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1. 发明授权

US08815110B2 Composition and method for polishing bulk silicon 有权
标题翻译：散装硅的组成和方法
公开(公告)号：US08815110B2
公开(公告)日：2014-08-26
申请号：US12762180
申请日：2010-04-16
申请人： Brian Reiss , Michael White , Lamon Jones , John Clark
发明人： Brian Reiss , Michael White , Lamon Jones , John Clark
IPC分类号： C03C25/68 , H01L21/02 , B24B1/00 , B24B9/06 , C09G1/02 , B24B37/02
CPC分类号： B24B1/00 , B24B9/065 , B24B37/02 , C09G1/02 , H01L21/02021 , H01L21/02024
摘要： The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increase the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含（a）二氧化硅，（b）一种或多种增加硅去除速率的化合物，（c）一种或多种四烷基铵盐和（d）水，其中抛光组合物的pH为约7至约11.本发明还提供了用抛光组合物抛光基材的方法。

2. 发明申请

US20110062376A1 Composition and method for polishing bulk silicon 有权
标题翻译：散装硅的组成和方法
公开(公告)号：US20110062376A1
公开(公告)日：2011-03-17
申请号：US12462638
申请日：2009-09-16
申请人： Brian Reiss , John Clark , Lamon Jones , Jeffrey Gilliland , Michael White
发明人： Brian Reiss , John Clark , Lamon Jones , Jeffrey Gilliland , Michael White
IPC分类号： C09K13/02 , C09K13/00
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/02024
摘要： The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increases the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含（a）二氧化硅，（b）一种或多种增加硅去除速率的化合物，（c）一种或多种四烷基铵盐和（d）水，其中抛光组合物的pH为约7至约11.本发明还提供了用抛光组合物抛光基材的方法。

3. 发明授权

US08883034B2 Composition and method for polishing bulk silicon 有权
标题翻译：散装硅的组成和方法
公开(公告)号：US08883034B2
公开(公告)日：2014-11-11
申请号：US12462638
申请日：2009-09-16
申请人： Brian Reiss , John Clark , Lamon Jones , Jeffrey Gilliland , Michael White
发明人： Brian Reiss , John Clark , Lamon Jones , Jeffrey Gilliland , Michael White
IPC分类号： C09K13/06 , C09K3/14 , H01L21/02 , C09G1/02
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/02024
摘要： The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increases the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含（a）二氧化硅，（b）一种或多种增加硅去除速率的化合物，（c）一种或多种四烷基铵盐和（d）水，其中抛光组合物的pH为约7至约11.本发明还提供了用抛光组合物抛光基材的方法。

4. 发明申请

US20110136344A1 COMPOSITION AND METHOD FOR POLISHING POLYSILICON 有权
标题翻译：用于抛光聚硅氧烷的组合物和方法
公开(公告)号：US20110136344A1
公开(公告)日：2011-06-09
申请号：US12971714
申请日：2010-12-17
申请人： Brian REISS , Timothy Johns , Michael White , Lamon Jones , John Clark
发明人： Brian REISS , Timothy Johns , Michael White , Lamon Jones , John Clark
IPC分类号： H01L21/306 , C09K13/00 , C09K13/02
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/02024 , H01L21/3212
摘要： The invention provides a polishing composition comprising silica, an aminophosphonic acid, a polysaccharide, a tetraalkylammonium salt, a bicarbonate salt, an azole ring, and water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含二氧化硅，氨基膦酸，多糖，四烷基铵盐，碳酸氢盐，唑环和水，其中抛光组合物的pH为约7至约11.本发明还提供了一种用抛光组合物研磨衬底的方法。

5. 发明授权

US09425037B2 Silicon polishing compositions with improved PSD performance 有权
标题翻译：具有改善的PSD性能的硅抛光组合物
公开(公告)号：US09425037B2
公开(公告)日：2016-08-23
申请号：US13351339
申请日：2012-01-17
申请人： Brian Reiss , John Clark , Lamon Jones , Michael White
发明人： Brian Reiss , John Clark , Lamon Jones , Michael White
IPC分类号： H01L21/02 , C09G1/02
CPC分类号： H01L21/02024 , C09G1/02
摘要： The invention relates to a chemical-mechanical polishing composition comprising silica, one or more tetraalkylammonium salts, one or more bicarbonate salts, one or more alkali metal hydroxides, one or more aminophosphonic acids, one or more rate accelerator compounds, one or more polysaccharides, and water. The polishing composition reduces surface roughness and PSD of polished substrates. The invention further relates to a method of chemically-mechanically polishing a substrate, especially a silicon substrate, using the polishing composition described herein.
摘要翻译：本发明涉及一种化学机械抛光组合物，其包括二氧化硅，一种或多种四烷基铵盐，一种或多种碳酸氢盐，一种或多种碱金属氢氧化物，一种或多种氨基膦酸，一种或多种速率促进剂化合物，一种或多种多糖，和水。抛光组合物降低抛光基材的表面粗糙度和PSD。本发明还涉及使用本文所述的抛光组合物对衬底，特别是硅衬底进行化学机械抛光的方法。

