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1. 发明申请

US20050156286A1 Method for improving a physical property defect value of a gate dielectric 审中-公开
标题翻译：改善栅极电介质物性缺陷值的方法
公开(公告)号：US20050156286A1
公开(公告)日：2005-07-21
申请号：US11038545
申请日：2005-01-18
申请人： Brian Kirkpatrick , Mercer Brugler , Eddie Breashears , Jon Holt , Corbett Zabierek , Rajesh Khamankar
发明人： Brian Kirkpatrick , Mercer Brugler , Eddie Breashears , Jon Holt , Corbett Zabierek , Rajesh Khamankar
IPC分类号： H01L21/28 , H01L21/3105 , H01L29/51 , H01L21/26 , H01L21/324 , H01L21/42 , H01L21/4763 , H01L21/477 , H01L23/58
CPC分类号： H01L21/28176 , H01L21/3105 , H01L29/518
摘要： The present invention provides a method for improving a physical property of a substrate, a method for manufacturing an integrated circuit, and an integrated circuit manufactured using the aforementioned method. In one aspect of the invention, the method for improving a physical property of a substrate includes subjecting the substrate to effects of a plasma process 830, wherein the substrate has a physical property defect value associated therewith subsequent to the plasma process. The method further includes exposing the substrate to an ultraviolet (UV) energy source 840 to improve the physical property defect value.
摘要翻译：本发明提供一种提高基板的物理性能的方法，集成电路的制造方法以及使用上述方法制造的集成电路。在本发明的一个方面，用于改善基板的物理性能的方法包括使基板受到等离子体工艺830的影响，其中基板在等离子体处理之后具有与其相关联的物理性能缺陷值。该方法还包括将衬底暴露于紫外（UV）能量源840以改善物理性能缺陷值。

2. 发明授权

US06869862B2 Method for improving a physical property defect value of a gate dielectric 有权
标题翻译：改善栅极电介质物性缺陷值的方法
公开(公告)号：US06869862B2
公开(公告)日：2005-03-22
申请号：US10637288
申请日：2003-08-08
申请人： Brian K. Kirkpatrick , Mercer Brugler , Eddie Breashears , Jon Holt , Corbett Zabierek , Rajesh Khamankar
发明人： Brian K. Kirkpatrick , Mercer Brugler , Eddie Breashears , Jon Holt , Corbett Zabierek , Rajesh Khamankar
IPC分类号： H01L21/28 , H01L21/3105 , H01L29/51 , H01I21/46 , H01L21/479 , H01I21/326 , H01I21/78
CPC分类号： H01L21/28176 , H01L21/3105 , H01L29/518
摘要： The present invention provides a method for improving a physical property of a substrate, a method for manufacturing an integrated circuit, and an integrated circuit manufactured using the aforementioned method. In one aspect of the invention, the method for improving a physical property of a substrate includes subjecting the substrate to effects of a plasma process 830, wherein the substrate has a physical property defect value associated therewith subsequent to the plasma process. The method further includes exposing the substrate to an ultraviolet (UV) energy source 840 to improve the physical property defect value.
摘要翻译：本发明提供一种提高基板的物理性能的方法，集成电路的制造方法以及使用上述方法制造的集成电路。在本发明的一个方面，用于改善基板的物理性能的方法包括使基板受到等离子体工艺830的影响，其中基板在等离子体处理之后具有与其相关联的物理性能缺陷值。该方法还包括将衬底暴露于紫外（UV）能量源840以改善物理性能缺陷值。

3. 发明申请

US20060183337A1 Post high voltage gate dielectric pattern plasma surface treatment 有权
公开(公告)号：US20060183337A1
公开(公告)日：2006-08-17
申请号：US11343680
申请日：2006-01-31
申请人： Brian Kirkpatrick , Rajesh Khamankar , Malcolm Bevan , April Gurba , Husam Alshareef , Clinton Montgomery , Mark Somervell
发明人： Brian Kirkpatrick , Rajesh Khamankar , Malcolm Bevan , April Gurba , Husam Alshareef , Clinton Montgomery , Mark Somervell
IPC分类号： H01L21/302 , C23F1/00 , B44C1/22
CPC分类号： H01L21/823462 , H01L21/28202 , H01L21/31111 , H01L21/31138 , H01L21/3144 , H01L21/82345 , H01L21/823842 , H01L21/823857 , H01L29/518
摘要： The present invention provides a method for fabricating a dual gate semiconductor device. In one aspect, the method comprises forming a nitridated, high voltage gate dielectric layer over a semiconductor substrate, patterning a photoresist over the nitridated, high voltage gate dielectric layer to expose the nitridated, high voltage dielectric within a low voltage region wherein the patterning leaves an accelerant residue on the exposed nitridated, high voltage gate dielectric layer. The method further includes subjecting the exposed nitridated, high voltage dielectric to a plasma to remove the accelerant residue.

