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1. 发明申请

US20180281414A1 BONDED SUBSTRATE BODY, METHOD FOR MANUFACTURING BONDED SUBSTRATE BODY, LIQUID DISCHARGE HEAD, AND METHOD FOR MANUFACTURING LIQUID DISCHARGE HEAD 审中-公开
公开(公告)号：US20180281414A1
公开(公告)日：2018-10-04
申请号：US15937580
申请日：2018-03-27
申请人： CANON KABUSHIKI KAISHA
发明人： Yoshiyuki Fukumoto , Atsunori Terasaki , Ryoji Kanri , Atsushi Hiramoto
IPC分类号： B41J2/16 , B81C3/00 , B81C1/00 , B81B1/00 , B81B3/00 , B41J2/045
CPC分类号： B41J2/1623 , B41J2/045 , B41J2/1603 , B41J2/1606 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1632 , B41J2/1634 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2202/22 , B81B1/004 , B81B3/0072 , B81B2201/052 , B81C1/00666 , B81C1/00809 , B81C3/001 , B81C2201/016 , B81C2203/032 , C23C16/405 , C23C16/45525
摘要： A method for manufacturing a bonded substrate body in which an end portion of an adhesive is located at a position retreated in a direction to the inside of the bonded substrate body from an end surface of a bonding region of a first substrate and a second substrate includes forming a film on the end portion of the adhesive.

2. 发明申请

US20160176193A1 PROCESSING METHOD OF SUBSTRATE AND MANUFACTURING METHOD OF LIQUID EJECTION HEAD 有权
标题翻译：液体喷射头基板和制造方法的处理方法
公开(公告)号：US20160176193A1
公开(公告)日：2016-06-23
申请号：US14963493
申请日：2015-12-09
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto , Atsunori Terasaki , Ryoji Kanri
IPC分类号： B41J2/16 , H01L21/02
CPC分类号： H01L21/0234 , B41J2/14016 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1631 , H01L21/0212
摘要： There are provided a processing method of a substrate in which in forming a trench on the substrate by etching, a side wall surrounding the trench is surely protected, and a manufacturing method of a liquid ejection head. The methods include: repeating sequentially a plurality of cycles of a trench forming step of forming the trench on a printing element substrate, a first protection layer forming step of forming a passivation layer, and a first protection layer removing step of removing a portion at which the trench is excavated in the passivation layer. A second protection layer forming step and a second protection layer removing step are performed between the trench forming step through the first protection layer removing step repeated in a plurality of cycles and the trench forming step through the first protection layer removing step repeated next.
摘要翻译：提供了一种衬底的处理方法，其中通过蚀刻在衬底上形成沟槽，确保保护围绕沟槽的侧壁，以及液体喷射头的制造方法。所述方法包括：在打印元件基板上顺序地重复形成沟槽的沟槽形成步骤的多个循环，形成钝化层的第一保护层形成步骤，以及去除部分的第一保护层去除步骤，沟槽在钝化层中被挖掘出来。在通过多个周期重复的第一保护层去除步骤的沟槽形成步骤和接下来重复的第一保护层去除步骤的沟槽形成步骤之间执行第二保护层形成步骤和第二保护层去除步骤。

3. 发明授权

US10661566B2 Bonded substrate body, method for manufacturing bonded substrate body, liquid discharge head, and method for manufacturing liquid discharge head 有权
公开(公告)号：US10661566B2
公开(公告)日：2020-05-26
申请号：US15937580
申请日：2018-03-27
申请人： CANON KABUSHIKI KAISHA
发明人： Yoshiyuki Fukumoto , Atsunori Terasaki , Ryoji Kanri , Atsushi Hiramoto
IPC分类号： B41J2/16 , B81C3/00 , B81C1/00 , B81B1/00 , B81B3/00 , B41J2/045 , C23C16/455 , C23C16/40
摘要： A method for manufacturing a bonded substrate body in which an end portion of an adhesive is located at a position retreated in a direction to the inside of the bonded substrate body from an end surface of a bonding region of a first substrate and a second substrate includes forming a film on the end portion of the adhesive.

