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1. 发明授权

US11474439B2 Exposure apparatus, exposure method, and method of manufacturing article 有权
公开(公告)号：US11474439B2
公开(公告)日：2022-10-18
申请号：US16900209
申请日：2020-06-12
申请人： CANON KABUSHIKI KAISHA
发明人： Kouki Miyano , Ryo Koizumi , Jun Moizumi , Koji Mikami
IPC分类号： G03F7/20
摘要： An exposure apparatus includes a first temperature controller for controlling a temperature distribution on an optical element of a projection optical system, and a second temperature controller for controlling a temperature distribution on an optical element of the projection optical system, wherein in a first period in which the exposure operation is executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration of the projection optical system due to the exposure operation being executed, and in a second period which follows the first period and in which the exposure operation is not executed, at least one of the first temperature controller and the second temperature controller operates to reduce a change in an aberration due to the exposure operation not being executed.

2. 发明申请

US20150177609A1 METHOD FOR EVALUATING OPTICAL IMAGE OF PATTERN, RECORDING MEDIUM, AND INFORMATION PROCESSING APPARATUS 有权
标题翻译：评估图形光学图像，记录介质和信息处理装置的方法
公开(公告)号：US20150177609A1
公开(公告)日：2015-06-25
申请号：US14572651
申请日：2014-12-16
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai
IPC分类号： G03F1/36 , G06F17/50
CPC分类号： G03F1/36
摘要： A method being performed by a processor includes, acquiring data of patterns of a plurality of cells that include an identified pattern for which an evaluation value of an optical image falls outside a first allowable range among patterns in which each a pattern being single cell alone, creating the pattern of a mask by arranging the patterns of the plurality of cells that include the identified pattern, and evaluating an optical image of the identified pattern in the created pattern of the mask.
摘要翻译：由处理器执行的方法包括：获取多个单元的图案的数据，所述多个单元的图案包括在其中每个图案是单个单元的图案中的光学图像的评估值落在第一允许范围之外的识别图案，通过布置包括所识别的图案的多个单元格的图案，并且在所创建的图案的图案中评估所识别的图案的光学图像来创建掩模的图案。

3. 发明授权

US09547230B2 Method for evaluating optical image of pattern, recording medium, and information processing apparatus 有权
标题翻译：用于评估图案，记录介质和信息处理装置的光学图像的方法
公开(公告)号：US09547230B2
公开(公告)日：2017-01-17
申请号：US14572651
申请日：2014-12-16
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai
IPC分类号： G06F17/50 , G03F1/36
CPC分类号： G03F1/36
摘要： A method being performed by a processor includes, acquiring data of patterns of a plurality of cells that include an identified pattern for which an evaluation value of an optical image falls outside a first allowable range among patterns in which each a pattern being single cell alone, creating the pattern of a mask by arranging the patterns of the plurality of cells that include the identified pattern, and evaluating an optical image of the identified pattern in the created pattern of the mask.
摘要翻译：由处理器执行的方法包括：获取多个单元的图案的数据，所述多个单元的图案包括在其中每个图案是单个单元的图案中的光学图像的评估值落在第一允许范围之外的识别图案，通过布置包括所识别的图案的多个单元格的图案，并且在所创建的图案的图案中评估所识别的图案的光学图像来创建掩模的图案。

4. 发明授权

US11061337B2 Exposure apparatus and article manufacturing method 有权
公开(公告)号：US11061337B2
公开(公告)日：2021-07-13
申请号：US16809097
申请日：2020-03-04
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Atsushi Shigenobu
IPC分类号： G03B27/00 , G03F7/20
摘要： An exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and exposes the substrate is provided. The apparatus comprises an aberration correction member arranged on an optical path of exposure light between the original and the substrate, and a driver which drives the aberration correction member. The aberration correction member includes a first optical element including a first surface having a three-fold rotational symmetric aspherical shape with respect to an optical axis of the exposure light, and a second optical element spaced apart from the first optical element along the optical axis and including a second surface facing the first surface and having an aspherical shape that complementarily corrects an aberration generated by the first optical element.

5. 发明授权

US08839169B2 Pattern determining method, pattern determining apparatus and storage medium 有权
标题翻译：模式确定方法，模式确定装置和存储介质
公开(公告)号：US08839169B2
公开(公告)日：2014-09-16
申请号：US13685791
申请日：2012-11-27
申请人： Canon Kabushiki Kaisha
发明人： Yuichi Gyoda , Koji Mikami
IPC分类号： G06F17/50 , G03F1/70
CPC分类号： G03F1/70 , G06F17/50
摘要： A method of determining a pattern of a mask to be used in an exposure apparatus. The mask is arranged on an object plane of a projection optical system. The method includes calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, calculating a value of a second evaluation function used to evaluate an image of the provisional pattern, which is formed on an image plane of the projection optical system when a mask having the provisional pattern is arranged on the object plane, and changing the provisional pattern. The calculations are repeated, and the provisional pattern is determined as the pattern of the mask, when the value of the first evaluation function meets a first predetermined standard and the value of the second evaluation function meets a second predetermined standard.
摘要翻译：一种确定在曝光装置中使用的掩模的图案的方法。掩模布置在投影光学系统的物平面上。该方法包括：计算用于评估在掩模空白上绘制临时图案的成本以制造掩模的第一评估函数的值，计算用于评估临时图案的图像的第二评估函数的值，该值是当具有临时图案的掩模布置在物平面上时，形成在投影光学系统的图像平面上，并且改变临时图案。当第一评估函数的值满足第一预定标准并且第二评估函数的值满足第二预定标准时，重复计算，并且将临时图案确定为掩模的图案。