4. 发明申请

US20060084229A1 Post high voltage gate oxide pattern high-vacuum outgas surface treatment 有权
公开(公告)号：US20060084229A1
公开(公告)日：2006-04-20
申请号：US11292883
申请日：2005-12-02
申请人： Brian Kirkpatrick , Rajesh Khamankar , Malcolm Bevan , April Gurba , Husam Alshareef , Clinton Montgomery , Mark Somervell
发明人： Brian Kirkpatrick , Rajesh Khamankar , Malcolm Bevan , April Gurba , Husam Alshareef , Clinton Montgomery , Mark Somervell
IPC分类号： H01L21/8234
CPC分类号： H01L21/28202 , H01L21/02046 , H01L21/26506 , H01L21/28167 , H01L21/31105 , H01L21/31111 , H01L21/31144 , H01L21/3185 , H01L21/823462 , H01L29/518
摘要： The present invention provides a method for fabricating a dual gate semiconductor device. In one aspect, the method comprises forming a nitridated, high voltage gate dielectric layer over a semiconductor substrate, patterning a photoresist over the nitridated, high voltage gate dielectric layer to expose the nitridated, high voltage dielectric within a low voltage region, wherein the patterning leaves an accelerant residue on the exposed nitridated, high voltage gate dielectric layer, and subjecting the exposed nitridated, high voltage dielectric to a high vacuum to remove the accelerant residue.

5. 发明申请

US20080076076A1 REWORK METHODOLOGY THAT PRESERVES GATE PERFORMANCE 审中-公开
标题翻译：保持门控性能的方法学
公开(公告)号：US20080076076A1
公开(公告)日：2008-03-27
申请号：US11534342
申请日：2006-09-22
申请人： Yaw Samuel Obeng , Yu-Tai Lee , Rajesh Khamankar , April Gurba , Brian Kirkpatrick , Ajith Varghese
发明人： Yaw Samuel Obeng , Yu-Tai Lee , Rajesh Khamankar , April Gurba , Brian Kirkpatrick , Ajith Varghese
IPC分类号： G03F7/26
CPC分类号： H01L21/0273 , G03F7/423 , G03F7/427
摘要： In one embodiment, a method of manufacturing an integrated circuit that comprises forming a circuit layer over a substrate, forming a resist layer on the circuit layer, and subjecting the resist layer to a rework process that includes exposing the resist layer to an organic wash. In another embodiment, the method of manufacturing an integrated circuit comprises forming a circuit layer over a substrate, forming a priming layer on the circuit layer, and subjecting the resist layer to the rework process. The reworking process includes exposing the substrate to a mild plasma ash to substantially remove portions of the resist layer but leave the priming layer.
摘要翻译：在一个实施例中，一种制造集成电路的方法包括在衬底上形成电路层，在电路层上形成抗蚀剂层，并对抗蚀剂层进行包括将抗蚀剂层暴露于有机洗涤物的返工工艺。在另一个实施例中，制造集成电路的方法包括在衬底上形成电路层，在电路层上形成起动层，并对抗蚀剂层进行返工处理。返修过程包括将基底暴露于温和的等离子体灰中以基本上去除抗蚀剂层的部分，但留下引发层。

