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1. 发明申请

US20200350176A1 CHEMICAL AGENT FOR FORMING WATER REPELLENT PROTECTIVE FILM AND SURFACE TREATMENT METHOD FOR WAFERS 审中-公开
公开(公告)号：US20200350176A1
公开(公告)日：2020-11-05
申请号：US16957331
申请日：2018-12-26
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Yuki FUKUI , Yoshiharu TERUI , Shuhei YAMADA , Yuzo OKUMURA , Soichi KUMON , Saori SHIOTA , Katsuya KONDO
IPC分类号： H01L21/306 , H01L21/02 , C07F7/10
摘要： According to the present disclosure, there is provided a water-repellent protective film-forming liquid chemical capable of achieving an improved water repellency imparting effect. The water-repellent protective film-forming liquid chemical according to the present disclosure contains the following compositions: (I) an aminosilane composition of the following general formula [1]; (II) a silicon compound of the following general formula [2]; and (III) an aprotic solvent, wherein the amount of the component (I) contained is 0.02 to 0.5 mass % based on the total amount of the components (I) to (III). (R1)aSi(H)b(NH2)4-a-b [1] (R2)cSi(H)dX4-c-d [2]

2. 发明申请

US20200339611A1 WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD 审中-公开
公开(公告)号：US20200339611A1
公开(公告)日：2020-10-29
申请号：US16962164
申请日：2019-02-05
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Yuzo OKUMURA , Katsuya KONDO , Shuhei YAMADA , Atsushi RYOKAWA , Yuki FUKUI
IPC分类号： C07F7/10 , C09D5/00 , H01L21/304
摘要： The present invention is directed to a novel water-repellent protective film-forming agent and a novel water-repellent protective film-forming liquid chemical, each of which is for forming a water-repellent protective film on a silicon element-containing surface of a wafer, and a method of surface-treating a wafer with the use of the agent in liquid form or the liquid chemical. The water-repellent protective film-forming agent according to the present invention includes at least one kind of silicon compound selected from the group consisting of guanidine derivatives of the following general formula [1] and amidine derivatives of the following general formula [2].

3. 发明申请

US20140339321A1 PRESSURE FEED CONTAINER, STORAGE METHOD USING THE PRESSURE FEED CONTAINER, AND METHOD FOR TRANSFERRING LIQUID USING THE PRESSURE FEED CONTAINER 审中-公开
公开(公告)号：US20140339321A1
公开(公告)日：2014-11-20
申请号：US14280964
申请日：2014-05-19
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Atsushi RYOKAWA , Shuhei YAMADA , Masahiro FUJITANI , Yosuke HASHIMOTO , Chiaki IDETA , Soichi KUMON , Masanori SAITO , Takashi SAIO
IPC分类号： B05B9/04 , B65B31/00
CPC分类号： B65B31/00 , H01L21/67017
摘要： The present invention provides a pressure feed container capable of ensuring the cleanliness of a liquid such as a protective film-forming liquid chemical or a protective film-forming liquid chemical kit for preparing the liquid chemical even after long-term storage, and also capable of suppressing electrostatic charge in the liquid. The present invention provides a pressure feed container configured to store a protective film-forming liquid chemical or a protective film-forming liquid chemical kit that is mixed into the protective film-forming liquid chemical, and to transfer a liquid upon application of pressure to the inside of the container, the protective film-forming liquid chemical being for forming a water-repellent protective film on at least surfaces of recessed portions of an uneven pattern formed on a surface of a wafer containing a silicon element at least at a part of the uneven pattern. The protective film-forming liquid chemical contains a nonaqueous organic solvent, a silylation agent, and an acid or a base; the protective film-forming liquid chemical kit includes a treatment liquid A containing a nonaqueous organic solvent and a silylation agent, and a treatment liquid B containing a nonaqueous organic solvent and an acid or a base; the pressure feed container includes a container body configured to contain a liquid selected from the protective film-forming liquid chemical, the treatment liquid A, and the treatment liquid B, and a liquid flowing nozzle configured such that the liquid flows therethrough to be introduced into the container body and/or to be extracted from the container body; the container body includes a metal can body in which a portion configured to contact the liquid is formed from a resin material; the liquid flowing nozzle is provided with a neutralization mechanism configured to reduce electrostatic potential in the liquid; and a liquid contact portion of the liquid flowing nozzle excluding the neutralization mechanism is formed from a resin material.