4. 发明申请

US20130265368A1 LIQUID EJECTING HEAD AND METHOD FOR PRODUCING THE SAME 有权
标题翻译：液体喷射头及其制造方法
公开(公告)号：US20130265368A1
公开(公告)日：2013-10-10
申请号：US13857341
申请日：2013-04-05
申请人： CANON KABUSHIKI KAISHA
发明人： Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Atsushi Hiramoto , Masataka Sakurai , Yoshiyuki Fukumoto
IPC分类号： B41J2/14 , B41J2/16
CPC分类号： B41J2/14 , B41J2/14129 , B41J2/1603 , B41J2/1626 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2202/13
摘要： A method for producing a liquid ejecting head of the present invention includes the steps of: forming an etching stop layer on a portion corresponding to a region in which an independent supply port is formed, on a first face of a substrate; conducting dry etching treatment for the substrate from a second face side until the etched portion reaches the etching stop layer; and removing the etching stop layer by isotropic etching to form the independent supply port, after having conducted the dry etching treatment, wherein the isotropic etching is conducted in such a state that a side etching stopper portion having etching resistance to the isotropic etching is formed in the side face perimeter of the etching stop layer.
摘要翻译：本发明的液体喷射头的制造方法包括以下步骤：在与基板的第一面上形成有独立的供给口的区域对应的部分上形成蚀刻停止层; 从第二面侧到蚀刻部分到达蚀刻停止层为止进行基板的干蚀刻处理; 并且通过各向同性蚀刻去除蚀刻停止层以形成独立的供给口，在进行了干法蚀刻处理之后，其中各向同性蚀刻在对各向同性蚀刻具有耐蚀刻性的侧蚀刻阻挡部分形成的状态下进行蚀刻停止层的侧面周边。

5. 发明授权

US11541663B2 Liquid ejection apparatus and liquid refill container 有权
公开(公告)号：US11541663B2
公开(公告)日：2023-01-03
申请号：US17185738
申请日：2021-02-25
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto
IPC分类号： B41J2/175
摘要： A liquid ejection apparatus includes: a liquid ejection head configured to eject liquid; a liquid storage container including a storage portion configured to store liquid to be supplied to the liquid ejection head, an opening configured to supply liquid from a liquid refill container to the storage portion, and a cover member configured to be in a first state to cover the opening and a second state to expose the opening; and a regulation unit configured to regulate transition from the first state to the second state of the cover member. Regulating by the regulation unit is released when a first portion, of the liquid refill container, configured to prevent misfilling the storage portion with an incorrect liquid, is fitted into a second portion of the liquid ejection apparatus.

6. 发明申请

US20210268800A1 LIQUID EJECTION APPARATUS AND LIQUID REFILL CONTAINER 有权
公开(公告)号：US20210268800A1
公开(公告)日：2021-09-02
申请号：US17185738
申请日：2021-02-25
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto
IPC分类号： B41J2/175
摘要： A liquid ejection apparatus includes: a liquid ejection head configured to eject liquid; a liquid storage container including a storage portion configured to store liquid to be supplied to the liquid ejection head, an opening configured to supply liquid from a liquid refill container to the storage portion, and a cover member configured to be in a first state to cover the opening and a second state to expose the opening; and a regulation unit configured to regulate transition from the first state to the second state of the cover member. Regulating by the regulation unit is released when a first portion, of the liquid refill container, configured to prevent misfilling the storage portion with an incorrect liquid, is fitted into a second portion of the liquid ejection apparatus.

7. 发明申请

US20180170047A1 LIQUID EJECTION HEAD 审中-公开
公开(公告)号：US20180170047A1
公开(公告)日：2018-06-21
申请号：US15829011
申请日：2017-12-01
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto , Ryoji Kanri , Yoshiyuki Fukumoto , Atsunori Terasaki , Atsushi Teranishi , Masahiko Kubota
IPC分类号： B41J2/14
CPC分类号： B41J2/1433 , B41J2/1404 , B41J2/14145 , B41J2/1603 , B41J2/1628 , B41J2/1631 , B41J2/1634 , B41J2002/14467 , B41J2202/12
摘要： A liquid ejection head includes: a substrate including an energy-generating element; a flow path forming member including a discharge port and having a liquid flow path formed between the flow path forming member and the substrate; and a plurality of through-passages passing through the substrate, each of the through-passages including a first through-passage part serving as a common liquid chamber and a plurality of second through-passage parts communicating with the first through-passage part, wherein a separation wall separating the adjacent first through-passage parts includes a plate-shaped member separating the adjacent first through-passage parts and approximately vertical to a substrate in-plane direction and, at least one protrusion protruding from the plate-shaped member in the substrate in-plane direction and contacting a bottom portion of the first through-passage part.