6. 发明授权

US07670892B2 Nitrogen based implants for defect reduction in strained silicon 有权
标题翻译：用于应变硅缺陷还原的氮基植入物
公开(公告)号：US07670892B2
公开(公告)日：2010-03-02
申请号：US11268040
申请日：2005-11-07
申请人： Srinivasan Chakravarthi , Pr Chidambaram , Rajesh Khamankar , Haowen Bu , Douglas T. Grider
发明人： Srinivasan Chakravarthi , Pr Chidambaram , Rajesh Khamankar , Haowen Bu , Douglas T. Grider
IPC分类号： H01L21/336 , H01L21/8234
CPC分类号： H01L29/7833 , H01L21/26506 , H01L29/665 , H01L29/6659 , H01L29/7843
摘要： A transistor is fabricated upon a semiconductor substrate, where the yield strength or elasticity of the substrate is enhanced or otherwise adapted. A strain inducing layer is formed over the transistor to apply a strain thereto to alter transistor operating characteristics, and more particularly to enhance the mobility of carriers within the transistor. Enhancing carrier mobility allows transistor dimensions to be reduced while also allowing the transistor to operate as desired. However, high strain and temperature associated with fabricating the transistor result in deleterious plastic deformation. The yield strength of the silicon substrate is therefore adapted by incorporating nitrogen into the substrate, and more particularly into source/drain extension regions and/or source/drain regions of the transistor. The nitrogen can be readily incorporated during transistor fabrication by adding it as part of source/drain extension region formation and/or source/drain region formation. The enhanced yield strength of the substrate mitigates plastic deformation of the transistor due to the strain inducing layer.
摘要翻译：晶体管制造在半导体衬底上，其中衬底的屈服强度或弹性得到增强或适应。应变感应层形成在晶体管上以向其施加应变以改变晶体管工作特性，更具体地说，增强晶体管内的载流子迁移率。增强载流子迁移率允许晶体管尺寸减小，同时也允许晶体管根据需要进行操作。然而，与制造晶体管相关的高应变和温度导致有害的塑性变形。因此，硅衬底的屈服强度通过将氮掺入到衬底中，更具体地掺入晶体管的源极/漏极延伸区域和/或源极/漏极区域来适应。在晶体管制造期间，可以通过将其作为源极/漏极延伸区域形成和/或源极/漏极区域形成的一部分来添加来将氮容易地并入。由于应变诱导层，衬底的增强的屈服强度减轻了晶体管的塑性变形。

7. 发明申请

US20090152639A1 Laminated Stress Overlayer Using In-SITU Multiple Plasma Treatments for Transistor Improvement 审中-公开
标题翻译：使用In-SITU多重等离子体处理晶体管改进的层压应力覆盖层
公开(公告)号：US20090152639A1
公开(公告)日：2009-06-18
申请号：US11959111
申请日：2007-12-18
申请人： Haowen Bu , Jerry Che-Jen Hu , Rajesh Khamankar
发明人： Haowen Bu , Jerry Che-Jen Hu , Rajesh Khamankar
IPC分类号： H01L29/94 , H01L21/31 , H01L21/8238 , H01L23/58
CPC分类号： H01L21/022 , C23C14/0652 , C23C16/56 , H01L21/02164 , H01L21/0217 , H01L21/02211 , H01L21/02274 , H01L21/3105 , H01L21/3185 , H01L21/76826 , H01L21/76832 , H01L21/76834 , H01L21/823807 , H01L29/665 , H01L29/7843
摘要： Integrated circuits (ICs) commonly contain pre-metal dielectric (PMD) liners with compressive stress to increase electron and hole mobilities in MOS transistors. The increase is limited by the thickness of the PMD liner. The instant invention is a multi-layered PMD liner in an integrated circuit which has a higher stress than single layer PMD liners. Each layer in the inventive PMD liner is exposed to a nitrogen-containing plasma, and which has a compressive stress higher than 1300 MPa. The PMD liner of the instant invention is composed of 3 to 10 layers. The hydrogen content of the first layer may be increased to improve transistor properties such as flicker noise and Negative Bias Temperature Instabilty (NBTI). An IC containing the inventive PMD liner and a method for forming same are also claimed.
摘要翻译：集成电路（IC）通常含有具有压应力的预金属电介质（PMD）衬垫，以增加MOS晶体管中的电子和空穴迁移率。该增加受到PMD衬套的厚度的限制。本发明是集成电路中的多层PMD衬垫，其具有比单层PMD衬垫更高的应力。将本发明的PMD衬垫中的每个层暴露于含氮等离子体，并且具有高于1300MPa的压缩应力。本发明的PMD衬垫由3〜10层构成。可以增加第一层的氢含量以改善诸如闪烁噪声和负偏压温度不稳定性（NBTI）的晶体管特性。还要求一种包含本发明的PMD衬垫的IC及其形成方法。

