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    • 5. 发明授权
    • Pattern determining method, pattern determining apparatus and storage medium
    • 模式确定方法,模式确定装置和存储介质
    • US08839169B2
    • 2014-09-16
    • US13685791
    • 2012-11-27
    • Canon Kabushiki Kaisha
    • Yuichi GyodaKoji Mikami
    • G06F17/50G03F1/70
    • G03F1/70G06F17/50
    • A method of determining a pattern of a mask to be used in an exposure apparatus. The mask is arranged on an object plane of a projection optical system. The method includes calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, calculating a value of a second evaluation function used to evaluate an image of the provisional pattern, which is formed on an image plane of the projection optical system when a mask having the provisional pattern is arranged on the object plane, and changing the provisional pattern. The calculations are repeated, and the provisional pattern is determined as the pattern of the mask, when the value of the first evaluation function meets a first predetermined standard and the value of the second evaluation function meets a second predetermined standard.
    • 一种确定在曝光装置中使用的掩模的图案的方法。 掩模布置在投影光学系统的物平面上。 该方法包括:计算用于评估在掩模空白上绘制临时图案的成本以制造掩模的第一评估函数的值,计算用于评估临时图案的图像的第二评估函数的值,该值是 当具有临时图案的掩模布置在物平面上时,形成在投影光学系统的图像平面上,并且改变临时图案。 当第一评估函数的值满足第一预定标准并且第二评估函数的值满足第二预定标准时,重复计算,并且将临时图案确定为掩模的图案。
    • 7. 发明申请
    • PATTERN GENERATION METHOD
    • 图案生成方法
    • US20130329202A1
    • 2013-12-12
    • US13908773
    • 2013-06-03
    • CANON KABUSHIKI KAISHA
    • Koji MikamiTadashi AraiHiroyuki Ishii
    • G06F17/50
    • G06F17/50G03F1/36G03F1/70
    • A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.
    • 一种用于使用计算机生成用于生成掩模图案的单元的图案的图案生成方法,包括获得单元图案的数据,计算单元图案的图像,以反复地获得图像的评估值 当具有单元格图案的掩模被照亮以将单元格图案的图像投影到衬底上以暴露衬底时,改变曝光条件的参数值,以及单元的图案的参数值,以及确定 当评估值满足预定评价标准时,单元格图案的参数值。
    • 8. 发明申请
    • PATTERN DETERMINING METHOD, PATTERN DETERMINING APPARATUS AND STORAGE MEDIUM
    • 图案确定方法,图案确定装置和存储介质
    • US20130149636A1
    • 2013-06-13
    • US13685791
    • 2012-11-27
    • CANON KABUSHIKI KAISHA
    • Yuichi GyodaKoji Mikami
    • G03F1/70G06F17/50
    • G03F1/70G06F17/50
    • A method of determining a pattern of a mask for an exposure apparatus includes a first calculation step of calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, a second calculation step of calculating a value of a second evaluation function used to evaluate an image formed on an image plane when a mask having the provisional pattern is arranged on an object plane, and a changing step of, when calculation results of the first and second calculation steps do not meet a termination condition, changing at least one of the provisional pattern, an illumination condition in the exposure apparatus, and a drawing condition of the pattern for the mask blank.
    • 确定曝光装置的掩模的图案的方法包括:第一计算步骤,计算用于评估在掩模坯料上绘制临时图案的成本的第一评估函数的值以制造掩模;第二计算步骤 当将具有所述临时图案的掩模布置在物平面上时,计算用于评估在图像平面上形成的图像的第二评估函数的值;以及改变步骤,当所述第一和第二计算步骤的计算结果为 不满足终止条件,改变临时图案,曝光装置中的照明条件和面罩坯料图案的绘制条件中的至少一个。