会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • MULTI-RESOLUTION PRINTER
    • 多分辨率打印机
    • US20160374207A1
    • 2016-12-22
    • US15137011
    • 2016-04-25
    • CAMTEK LTD.
    • Yehuda Ben-AbuYair Ozeri
    • H05K3/00
    • H05K3/28B41J2/51B41J3/407B41J3/543H05K2203/013H05K2203/1476
    • An ink jet printer that includes a group of print heads; wherein the group of print heads comprises (a) a first sub-group of print heads that exhibit a first resolution; and (b) a second sub-group of print heads that exhibits a second resolution that differs from the first resolution; wherein in response to a printing scheme that associates a first area of a printed circuit board with the first resolution and associates a second area of the printed circuit board with the second resolution, the first sub-group is configured to print solder mask ink on the first area at the first resolution and the second sub-group is configured to print solder mask ink on the second area at the second resolution.
    • 一种喷墨打印机,包括一组打印头; 其中所述一组打印头包括(a)呈现第一分辨率的第一打印头子组; 和(b)具有不同于第一分辨率的第二分辨率的打印头的第二子组; 其中响应于将印刷电路板的第一区域与第一分辨率相关联并将印刷电路板的第二区域与第二分辨率相关联的打印方案,第一子组被配置为在 第一分辨率的第一区域和第二子组被配置为以第二分辨率在第二区域上印刷焊料掩模油墨。
    • 3. 发明申请
    • SELECTIVE VACUUM PRINTING MACHINE
    • 选择真空打印机
    • US20160143151A1
    • 2016-05-19
    • US14943123
    • 2015-11-17
    • CAMTEK LTD.
    • Yehuda Ben-Abu
    • H05K3/00H05K3/12B25B11/00
    • B25B11/005H05K3/12H05K13/0061H05K2203/085
    • A system that may include a apertured structure that is configured to support a substrate and a vacuum supply unit that is configured to (i) prevent a supply of vacuum to a first area of the substrate during a first processing period during which the first area is processed and a second area of the substrate is not processed; (ii) provide vacuum to the second area during the first processing period; (iii) prevent the supply of vacuum to the second area during a second processing period during which the second area is processed and the first area is not processed; and (iv) provide vacuum to the first area during the second processing period.
    • 可以包括被配置为支撑衬底的有孔结构的系统和被配置为(i)在第一区域是第一区域的第一处理时段期间防止向衬底的第一区域提供真空的真空供应单元 不处理基板的第二区域; (ii)在第一处理期间向第二区域提供真空; (iii)在处理所述第二区域并且不处理所述第一区域的第二处理期间,防止向所述第二区域供应真空; 和(iv)在第二处理期间向第一区域提供真空。