6. 发明申请

US20140146311A1 METHOD OF DETERMINING MASK PATTERN AND EXPOSURE CONDITION, STORAGE MEDIUM, AND COMPUTER 有权
标题翻译：确定掩模和曝光条件的方法，存储介质和计算机
公开(公告)号：US20140146311A1
公开(公告)日：2014-05-29
申请号：US14089857
申请日：2013-11-26
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami
IPC分类号： G03F7/20
CPC分类号： G03F7/70483 , G03F1/70 , G03F7/70616
摘要： A determining method includes the steps of setting a first parameter to define the shape of the plurality of pattern elements of the mask, setting a second parameter to define the effective light source distribution; and repeating the process of calculation of the image of the mask pattern and calculation of a value of an evaluation item while varying the value of the first parameter and the second parameter to thereby determine the effective light source distribution and the mask pattern, wherein parameters of pattern elements are set as one parameter by using a value of an index representing the proximity effect.
摘要翻译：确定方法包括以下步骤：设置第一参数以定义掩模的多个图案元素的形状，设置第二参数以限定有效光源分布; 并且在改变第一参数和第二参数的值的同时重复计算掩模图案的图像的计算过程和评估项目的值的计算，从而确定有效光源分布和掩模图案，其中参数通过使用表示邻近效应的索引的值将图案元素设置为一个参数。

7. 发明申请

US20130329202A1 PATTERN GENERATION METHOD 有权
标题翻译：图案生成方法
公开(公告)号：US20130329202A1
公开(公告)日：2013-12-12
申请号：US13908773
申请日：2013-06-03
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai , Hiroyuki Ishii
IPC分类号： G06F17/50
CPC分类号： G06F17/50 , G03F1/36 , G03F1/70
摘要： A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.
摘要翻译：一种用于使用计算机生成用于生成掩模图案的单元的图案的图案生成方法，包括获得单元图案的数据，计算单元图案的图像，以反复地获得图像的评估值当具有单元格图案的掩模被照亮以将单元格图案的图像投影到衬底上以暴露衬底时，改变曝光条件的参数值，以及单元的图案的参数值，以及确定当评估值满足预定评价标准时，单元格图案的参数值。

8. 发明申请

US20130149636A1 PATTERN DETERMINING METHOD, PATTERN DETERMINING APPARATUS AND STORAGE MEDIUM 有权
标题翻译：图案确定方法，图案确定装置和存储介质
公开(公告)号：US20130149636A1
公开(公告)日：2013-06-13
申请号：US13685791
申请日：2012-11-27
申请人： CANON KABUSHIKI KAISHA
发明人： Yuichi Gyoda , Koji Mikami
IPC分类号： G03F1/70 , G06F17/50
CPC分类号： G03F1/70 , G06F17/50
摘要： A method of determining a pattern of a mask for an exposure apparatus includes a first calculation step of calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, a second calculation step of calculating a value of a second evaluation function used to evaluate an image formed on an image plane when a mask having the provisional pattern is arranged on an object plane, and a changing step of, when calculation results of the first and second calculation steps do not meet a termination condition, changing at least one of the provisional pattern, an illumination condition in the exposure apparatus, and a drawing condition of the pattern for the mask blank.
摘要翻译：确定曝光装置的掩模的图案的方法包括：第一计算步骤，计算用于评估在掩模坯料上绘制临时图案的成本的第一评估函数的值以制造掩模;第二计算步骤当将具有所述临时图案的掩模布置在物平面上时，计算用于评估在图像平面上形成的图像的第二评估函数的值;以及改变步骤，当所述第一和第二计算步骤的计算结果为不满足终止条件，改变临时图案，曝光装置中的照明条件和面罩坯料图案的绘制条件中的至少一个。

9. 发明授权

US09672300B2 Pattern generation method 有权
公开(公告)号：US09672300B2
公开(公告)日：2017-06-06
申请号：US13908773
申请日：2013-06-03
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Tadashi Arai , Hiroyuki Ishii
IPC分类号： G06F17/50 , G03F1/36 , G03F1/70
CPC分类号： G06F17/50 , G03F1/36 , G03F1/70
摘要： A pattern generation method for generating a pattern of a cell used to generate a pattern of a mask using a computer, includes obtaining data of pattern of the cell, calculating image of the pattern of the cell to obtain an evaluation value of the image by repeatedly changing a parameter value of an exposure condition when the mask which has the pattern of the cell is illuminated to project image of the pattern of the cell onto a substrate to expose the substrate, and a parameter value of the pattern of the cell, and determining parameter value of the pattern of the cell when the evaluation value satisfies a predetermined evaluation standard.

10. 发明申请

US20200292945A1 EXPOSURE APPARATUS AND ARTICLE MANUFACTURING METHOD 审中-公开
公开(公告)号：US20200292945A1
公开(公告)日：2020-09-17
申请号：US16809097
申请日：2020-03-04
申请人： CANON KABUSHIKI KAISHA
发明人： Koji Mikami , Atsushi Shigenobu
IPC分类号： G03F7/20
摘要： An exposure apparatus that projects a pattern of an original onto a substrate via a projection optical system and exposes the substrate is provided. The apparatus comprises an aberration correction member arranged on an optical path of exposure light between the original and the substrate, and a driver which drives the aberration correction member. The aberration correction member includes a first optical element including a first surface having a three-fold rotational symmetric aspherical shape with respect to an optical axis of the exposure light, and a second optical element spaced apart from the first optical element along the optical axis and including a second surface facing the first surface and having an aspherical shape that complementarily corrects an aberration generated by the first optical element.

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