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    • 6. 发明授权
    • Memory device
    • 内存设备
    • US06567296B1
    • 2003-05-20
    • US10041684
    • 2001-10-24
    • Giulio CasagrandeTyler LowreyRoberto BezGuy WickerEdward SpallStephen HudgensWolodymyr Czubatyj
    • Giulio CasagrandeTyler LowreyRoberto BezGuy WickerEdward SpallStephen HudgensWolodymyr Czubatyj
    • G11C1706
    • G11C11/56G11C11/5678G11C13/0004G11C2213/72
    • A memory device including a plurality of memory cells, a plurality of insulated first regions of a first type of conductivity formed in a chip of semiconductor material, at least one second region of a second type of conductivity formed in each first region, a junction between each second region and the corresponding first region defining a unidirectional conduction access element for selecting a corresponding memory cell connected to the second region when forward biased, and at least one contact for contacting each first region; a plurality of access elements are formed in each first region, the access elements being grouped into at least one sub-set consisting of a plurality of adjacent access elements without interposition of any contact, and the memory device further includes means for forward biasing the access elements of each sub-set simultaneously.
    • 一种存储器件,包括多个存储器单元,形成在半导体材料的芯片中的第一类型的导电性的多个绝缘的第一区域,在每个第一区域中形成的至少一个第二导电类型的第二区域, 每个第二区域和相应的第一区域限定单向传导访问元件,用于当正向偏置时选择连接到第二区域的对应的存储单元,以及用于接触每个第一区域的至少一个触点; 在每个第一区域中形成多个访问元件,所述访问元件被分组成由多个相邻的访问元件组成的至少一个子集,而不插入任何联系人,并且所述存储器设备还包括: 每个子集的元素同时进行。
    • 9. 发明申请
    • Electrically rewritable non-volatile memory element and method of manufacturing the same
    • 电可重写非易失性存储元件及其制造方法
    • US20070096074A1
    • 2007-05-03
    • US11264129
    • 2005-11-02
    • Isamu AsanoNatsuki SatoTyler LowreyGuy WickerWolodymyr CzubatyjStephen Hudgens
    • Isamu AsanoNatsuki SatoTyler LowreyGuy WickerWolodymyr CzubatyjStephen Hudgens
    • H01L47/00
    • H01L45/06H01L27/2436H01L45/1233H01L45/126H01L45/144H01L45/148
    • A non-volatile memory element includes a first interlayer insulation layer 11 having a first through-hole 11a, a second interlayer insulation layer 12 having a second through-hole 12a formed on the first interlayer insulation layer 11, a bottom electrode 13 provided in the first through-hole 11, recording layer 15 containing phase change material provided in the second through-hole 12, a top electrode 16 provided on the second interlayer insulation layer 12, and a thin-film insulation layer 14 formed between the bottom electrode 13 and the recording layer 15. In accordance with this invention, the diameter D1 of a bottom electrode 13 buried in a first through-hole 11a is smaller than the diameter D2 of a second through-hole 12a, thereby decreasing the thermal capacity of the bottom electrode 13. Therefore, when a pore 14a is formed by dielectric breakdown in a thin-film insulation layer 14 and the vicinity is used as a heating region, the amount of heat escaping to the bottom electrode 13 is decreased, resulting in higher heating efficiency.
    • 非易失性存储元件包括具有第一通孔11a的第一层间绝缘层11,具有形成在第一层间绝缘层11上的第二通孔12a的第二层间绝缘层12, 在第一通孔11中,设置在第二通孔12中的包含相变材料的记录层15,设置在第二层间绝缘层12上的顶部电极16和形成在第二通孔12的底部电极之间的薄膜绝缘层14 13和记录层15。 根据本发明,埋在第一通孔11a中的底部电极13的直径D 1小于第二通孔12a的直径D 2,从而降低底部电极13的热容量 。 因此,当通过薄膜绝缘层14中的电介质击穿形成孔14a并且将其附近用作加热区域时,逸出到底部电极13的热量减少,导致更高的加热效率。