会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 2. 发明申请
    • METHOD OF MANUFACTURING THIN FILM TRANSISTOR ARRAY SUBSTRATE
    • 制造薄膜晶体管阵列基板的方法
    • US20100047974A1
    • 2010-02-25
    • US12544429
    • 2009-08-20
    • Joo Soo LimHee Young Kwack
    • Joo Soo LimHee Young Kwack
    • H01L21/336
    • H01L27/1288H01L27/1214
    • A simplified method of manufacturing a thin film transistor array substrate is disclosed. The method includes: forming gate electrodes, gate lines and gate pads on a substrate with the use of a first mask; forming a gate insulation film, a semiconductor layer, and a metal layer on the substrate; forming a first photoresist pattern on the metal layer with the use of a second mask; forming first contact holes for the gate pads with the use of the first photoresist pattern; forming a second photoresist pattern, and providing patterns for data pads, data lines, and thin film transistors with the use of the second photoresist pattern; providing a third photoresist pattern, and forming contact holes for source/drain electrodes and second contact holes the gate pads with the use of the third photoresist pattern; forming a protective film on the substrate and providing a fourth photoresist pattern on the protective film with the use of a third mask; forming third contact holes for the gate pads, contact holes for the data pads, gate lines, and drain electrodes, and contact holes for pixel electrodes, with the use of the fourth photoresist pattern; and forming a transparent conduction film on the fourth photoresist pattern having the contact holes.
    • 公开了制造薄膜晶体管阵列基板的简化方法。 该方法包括:利用第一掩模在基板上形成栅电极,栅极线和栅极焊盘; 在基板上形成栅极绝缘膜,半导体层和金属层; 使用第二掩模在所述金属层上形成第一光致抗蚀剂图案; 通过使用第一光致抗蚀剂图形形成用于栅极焊盘的第一接触孔; 形成第二光致抗蚀剂图案,并且使用第二光致抗蚀剂图案提供用于数据焊盘,数据线和薄膜晶体管的图案; 提供第三光致抗蚀剂图案,并且使用第三光致抗蚀剂图案形成栅极焊盘的源/漏电极和第二接触孔的接触孔; 在基板上形成保护膜,并使用第三掩模在保护膜上提供第四光致抗蚀剂图案; 使用第四光致抗蚀剂图案,形成用于栅极焊盘的第三接触孔,数据焊盘的接触孔,栅极线和漏极电极以及用于像素电极的接触孔; 以及在具有接触孔的第四光致抗蚀剂图案上形成透明导电膜。
    • 3. 发明申请
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US20090284677A1
    • 2009-11-19
    • US12318263
    • 2008-12-23
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • G02F1/1368H01L21/02
    • G02F1/134363G02F2001/13606G02F2001/136231G02F2201/124G02F2201/40H01L27/124H01L27/1288
    • A liquid crystal display device includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film interposed between the gate line and the data line to define a pixel region; a thin film transistor at the crossing of the gate line and the data line; a pixel electrode connected to the thin film transistor; a common electrode forming a horizontal electric field with the pixel electrode in the pixel region; a gate pad connected to the gate line; and a data pad connected to the data line, wherein the gate pad and the data pad includes a lower pad in the same layer as the gate line and made of the same material as the gate line, a lower contact hole through the gate insulating film to expose the lower pad, an upper pad in the same layer as the data line, made of the same material as the data line, and connected to the lower pad through the lower contact hole, and an upper contact hole through a passivation film protecting the thin film transistor to expose the upper pad, and a semiconductor layer of the thin film transistor overlaps with the gate electrode of the thin film transistor, and has a width smaller than that of a gate electrode of the thin film transistor.
