
IPC分类号： G06F19/00 , G06F17/50 , G03F7/20 , H01J37/317 , G03F1/82
CPC分类号： G06F17/5045 , G03F1/82 , G03F7/2061 , G03F7/70441 , G03F7/70491 , H01J37/3174 , H01J2237/31754 , H01J2237/31769
摘要： This method for estimating patterns (M′PF,D′PF) to be printed by means of electron-beam lithography, comprises the following steps: printing (100), in a resin, a set of calibration patterns (MCF, DCF); measuring (120) characteristic dimensions (CD) of this set; supplying an estimation (140) of the point spread function (PSF) based on the characteristic dimensions (CD) measured; estimating (160) the patterns (M′PF,D′PF) to be printed by convoluting the point spread function (PSF) supplied with an initial value of the patterns (MPF,DPF).Furthermore, each calibration pattern printed includes a central zone exposed to the electron beam and a plurality of surrounding concentric zones with rotational symmetry. The characteristic dimensions measured are characteristic dimensions (CD) of the central zones of the patterns. The estimation of the point spread function (PSF) is calculated by inverting analytical modelling of the effect, on these characteristic dimensions, of applying the first point spread function portion (PSFBE) characterising electrons back-scattered by the substrate to the set of calibration patterns (MCF, DCF).
摘要翻译：用于估计通过电子束光刻印刷的图案（M'PF，D'PF）的方法包括以下步骤：在树脂中印刷（100）一组校准图案（MCF，DCF）; 测量（120）该组的特征尺寸（CD）; 基于测量的特征尺寸（CD）提供点扩散函数（PSF）的估计（140）; 通过对提供有模式（MPF，DPF）的初始值的点扩散函数（PSF）进行卷积来估计（160）要打印的图案（M'PF，D'PF）。此外，印刷的每个校准图案包括暴露于电子束的中心区域和具有旋转对称性的多个周围的同心区域。测量的特征尺寸是图案的中心区域的特征尺寸（CD）。通过将表征由衬底反向散射的电子的第一点扩散函数部分（PSFBE）应用于该组校准图案来反映点扩散函数（PSF）的估计，通过反映对这些特征尺寸的影响的分析建模，（MCF，DCF）。

2. 发明授权

US09542505B2 Method and system for preparing a pattern to be printed on a plate or mask by electron beam lithography 有权
标题翻译：用于通过电子束光刻制备印刷在板或掩模上的图案的方法和系统
公开(公告)号：US09542505B2
公开(公告)日：2017-01-10
申请号：US13967740
申请日：2013-08-15
申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT , ASELTA NANOGRAPHICS
发明人： Jerome Belledent
IPC分类号： G06F17/50 , G03F7/20 , H01J37/317 , B82Y10/00 , B82Y40/00 , G03F1/70
CPC分类号： G06F17/50 , B82Y10/00 , B82Y40/00 , G03F1/70 , G03F7/2063 , H01J37/3174 , H01J2237/31764
摘要： A method for preparing a pattern to be printed on a plate or mask by electron beam lithography comprising the following steps: modelling of the pattern by breaking down this pattern into a set of elementary geometric shapes intended to be printed individually in order to reproduce said pattern and, for each elementary geometric shape of the model; determination of an electrical charge dose to be applied to the electron beam during the individual printing of the elementary shape, this dose being chosen from a discrete set of doses including several non-zero predetermined doses recorded in memory. The set of elementary geometric shapes is a bidimensional paving of identical elementary geometric shapes covering the pattern to be printed. In addition, when the doses to be applied to the elementary geometric shapes are determined, a discretization error correction is made by dithering.
摘要翻译：一种用于通过电子束光刻制备印刷在印版或掩模上的图案的方法，包括以下步骤：通过将该图案分解为旨在单独印刷的一组基本几何形状来模拟图案，以便再现所述图案并且，对于模型的每个基本几何形状; 在基本形状的单独打印期间确定要施加到电子束的电荷剂量，该剂量从包括记录在存储器中的几个非零预定剂量的离散剂量集合中选择。基本几何形状的集合是覆盖待印刷图案的相同基本几何形状的二维铺路。此外，当确定要施加到基本几何形状的剂量时，通过抖动进行离散化误差校正。

