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1. 发明授权

US09627187B2 Sputtering apparatus 有权
公开(公告)号：US09627187B2
公开(公告)日：2017-04-18
申请号：US14484634
申请日：2014-09-12
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara
IPC分类号： H01J37/34 , C23C14/34
CPC分类号： H01J37/3447 , C23C14/34 , C23C14/3464 , H01J37/34
摘要： A sputtering apparatus includes a deposition preventing plate arranged between a substrate stage and a plurality of cathode electrodes, and a shutter plate arranged between the deposition preventing plate and the substrate stage. The deposition preventing plate has holes at positions respectively facing a plurality of targets held by the plurality of cathode electrodes. Concentric concavo-convex shapes centered on the rotation axis of the shutter plate are formed on surfaces, that face each other, of the deposition preventing plate and the shutter plate.

2. 发明授权

US09502223B2 Sputtering apparatus, target and shield 有权
标题翻译：溅射装置，目标和屏蔽
公开(公告)号：US09502223B2
公开(公告)日：2016-11-22
申请号：US14297695
申请日：2014-06-06
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara
IPC分类号： C23C14/00 , H01J37/34 , C23C14/34
CPC分类号： H01J37/3411 , C23C14/3407 , C23C14/564 , H01J37/3414 , H01J37/3417 , H01J37/3435 , H01J37/3441
摘要： A sputtering apparatus includes a backing plate, a fixing portion, and a shield surrounding the periphery of a target and having an opening. The fixing portion fixes the target to the backing plate by pressing the peripheral portion of the target against the backing plate. The shield includes a facing portion facing the backing plate without the fixing portion intervening between them, and an outer portion formed outside the facing portion. The gap between the facing portion and the backing plate is smaller than the gap between the outer portion and the backing plate. The inner surface of the shield, which faces a processing space, includes a portion which inclines such that the distance between the inner surface and the backing plate decreases from the outer portion to the facing portion.
摘要翻译：溅射装置包括背板，固定部分和围绕目标周边并具有开口的屏蔽。固定部分通过将目标的周边部分压靠在背板上将目标固定到背板上。护罩包括面对着背板的面对部分，其中没有固定部分介于它们之间，外侧部分形成在相对部分的外侧。面对部分和背板之间的间隙小于外部部分和背板之间的间隙。屏蔽件的面向加工空间的内表面包括一部分，该部分倾斜使得内表面和背板之间的距离从外部部分向相对部分减小。

3. 发明授权

US09997339B2 Sputtering apparatus and substrate processing apparatus 有权
公开(公告)号：US09997339B2
公开(公告)日：2018-06-12
申请号：US14724221
申请日：2015-05-28
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara , Hiroyuki Toya , Yasushi Yasumatsu , Toshikazu Nakazawa , Eiji Nakamura , Shintaro Suda , Shin Imai , Yuu Fujimoto
IPC分类号： C23C14/00 , C25B11/00 , C25B13/00 , H01J37/34 , C23C14/35
CPC分类号： H01J37/3447 , C23C14/352 , H01J37/3405
摘要： A sputtering apparatus includes a shutter unit, a plurality of target holders, and a substrate holder which can rotate about an axis perpendicular to a surface on which a substrate is held. The shutter unit includes a first shutter having first and second apertures and a second shutter having third and fourth apertures. The plurality of target holders are arranged on a first virtual circle centered on the axis, with the arrangement intervals between the plurality of target holders on the first virtual circle including at least two types of arrangement intervals.

4. 发明授权

US09966241B2 Sputtering apparatus 有权
公开(公告)号：US09966241B2
公开(公告)日：2018-05-08
申请号：US14878567
申请日：2015-10-08
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara
IPC分类号： H01J37/34 , C23C14/34 , C23C14/56 , C23C14/35
CPC分类号： H01J37/3441 , C23C14/34 , C23C14/3464 , C23C14/352 , C23C14/564 , H01J37/3417 , H01J37/3435 , H01J37/3447
摘要： A sputtering apparatus includes a shutter arranged having a first surface on a side of a substrate holder and a second surface on the opposite side, a first shield having a third surface including a portion facing the second surface and a fourth surface on the opposite side, a second shield having a fifth surface including a portion facing end portions of the shutter and the first shield, and a gas supply unit supplying a gas into a space arranged outside the first shield to communicate with a first gap between the second surface of the shutter and the third surface of the first shield. The second shield includes a protruding portion on the fifth surface to form a second gap between the protruding portion and the end portion of the shutter.

5. 发明申请

US20180261440A1 SPUTTERING APPARATUS AND SUBSTRATE PROCESSING APPARATUS 审中-公开
公开(公告)号：US20180261440A1
公开(公告)日：2018-09-13
申请号：US15976921
申请日：2018-05-11
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara , Hiroyuki Toya , Yasushi Yasumatsu , Toshikazu Nakazawa , Eiji Nakamura , Shintaro Suda , Shin Imai , Yuu Fujimoto
IPC分类号： H01J37/34 , C23C14/35
CPC分类号： H01J37/3447 , C23C14/352 , H01J37/3405
摘要： A sputtering apparatus includes a shutter unit, a plurality of target holders, and a substrate holder which can rotate about an axis perpendicular to a surface on which a substrate is held. The shutter unit includes a first shutter having first and second apertures and a second shutter having third and fourth apertures. The plurality of target holders are arranged on a first virtual circle centered on the axis, with the arrangement intervals between the plurality of target holders on the first virtual circle including at least two types of arrangement intervals.

6. 发明授权

US10062551B2 Sputtering apparatus and substrate processing apparatus 有权
公开(公告)号：US10062551B2
公开(公告)日：2018-08-28
申请号：US14724319
申请日：2015-05-28
申请人： CANON ANELVA CORPORATION
发明人： Shigenori Ishihara , Kazuya Konaga , Hiroyuki Toya , Shintaro Suda , Yasushi Yasumatsu , Yuu Fujimoto , Toshikazu Nakazawa , Eiji Nakamura , Shin Imai
IPC分类号： C23C14/34 , H01J37/34 , C23C14/35 , H01J37/32
CPC分类号： H01J37/3417 , C23C14/352 , H01J37/32715 , H01J37/3405 , H01J37/3435 , H01J37/3447
摘要： A sputtering apparatus includes a chamber, a substrate holder, first to fourth target holders, a shutter unit, and a gate valve through which the substrate is conveyed. The first to fourth target holders are arranged on vertices of a virtual rectangle having long sides and short sides and inscribed in a virtual circle centered on the axis, the first target holder and the second target holder are respectively arranged on two vertices defining one short side of the virtual rectangle, and a distance to the gate valve is shorter than distances from the third target holder and the fourth target holder to the gate valve.

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