4. 发明公开

US20240287103A1 WATER-REPELLENT PROTECTIVE FILM-FORMING AGENT, WATER-REPELLENT PROTECTIVE FILM-FORMING CHEMICAL SOLUTION, AND WAFER SURFACE TREATMENT METHOD 审中-公开
公开(公告)号：US20240287103A1
公开(公告)日：2024-08-29
申请号：US18583454
申请日：2024-02-21
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Yuzo OKUMURA , Katsuya KONDO , Shuhei YAMADA , Atsushi RYOKAWA , Yuki FUKUI
IPC分类号： C07F7/10 , C09D5/00 , H01L21/304
CPC分类号： C07F7/10 , C09D5/00 , H01L21/304
摘要： The present invention is directed to a novel water-repellent protective film-forming agent and a novel water-repellent protective film-forming liquid chemical, each of which is for forming a water-repellent protective film on a silicon element-containing surface of a wafer, and a method of surface-treating a wafer with the use of the agent in liquid form or the liquid chemical. The water-repellent protective film-forming agent according to the present invention includes at least one kind of silicon compound selected from the group consisting of guanidine derivatives of the following general formula [1] and amidine derivatives of the following general formula [2].

5. 发明申请

US20160148802A1 Liquid Chemical for Forming Protecting Film 有权
标题翻译：用于形成保护膜的液体化学品
公开(公告)号：US20160148802A1
公开(公告)日：2016-05-26
申请号：US14952354
申请日：2015-11-25
申请人： Central Glass Company, Limited
发明人： Soichi KUMON , Takashi SAIO , Shinobu ARATA , Masanori SAITO , Atsushi RYOKAWA , Shuhei YAMADA , Hidehisa NANAI , Yoshinori AKAMATSU
IPC分类号： H01L21/02 , B08B3/10 , B08B3/08
CPC分类号： H01L21/02057 , B08B3/08 , B08B3/10 , C09K3/18 , C11D1/82 , C11D3/162 , C11D11/0047 , H01L21/02082
摘要： Disclosed is a liquid chemical for forming a water-repellent protecting film at least on a surface of a recessed portion of an uneven pattern at the time of cleaning a wafer having a finely uneven pattern at its surface and containing silicon at at least a part of the uneven pattern. This liquid chemical contains a silicon compound A represented by the general formula: R1aSi(H)bX4-a-b and an acid A, the acid A being at least one selected from the group consisting of trimethylsilyl trifluoroactate, trimethylsilyl trifluoromethanesulfonate, dimethylsilyl trifluoroactate, dimethylsilyl trifluoromethanesulfonate, butyldimethylsilyl trifluoroactate, butyldimethylsilyl trifluoromethanesulfonate, hexyldimethylsilyl trifluoroacetate, hexyldimethylsilyl trifluoromethanesulfonate, octyldimethylsilyl trifluoroactate, octyldimethylsilyl trifluoromethanesulfonate, decyldimethylsilyl trifluoroacetate and decyldimethylsilyl trifluoromethanesulfonate.
摘要翻译：公开了一种液体化学品，用于至少在凹凸图案的凹陷部分的表面上在其表面上清洁具有精细不均匀图案的晶片的表面上形成防水保护膜，并且在至少部分不均匀的图案。该液体化学品含有由通式R1aSi（H）bX4-ab表示的硅化合物A和酸A，酸A为选自三甲基甲硅烷基三氟甲酸三甲基甲硅烷基酯，三氟甲磺酸三甲基甲硅烷基酯，三氟甲磺酸二甲基甲硅烷基酯，三氟甲磺酸二甲基甲硅烷基酯丁基二甲基甲硅烷基三氟甲酸酯，丁基二甲基甲硅烷基三氟甲磺酸酯，己基二甲基甲硅烷基三氟乙酸酯，己基二甲基甲硅烷基三氟甲磺酸酯，辛基二甲基甲硅烷基三氟甲酸酯，辛基二甲基甲硅烷基三氟甲磺酸酯，癸基二甲基甲硅烷基三氟乙酸酯和癸基二甲基甲硅烷基三氟甲磺酸酯。