8. 发明申请

US20170073579A1 METHOD FOR REMOVING TARGET OBJECT 有权
标题翻译：删除目标对象的方法
公开(公告)号：US20170073579A1
公开(公告)日：2017-03-16
申请号：US15258920
申请日：2016-09-07
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto , Atsunori Terasaki , Yoshiyuki Fukumoto , Ryoji Kanri , Masahiko Kubota
IPC分类号： C09K13/00 , B41J2/16
CPC分类号： C09K13/00 , B41J2/1603 , B41J2/162 , B41J2/1628 , C11D11/0047 , H01L21/02057
摘要： There is provided a method for selectively removing a plurality of target objects by using a stripping solution without causing damage to an underlying material, the target objects including a resist used as a mask material for dry etching and a transformed layer and a deposited film formed during the dry etching, the stripping solution including a first composition, a second composition, and a third composition, and the method including continuously changing the composition of the stripping solution from the first composition to the second composition and then from the second composition to the third composition.
摘要翻译：提供了一种通过使用剥离溶液来选择性地去除多个目标物体的方法，而不会对下面的材料造成损害，目标物体包括用作干法蚀刻的掩模材料的抗蚀剂和在其中形成的转化层和沉积膜所述干蚀刻，所述剥离溶液包括第一组合物，第二组合物和第三组合物，并且所述方法包括将所述剥离溶液的组成从所述第一组合物连续地改变为所述第二组合物，然后从所述第二组合物至所述第三组合物组成。

9. 发明授权

US09102145B2 Liquid ejecting head and method for producing the same 有权
标题翻译：液体喷头及其制造方法
公开(公告)号：US09102145B2
公开(公告)日：2015-08-11
申请号：US13857341
申请日：2013-04-05
申请人： CANON KABUSHIKI KAISHA
发明人： Masahiko Kubota , Ryoji Kanri , Akihiko Okano , Atsushi Hiramoto , Masataka Sakurai , Yoshiyuki Fukumoto
IPC分类号： B41J2/04 , G01D15/00 , G11B5/127 , B41J2/14 , B41J2/16
CPC分类号： B41J2/14 , B41J2/14129 , B41J2/1603 , B41J2/1626 , B41J2/1628 , B41J2/1629 , B41J2/1631 , B41J2/1639 , B41J2/1642 , B41J2/1645 , B41J2/1646 , B41J2202/13
摘要： A method for producing a liquid ejecting head of the present invention includes the steps of: forming an etching stop layer on a portion corresponding to a region in which an independent supply port is formed, on a first face of a substrate; conducting dry etching treatment for the substrate from a second face side until the etched portion reaches the etching stop layer; and removing the etching stop layer by isotropic etching to form the independent supply port, after having conducted the dry etching treatment, wherein the isotropic etching is conducted in such a state that a side etching stopper portion having etching resistance to the isotropic etching is formed in the side face perimeter of the etching stop layer.
摘要翻译：本发明的液体喷射头的制造方法包括以下步骤：在与基板的第一面上形成有独立的供给口的区域对应的部分上形成蚀刻停止层; 从第二面侧到蚀刻部分到达蚀刻停止层为止进行基板的干蚀刻处理; 并且通过各向同性蚀刻去除蚀刻停止层以形成独立的供给口，在进行了干法蚀刻处理之后，其中各向同性蚀刻在对各向同性蚀刻具有耐蚀刻性的侧蚀刻阻挡部分形成的状态下进行蚀刻停止层的侧面周边。

10. 发明授权

US11097543B2 Liquid ejection head and method for manufacturing the same 有权
公开(公告)号：US11097543B2
公开(公告)日：2021-08-24
申请号：US16592445
申请日：2019-10-03
申请人： CANON KABUSHIKI KAISHA
发明人： Atsushi Hiramoto , Takayuki Teshima , Tamaki Sato
IPC分类号： B41J2/14 , B41J2/16
摘要： In a substrate of a liquid ejection head, there are formed a first through-hole which constitutes a liquid supply path, and a second through-hole in which a through-hole electrode electrically connected to a wiring layer is formed on the inner surface. The first through-hole has a first hole having a first opening and a second hole having a second opening, and the second through-hole has a third hole having a third opening and a fourth hole having a fourth opening. When the minimum width of the first opening is represented by D1, the minimum width of the second opening is represented by D2, the minimum width of the third opening is represented by D3, and the minimum width of the fourth opening is represented by D4, the first to fourth openings satisfy a relation of D1>D3>D4>D2.

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