6. 发明授权

US08697576B2 Composition and method for polishing polysilicon 有权
标题翻译：抛光多晶硅的组成和方法
公开(公告)号：US08697576B2
公开(公告)日：2014-04-15
申请号：US12971714
申请日：2010-12-17
申请人： Brian Reiss , Timothy Johns , Michael White , Lamon Jones , John Clark
发明人： Brian Reiss , Timothy Johns , Michael White , Lamon Jones , John Clark
IPC分类号： H01L21/302
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/02024 , H01L21/3212
摘要： The invention provides a polishing composition comprising silica, an aminophosphonic acid, a polysaccharide, a tetraalkylammonium salt, a bicarbonate salt, an azole ring, and water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含二氧化硅，氨基膦酸，多糖，四烷基铵盐，碳酸氢盐，唑环和水，其中抛光组合物的pH为约7至约11.本发明还提供了一种用抛光组合物研磨衬底的方法。

7. 发明申请

US20110062115A1 COMPOSITION AND METHOD FOR POLISHING BULK SILICON 有权
标题翻译：抛光硅胶的组合物和方法
公开(公告)号：US20110062115A1
公开(公告)日：2011-03-17
申请号：US12762180
申请日：2010-04-16
申请人： Brian REISS , Michael White , Lamon Jones , John Clark
发明人： Brian REISS , Michael White , Lamon Jones , John Clark
IPC分类号： B24B37/04
CPC分类号： B24B1/00 , B24B9/065 , B24B37/02 , C09G1/02 , H01L21/02021 , H01L21/02024
摘要： The invention provides a polishing composition comprising (a) silica, (b) one or more compounds that increase the removal rate of silicon, (c) one or more tetraalkylammonium salts, and (d) water, wherein the polishing composition has a pH of about 7 to about 11. The invention further provides a method of polishing a substrate with the polishing composition.
摘要翻译：本发明提供一种抛光组合物，其包含（a）二氧化硅，（b）一种或多种增加硅去除速率的化合物，（c）一种或多种四烷基铵盐和（d）水，其中抛光组合物的pH为约7至约11.本发明还提供了用抛光组合物抛光基材的方法。

8. 发明授权

US12090027B2 Sound attenuation devices 有权
公开(公告)号：US12090027B2
公开(公告)日：2024-09-17
申请号：US18137469
申请日：2023-04-21
申请人： John Clark
发明人： John Clark
IPC分类号： A61F11/00 , A61F11/10 , A61F11/08
CPC分类号： A61F11/10 , A61F11/085
摘要： Sound attenuation devices are provided that may be temporarily worn in a person's ear. The devices generally include a first flange that is configured to be disposed in a person's ear; a second flange that is positioned proximate to the first flange and is also configured to be disposed in the person's ear (with the second flange having a proximate end that exhibits an oblong perimeter); and a cylindrical shaft extending from an interior portion of the second flange. The shaft includes an integrally connected pull tab; it extends beyond the proximate end of the second flange; and the shaft includes an integrally formed reinforcing member that spans an exterior side of the shaft and at least a portion of the pull tab. The devices further include a sound filter disposed within an internal cavity of the shaft.

9. 发明授权

US10724264B2 Intermittent locking door mechanism 有权
公开(公告)号：US10724264B2
公开(公告)日：2020-07-28
申请号：US15351915
申请日：2016-11-15
申请人： John Clark , Mark Knight , Adrian Alfaro
发明人： John Clark , Mark Knight , Adrian Alfaro
IPC分类号： E05D7/10 , E04H4/14 , E05D1/06
摘要： A spa tub system comprising a spa tub and at least one compartment integrated into the frame of the spa tub. The compartment includes a hatch which is attached to the compartment using a hinge assembly. The hinge assembly includes a bearing trough, a bearing cam, and a cam stop. The hatch is pivoted to open and close and can open to a predefined angle. At this predefined angle, the hatch cannot be removed. When the hatch is pivoted to a pivot angle less than the predefined angle, the hatch can be removed.

10. 发明申请

US20130029790A1 Handheld Performance Tracking and Mapping Device Utilizing an Optical Scanner 有权
标题翻译：使用光学扫描仪的手持式性能跟踪和映射设备
公开(公告)号：US20130029790A1
公开(公告)日：2013-01-31
申请号：US13558451
申请日：2012-07-26
申请人： John Clark
发明人： John Clark
IPC分类号： A63B57/00 , A63B69/36
CPC分类号： A63B71/0669 , A63B24/0062 , A63B57/00 , A63B2024/0068 , A63B2069/3605 , A63B2071/0691 , A63B2220/12 , A63B2220/805
摘要： Disclosed is a golf performance tracking and mapping device that utilizes a handheld, portable device having an optical scanner for reading waypoints along a course map, cataloging strokes, distances and further for suggesting and cataloging club choices throughout a round. The data gathered during the round is utilized to create measurable data that can be utilized to create a portfolio of a specific round for posterity, or further for creating data that can be statistically analyzed for a specific user, wherein club ranges, weaknesses and strengths can be determined over a statistically significant period for performance tracking. The device includes a display and an internal global positioning system for tracking location. It is desired that the present tracking device require minimal user input beyond club scanning prior to subsequent swings.
摘要翻译：公开了一种使用具有光学扫描仪的手持式便携式设备的高尔夫演奏跟踪和绘图设备，该光学扫描器用于沿着课程图读取路点，编目笔画，距离以及进一步用于在整个轮次中建议和编目俱乐部选择。在这一轮期间收集的数据被用于创建可测量的数据，可用于创建特定轮次的后代组合，或进一步创建可以针对特定用户进行统计分析的数据，其中球杆范围，弱点和强度可以在统计显着的时期内确定绩效跟踪。该设备包括显示器和用于跟踪位置的内部全局定位系统。希望本次跟踪装置在随后的摆动之前需要超出俱乐部扫描的最小用户输入。

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