6. 发明申请

US20200339850A1 CHEMICAL SOLUTION FOR FORMING WATER-REPELLENT PROTECTIVE FILM, METHOD FOR PREPARING SAME, AND METHOD FOR MANUFACTURING SURFACE-TREATED BODY 审中-公开
公开(公告)号：US20200339850A1
公开(公告)日：2020-10-29
申请号：US16962159
申请日：2019-02-05
申请人： CENTRAL GLASS COMPANY, LIMITED
发明人： Yuzo OKUMURA , Katsuya KONDO , Shuhei YAMADA , Atsushi RYOKAWA , Yuki FUKUI
IPC分类号： C09K3/18 , H01L21/304 , H01L21/306
摘要： The present invention is directed to a liquid chemical for forming a water-repellent protective film on a silicon element-containing wafer surface, a method of preparing the liquid chemical and a method of manufacturing a surface-treated body with the use of the liquid chemical, wherein the liquid chemical includes the following components: (I) a silylation agent; (II) at least one kind of nitrogen-containing compound selected from the group consisting of those of the following general formulas [1] and [2]; and (III) an organic solvent.

7. 发明申请

US20170062203A1 Method of Preparing Liquid Chemical for Forming Protective Film 审中-公开
标题翻译：制备液体化学品形成保护膜的方法
公开(公告)号：US20170062203A1
公开(公告)日：2017-03-02
申请号：US15348383
申请日：2016-11-10
申请人： Central Glass Company, Limited
发明人： Atsushi RYOKAWA , Shuhei YAMADA , Masahiro FUJITANI , Soichi KUMON , Masanori SAITO , Takashi SAIO , Shinobu ARATA
IPC分类号： H01L21/02 , C09D7/12 , B08B3/08
CPC分类号： H01L21/0206 , B08B3/08 , C09D7/63 , H01L21/02057 , H01L21/3105 , H01L23/296 , H01L2924/0002 , H01L2924/00
摘要： [Problem] To provide a method for preparing a protective film-forming liquid chemical, in a method for producing a wafer having at its surface an uneven pattern and containing silicon element at least at a part of the uneven pattern. The liquid chemical forms a water-repellent protective film on the uneven pattern of the wafer and improves a cleaning step which tends to induce a pattern collapse, and particularly provides a good persistence (pot life) of the improving effect.[Solution] A method for preparing a liquid chemical for forming a water-repellent protective film, the liquid chemical being for forming a water-repellent protective film at the time of cleaning the wafer at least on surfaces of recessed portions of the uneven pattern, the liquid chemical containing a nonaqueous organic solvent, a silylation agent, and an acid or base. The method for preparing a liquid chemical for forming a water-repellent protective film is characterized by including: a dehydrating step for adjusting a water content of the nonaqueous organic solvent to 200 mass ppm or less; and a mixing step for mixing the nonaqueous organic solvent, the silylation agent, and the acid or base after the dehydrating step.
摘要翻译：本文公开了一种制备用于形成防水保护膜的液体化学品的方法，该液体化学品用于在其表面上清洁具有不均匀图案并且含有硅元素的晶片时形成防水保护膜至少在不均匀图案的凹陷部分的至少在表面上的凹凸图案的一部分，液体化学品含有非水有机溶剂，甲硅烷基化剂和酸或碱。该方法包括（i）通过脱水将非水有机溶剂的水分调节至200质量ppm以下; 和（ii）在调整步骤之后混合非水有机溶剂，甲硅烷基化剂和酸或碱。

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