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1. 发明授权

US10622184B2 Objective lens arrangement usable in particle-optical systems 有权
公开(公告)号：US10622184B2
公开(公告)日：2020-04-14
申请号：US15632658
申请日：2017-06-26
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL, LTD.
发明人： Rainer Knippelmeyer , Stefan Schubert
IPC分类号： H01J37/141 , H01J37/28 , H01J37/145 , H01J37/20 , H01J37/21 , H01J37/24
CPC分类号： H01J37/141 , H01J37/145 , H01J37/20 , H01J37/21 , H01J37/24 , H01J37/28 , H01J2237/002 , H01J2237/04922 , H01J2237/04926 , H01J2237/12 , H01J2237/1215 , H01J2237/14 , H01J2237/141 , H01J2237/1405 , H01J2237/1415 , H01J2237/2817
摘要： An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

2. 发明授权

US10354831B2 Charged particle inspection method and charged particle system 有权
公开(公告)号：US10354831B2
公开(公告)日：2019-07-16
申请号：US15137796
申请日：2016-04-25
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd
发明人： Thomas Kemen , Rainer Knippelmeyer , Stefan Schubert
IPC分类号： H01J37/04 , H01J37/09 , H01J37/317 , H01J37/145 , H01J37/147 , H01J37/244
摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.

3. 发明申请

US20140158902A1 Particle-Optical Systems and Arrangements and Particle-Optical Components for such Systems and Arrangements 有权
标题翻译：这种系统和布置的粒子 - 光学系统和布置和粒子 - 光学部件
公开(公告)号：US20140158902A1
公开(公告)日：2014-06-12
申请号：US14165573
申请日：2014-01-27
申请人： Applied Materials Israel, Ltd. , Carl Zeiss Microscopy GmbH
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： H01J37/30 , H01J37/317 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

4. 发明授权

US10504681B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
公开(公告)号：US10504681B2
公开(公告)日：2019-12-10
申请号：US15608229
申请日：2017-05-30
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL LTD.
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/28 , H01J37/317 , H01J37/14 , H01J37/10 , H01J37/30 , H01J37/153
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/047 , H01J2237/0435 , H01J2237/0453 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

5. 发明授权

US09324537B2 Charged particle inspection method and charged particle system 有权
标题翻译：带电粒子检测方法和带电粒子系统
公开(公告)号：US09324537B2
公开(公告)日：2016-04-26
申请号：US14309452
申请日：2014-06-19
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Thomas Kemen , Rainer Knippelmeyer , Stefan Schubert
IPC分类号： H01J37/00 , H01J37/04 , H01J37/09 , H01J37/317
CPC分类号： H01J37/04 , H01J37/045 , H01J37/09 , H01J37/145 , H01J37/147 , H01J37/244 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/04922 , H01J2237/04924 , H01J2237/04926 , H01J2237/15 , H01J2237/2446 , H01J2237/2448 , H01J2237/2561 , H01J2237/2817 , H01J2237/31774
摘要： The present invention relates to a charged particle system comprising: a charged particle source; a first multi aperture plate; a second multi aperture plate disposed downstream of the first multi aperture plate, the second multi aperture plate; a controller configured to selectively apply at least first and second voltage differences between the first and second multi aperture plates; wherein the charged particle source and the first and second multi aperture plates are arranged such that each of a plurality of charged particle beamlets traverses an aperture pair, said aperture pair comprising one aperture of the first multi aperture plate and one aperture of the second multi aperture plate, wherein plural aperture pairs are arranged such that a center of the aperture of the first multi aperture plate is, when seen in a direction of incidence of the charged particle beamlet traversing the aperture of the first multi aperture plate, displaced relative to a center of the aperture of the second multi aperture plate. The invention further pertains to a particle-optical component configured to change a divergence of a set of charged particle beamlets and a charged particle inspection method comprising inspection of an object using different numbers of charged particle beamlets.
摘要翻译：带电粒子系统本发明涉及一种带电粒子系统，包括：带电粒子源; 第一个多孔板; 设置在所述第一多孔板的下游的第二多孔板，所述第二多孔板; 控制器，被配置为选择性地施加所述第一和第二多孔板之间的至少第一和第二电压差; 其中所述带电粒子源和所述第一和第二多孔径孔布置成使得多个带电粒子子束中的每一个穿过孔径对，所述孔径对包括所述第一多孔板的一个孔和所述第二多孔的一个孔板，其中多个孔径对布置成使得当穿过穿过第一多孔板的孔的带电粒子束的入射方向从第一多孔板的孔的中心相对于中心位移时，第一多孔板的孔的中心的第二多孔板的孔径。本发明还涉及一种构造成改变一组带电粒子子束的发散度的粒子光学部件，以及包括使用不同数量的带电粒子子束检查物体的带电粒子检查方法。