8. 发明授权

US07535066B2 Gate structure and method 有权
标题翻译：门结构和方法
公开(公告)号：US07535066B2
公开(公告)日：2009-05-19
申请号：US10349686
申请日：2003-01-23
申请人： Antonio L. P. Rotondaro , Luigi Colombo , Mark R. Visokay , Rajesh Khamankar , Douglas E. Mercer
发明人： Antonio L. P. Rotondaro , Luigi Colombo , Mark R. Visokay , Rajesh Khamankar , Douglas E. Mercer
IPC分类号： H01L29/76 , H01L29/94
CPC分类号： H01L21/28194 , H01L21/28202 , H01L21/823857 , H01L21/823871 , H01L27/092 , H01L29/517 , H01L29/518
摘要： A MOSFET structure including silicate gate dielectrics with nitridation treatments of the gate dielectric prior to gate material deposition.
摘要翻译：一种MOSFET结构，包括在栅极材料沉积之前具有栅极电介质的氮化处理的硅酸盐栅极电介质。

9. 发明授权

US07402524B2 Post high voltage gate oxide pattern high-vacuum outgas surface treatment 有权
标题翻译：后高压栅氧化层图案高真空脱气表面处理
公开(公告)号：US07402524B2
公开(公告)日：2008-07-22
申请号：US11292883
申请日：2005-12-02
申请人： Brian K. Kirkpatrick , Rajesh Khamankar , Malcolm J. Bevan , April Gurba , Husam N. Alshareef , Clinton L. Montgomery , Mark H. Somervell
发明人： Brian K. Kirkpatrick , Rajesh Khamankar , Malcolm J. Bevan , April Gurba , Husam N. Alshareef , Clinton L. Montgomery , Mark H. Somervell
IPC分类号： H01L21/00
CPC分类号： H01L21/28202 , H01L21/02046 , H01L21/26506 , H01L21/28167 , H01L21/31105 , H01L21/31111 , H01L21/31144 , H01L21/3185 , H01L21/823462 , H01L29/518
摘要： The present invention provides a method for fabricating a dual gate semiconductor device. In one aspect, the method comprises forming a nitridated, high voltage gate dielectric layer over a semiconductor substrate, patterning a photoresist over the nitridated, high voltage gate dielectric layer to expose the nitridated, high voltage dielectric within a low voltage region, wherein the patterning leaves an accelerant residue on the exposed nitridated, high voltage gate dielectric layer, and subjecting the exposed nitridated, high voltage dielectric to a high vacuum to remove the accelerant residue.
摘要翻译：本发明提供一种制造双栅极半导体器件的方法。在一个方面，该方法包括在半导体衬底上形成氮化的高电压栅极电介质层，在氮化的高压栅极电介质层上形成光致抗蚀剂，以在低电压区域内露出氮化的高电压电介质，其中图案化在暴露的氮化高压栅极电介质层上留下促进剂残留物，并将暴露的氮化高压电介质施加到高真空以除去促进剂残余物。

10. 发明申请

US20060154411A1 CMOS transistors and methods of forming same 审中-公开
标题翻译： CMOS晶体管及其形成方法
公开(公告)号：US20060154411A1
公开(公告)日：2006-07-13
申请号：US11372430
申请日：2006-03-09
申请人： Haowen Bu , Brian Hornung , P.R. Chidambaram , Amitabh Jain , Rajesh Khamankar , Nandu Mahalingam , Srinivansan Chakravarthi
发明人： Haowen Bu , Brian Hornung , P.R. Chidambaram , Amitabh Jain , Rajesh Khamankar , Nandu Mahalingam , Srinivansan Chakravarthi
IPC分类号： H01L21/338 , H01L21/31
CPC分类号： H01L21/26506 , H01L21/265 , H01L21/26513 , H01L21/2658 , H01L21/3185 , H01L21/324 , H01L21/823814 , H01L21/823864 , H01L29/0847 , H01L29/665 , H01L29/6656 , H01L29/6659 , H01L29/7833 , H01L29/7843 , H01L29/7845
摘要： The present invention teaches the formation of CMOS transistors using interfacial nitrogen at the interface between the lightly doped extension regions and an overlying insulating layer in combination with a capping layer of silicon nitride, both prior to the final source/drain anneal. Doses and energies may be increased for the P-channel lightly-doped drain, source and drain regions. The resulting transistors exhibit desirably high drive current and low off-state leakage current and overlap capacitance.
摘要翻译：本发明教导了在最终的源极/漏极退火之前，在轻掺杂的延伸区域之间的界面处的界面氮和与氮化硅覆盖层结合的上覆绝缘层的CMOS晶体管的形成。 P沟道轻掺杂漏极，源极和漏极区域的剂量和能量可能会增加。所得到的晶体管显示期望的高驱动电流和低截止状态的漏电流和重叠电容。

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