    • 液晶显示装置包括在基板上的栅极线; 与栅极线交叉的数据线和插入在栅极线与数据线之间的栅极绝缘膜,以限定像素区域; 栅极线与数据线交叉的薄膜晶体管; 连接到薄膜晶体管的像素电极; 与像素电极在像素区域中形成水平电场的公共电极; 连接到栅极线的栅极焊盘; 以及连接到数据线的数据焊盘,其中栅极焊盘和数据焊盘包括与栅极线相同的层并且由与栅极线相同的材料制成的下焊盘,通过栅极绝缘膜的下部接触孔 以与数据线相同的材料制成的下焊盘,与数据线相同的层中的上焊盘露出,并通过下接触孔连接到下焊盘,以及通过钝化膜保护的上接触孔 所述薄膜晶体管暴露所述上焊盘,所述薄膜晶体管的半导体层与所述薄膜晶体管的栅电极重叠,并且具有比所述薄膜晶体管的栅电极的宽度小的宽度。
    • 4. 发明授权
    • Liquid crystal display device and method for fabricating the same
    • 液晶显示装置及其制造方法
    • US07916229B2
    • 2011-03-29
    • US12318263
    • 2008-12-23
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • Woo Sup ShinJoo Soo LimHeung Lyul ChoHee Young Kwack
    • G02F1/136G02F1/1368G02F1/1343H01L21/02
    • G02F1/134363G02F2001/13606G02F2001/136231G02F2201/124G02F2201/40H01L27/124H01L27/1288
    • A liquid crystal display device includes a gate line on a substrate; a data line crossing the gate line with a gate insulating film interposed between the gate line and the data line to define a pixel region; a thin film transistor at the crossing of the gate line and the data line; a pixel electrode connected to the thin film transistor; a common electrode forming a horizontal electric field with the pixel electrode in the pixel region; a gate pad connected to the gate line; and a data pad connected to the data line, wherein the gate pad and the data pad includes a lower pad in the same layer as the gate line and made of the same material as the gate line, a lower contact hole through the gate insulating film to expose the lower pad, an upper pad in the same layer as the data line, made of the same material as the data line, and connected to the lower pad through the lower contact hole, and an upper contact hole through a passivation film protecting the thin film transistor to expose the upper pad, and a semiconductor layer of the thin film transistor overlaps with the gate electrode of the thin film transistor, and has a width smaller than that of a gate electrode of the thin film transistor.
    • 液晶显示装置包括在基板上的栅极线; 与栅极线交叉的数据线和插入在栅极线与数据线之间的栅极绝缘膜,以限定像素区域; 栅极线与数据线交叉的薄膜晶体管; 连接到薄膜晶体管的像素电极; 与像素电极在像素区域中形成水平电场的公共电极; 连接到栅极线的栅极焊盘; 以及连接到数据线的数据焊盘,其中栅极焊盘和数据焊盘包括与栅极线相同的层并且由与栅极线相同的材料制成的下焊盘,通过栅极绝缘膜的下部接触孔 以与数据线相同的材料制成的下焊盘,与数据线相同的层中的上焊盘露出,并通过下接触孔连接到下焊盘,以及通过钝化膜保护的上接触孔 所述薄膜晶体管暴露所述上焊盘,所述薄膜晶体管的半导体层与所述薄膜晶体管的栅电极重叠,并且具有比所述薄膜晶体管的栅电极的宽度小的宽度。
    • 5. 发明授权
    • Method of manufacturing thin film transistor array substrate
    • 制造薄膜晶体管阵列基板的方法
    • US08008139B2
    • 2011-08-30
    • US12544429
    • 2009-08-20
    • Joo Soo LimHee Young Kwack
    • Joo Soo LimHee Young Kwack
    • H01L21/00
    • H01L27/1288H01L27/1214
    • A simplified method of manufacturing a thin film transistor array substrate is disclosed. The method includes: forming gate electrodes, gate lines and gate pads on a substrate with the use of a first mask; forming a gate insulation film, a semiconductor layer, and a metal layer on the substrate; forming a first photoresist pattern on the metal layer with the use of a second mask; forming first contact holes for the gate pads with the use of the first photoresist pattern; forming a second photoresist pattern, and providing patterns for data pads, data lines, and thin film transistors with the use of the second photoresist pattern; providing a third photoresist pattern, and forming contact holes for source/drain electrodes and second contact holes the gate pads with the use of the third photoresist pattern; forming a protective film on the substrate and providing a fourth photoresist pattern on the protective film with the use of a third mask; forming third contact holes for the gate pads, contact holes for the data pads, gate lines, and drain electrodes, and contact holes for pixel electrodes, with the use of the fourth photoresist pattern; and forming a transparent conduction film on the fourth photoresist pattern having the contact holes.