3. 发明申请

US20150100287A1 METHOD FOR SIMULATING THE SELF-ASSEMBLY OF BLOCK COPOLYMERS IN ORDER TO DESIGN A PRINTED CIRCUIT, CORRESPONDING DESIGN METHOD, DESIGN SYSTEM AND COMPUTER PROGRAM 审中-公开
标题翻译：用于模拟块状共聚物自组装方法设计印刷电路，相关设计方法，设计系统和计算机程序
公开(公告)号：US20150100287A1
公开(公告)日：2015-04-09
申请号：US14390679
申请日：2013-04-04
申请人： COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENE ALT
发明人： Jerome Belledent
IPC分类号： G06F17/50 , G06F19/00
CPC分类号： G06F17/5009 , G16C20/10
摘要： A method for simulating a placement of patterns by self-assembly of block copolymers in a contour printed on a plate by lithography includes: extraction of geometric parameters of the contour recorded in a memory; selection, by a processor having access to the memory, of at least one local extremum of an interference figure produced inside the contour on the basis of the geometric parameters of the contour by applying a model for propagation of waves interfering with one another; and provision, by the processor and on the basis of the local extremum, of parameters for placement of at least one pattern intended to be obtained by self-assembly of block copolymers within the contour.
摘要翻译：通过光刻印刷在板上的轮廓中通过嵌段共聚物的自组装来模拟图案的放置方法包括：提取记录在记忆体中的轮廓的几何参数; 通过应用用于相互干扰的波的传播的模型，根据轮廓的几何参数，通过具有对存储器的访问的处理器选择在轮廓内产生的干涉图的至少一个局部极值; 并且通过处理器并且基于局部极值提供用于放置旨在通过在轮廓内自组装嵌段共聚物获得的至少一种图案的参数。

4. 发明申请

US20140172386A1 Simulation Of Shot-Noise Effects In A Particle-Beam Lithography Process And Especially An E-Beam Lithography Process 审中-公开
标题翻译：粒子束光刻过程中特别是电子束光刻过程中的射击噪声效应的模拟
公开(公告)号：US20140172386A1
公开(公告)日：2014-06-19
申请号：US14105648
申请日：2013-12-13
申请人： Aselta Nanographics , Commissariat A L'Energie Atomique Et Aux Energies Alternatives
发明人： Jerome Belledent
IPC分类号： G06F17/50
CPC分类号： G06F17/5009 , G03F7/705 , G03F7/70558 , G03F7/70625 , H01J2237/31793
摘要： Method for simulating shot-noise effects in a particle-beam lithography process, and especially an e-beam lithography process, the process including depositing particles on the surface of a sample in a preset pattern by a beam of the particles, the pattern being subdivided into pixels and a nominal dose of particles being associated with each of the pixels, wherein the process includes the calculation of a map σd of standard deviation in the normalized dose actually deposited in each of the pixels, the map of standard deviation being calculated from a map M0 of the nominal dose associated with each pixel and a point spread function PSF characterizing the process; the method being implemented by computer. Computer program product for implementing and computer programmed to implement such a method. Particle-beam lithography process, and especially an e-beam lithography process, having a prior operation of simulating shot-noise effects using such a method.
摘要翻译：用于模拟粒子束光刻工艺中的散粒噪声效应的方法，特别是电子束光刻工艺，该方法包括通过颗粒束将预定图案中的颗粒沉积在样品的表面上，该图案被细分到像素中并且与每个像素相关联的标称剂量的颗粒，其中该过程包括计算实际沉积在每个像素中的标准化剂量中的标准偏差的映射和标准差，计算标准偏差的映射从与每个像素相关联的标称剂量的映射M0和表征该过程的点扩散函数PSF; 该方法由计算机实现。计算机程序产品实现和计算机程序化实现这种方法。粒子束光刻工艺，特别是电子束光刻工艺，具有使用这种方法模拟散粒噪声效应的先前操作。

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