6. 发明授权

US09224576B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
标题翻译：用于这种系统和布置的粒子 - 光学系统和布置以及粒子 - 光学部件
公开(公告)号：US09224576B2
公开(公告)日：2015-12-29
申请号：US14165573
申请日：2014-01-27
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： G21K5/10 , H01J37/08 , H01J37/30 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/28 , H01J37/317 , H01J37/14 , H01J37/10
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.
摘要翻译：粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

7. 发明授权

US11527379B2 Objective lens arrangement usable in particle-optical systems 有权
公开(公告)号：US11527379B2
公开(公告)日：2022-12-13
申请号：US16845992
申请日：2020-04-10
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL, LTD.
发明人： Rainer Knippelmeyer , Stefan Schubert
IPC分类号： H01J37/28 , H01J37/141 , H01J37/145 , H01J37/20 , H01J37/21 , H01J37/24
摘要： An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

8. 发明授权

US10541112B2 Charged particle beam system and method of operating the same 有权
公开(公告)号：US10541112B2
公开(公告)日：2020-01-21
申请号：US16176392
申请日：2018-10-31
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Stefan Schubert , Thomas Kemen , Rainer Knippelmeyer
IPC分类号： H01J37/28 , H01J37/147
摘要： A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.

9. 发明授权

US09673024B2 Particle-optical systems and arrangements and particle-optical components for such systems and arrangements 有权
公开(公告)号：US09673024B2
公开(公告)日：2017-06-06
申请号：US14975314
申请日：2015-12-18
申请人： CARL ZEISS MICROSCOPY GMBH , APPLIED MATERIALS ISRAEL LTD.
发明人： Rainer Knippelmeyer , Oliver Kienzle , Thomas Kemen , Heiko Mueller , Stephan Uhlemann , Maximilian Haider , Antonio Casares , Steven Rogers
IPC分类号： H01J37/30 , H01J37/10 , H01J37/147 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/28 , H01J37/317 , H01J37/14
CPC分类号： H01J37/04 , B82Y10/00 , B82Y40/00 , H01J37/09 , H01J37/10 , H01J37/14 , H01J37/153 , H01J37/28 , H01J37/3007 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/047 , H01J2237/04735 , H01J2237/04756 , H01J2237/06 , H01J2237/14 , H01J2237/2817 , H01J2237/31774
摘要： A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

10. 发明授权

US10121635B2 Charged particle beam system and method of operating the same 有权
公开(公告)号：US10121635B2
公开(公告)日：2018-11-06
申请号：US15026189
申请日：2014-09-30
申请人： Carl Zeiss Microscopy GmbH , Applied Materials Israel, Ltd.
发明人： Stefan Schubert , Thomas Kemen , Rainer Knippelmeyer
IPC分类号： H01J37/28 , H01J37/147
摘要： A method of operating a charged particle beam system, the method comprises extracting a particle beam from a source; performing a first accelerating of the particles of the beam; forming a plurality of particle beamlets from the beam after the performing of the first accelerating; performing a second accelerating of the particles of the beamlets; performing a first decelerating of the particles of the beamlets after the performing of the second accelerating; deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets after the performing of the first decelerating; performing a second decelerating of the particles of the beamlets after the deflecting of the beamlets; and allowing the particles of the beamlets to be incident on an object surface after the performing of the second decelerating.

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