    • 公开了制造薄膜晶体管阵列基板的简化方法。 该方法包括:利用第一掩模在基板上形成栅电极,栅极线和栅极焊盘; 在基板上形成栅极绝缘膜,半导体层和金属层; 使用第二掩模在所述金属层上形成第一光致抗蚀剂图案; 通过使用第一光致抗蚀剂图形形成用于栅极焊盘的第一接触孔; 形成第二光致抗蚀剂图案,并且使用第二光致抗蚀剂图案提供用于数据焊盘,数据线和薄膜晶体管的图案; 提供第三光致抗蚀剂图案,并且使用第三光致抗蚀剂图案形成栅极焊盘的源/漏电极和第二接触孔的接触孔; 在基板上形成保护膜,并使用第三掩模在保护膜上提供第四光致抗蚀剂图案; 使用第四光致抗蚀剂图案,形成用于栅极焊盘的第三接触孔,数据焊盘的接触孔,栅极线和漏极电极以及用于像素电极的接触孔; 以及在具有接触孔的第四光致抗蚀剂图案上形成透明导电膜。
    • 6. 发明授权
    • Liquid crystal display device and fabricating method thereof
    • 液晶显示装置及其制造方法
    • US08400600B2
    • 2013-03-19
    • US12722142
    • 2010-03-11
    • Byung Chul AhnJoo Soo LimByung Ho Park
    • Byung Chul AhnJoo Soo LimByung Ho Park
    • G02F1/1333G02F1/136G02F1/1343
    • G02F1/134363G02F2001/136231G02F2001/13629G02F2001/136295
    • A method of fabricating a liquid crystal display device includes in a first mask process, forming a first mask pattern group including a gate line, a gate electrode connected to the gate line and a common line parallel to the gate line that have a first conductive layer group structure having at least double conductive layers. A second mask process forms a gate insulating film on the first mask pattern group and a semiconductor pattern thereon. A third mask process forms a third mask pattern group including a data line, a source electrode connected to the data line and a drain electrode opposite the source electrode that have a second conductive layer group structure having at least double conductive layers, and a protective film interfacing with the third mask pattern group on the gate insulating film.
    • 一种制造液晶显示装置的方法包括:在第一掩模处理中,形成包括栅极线的第一掩模图案组,连接到栅极线的栅电极和与栅极线平行的公共线,所述栅极线具有第一导电层 组结构具有至少双重导电层。 第二掩模工艺在第一掩模图案组上形成栅极绝缘膜,并在其上形成半导体图案。 第三掩模处理形成第三掩模图案组,其包括数据线,连接到数据线的源电极和与源电极相对的漏极,具有至少具有双重导电层的第二导电层组结构,以及保护膜 与栅极绝缘膜上的第三掩模图案组接口。
    • 10. 发明申请
    • LIQUID CRYSTAL DISPLAY DEVICE AND FABRICATING METHOD THEREOF
    • 液晶显示装置及其制造方法
    • US20100231820A1
    • 2010-09-16
    • US12787713
    • 2010-05-26
    • Byung Chul AHNJoo Soo LimByung Ho Park
    • Byung Chul AHNJoo Soo LimByung Ho Park
    • G02F1/136
    • G02F1/1362G02F1/134363G02F2001/136295
    • A thin film transistor substrate for applying a horizontal electric field and a fabricating method thereof for simplifying a process are disclosed. In a liquid crystal display device according to the present invention, a gate line on a substrate; a data line crossing the gate line having a gate insulating film there between to define a pixel area; a thin film transistor including a gate electrode, a source electrode, a drain electrode and a semiconductor layer to define a channel between the source electrode and the drain electrode; a common line on the substrate; a common electrode in the pixel area; and a pixel electrode in the pixel area to form a horizontal electrode field with the common electrode, wherein the data line, the source electrode and the drain electrode have an opaque conductive pattern and a transparent conductive pattern, the pixel electrode is formed by an extension of the transparent conductive pattern of the drain electrode, and a protective film borders with the transparent conductive pattern and in the remaining area thereof.
    • 公开了一种用于施加水平电场的薄膜晶体管基板及其制造方法,用于简化工艺。 在根据本发明的液晶显示装置中,在基板上的栅极线; 与栅极线交叉的数据线,其间具有栅极绝缘膜,以限定像素区域; 包括栅电极,源电极,漏电极和半导体层的薄膜晶体管,以在源电极和漏电极之间限定沟道; 基材上的共同线; 像素区域中的公共电极; 以及像素电极,在像素区域中形成与公共电极的水平电极场,其中数据线,源电极和漏电极具有不透明导电图案和透明导电图案,像素电极由延伸部 的漏极电极的透明导电图案,并且保护膜与透明导电图案和其余区域边界。