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    • 5. 发明申请
    • SYSTEMS AND METHOD FOR OPTIMIZATION OF LASER BEAM SPATIAL INTENSITY PROFILE
    • 用于优化激光光束空间强度特征的系统和方法
    • US20070251928A1
    • 2007-11-01
    • US11381052
    • 2006-05-01
    • Brandon TurkDavid Knowles
    • Brandon TurkDavid Knowles
    • B23K26/00
    • B23K26/0738
    • In a thin beam directional Crystallization System configured anneal a silicon layer on a glass substrate uses a special laser beam profile with an intensity peak at one edge. The system is configured to entirely melt a spatially controlled portion of a silicon layer causing lateral crystal growth. By advancing the substrate or laser a certain step size and subjecting the silicon layer to successive “shots” rom the laser, the entire silicon layer is crystallized. The lateral crystal growth creates a protrusion in the center of the melt area. This protrusion must be re-melted. Accordingly, the step size must be such that there is sufficient overlap between successive shots, i.e., melt zones, to ensure the protrusion is melted. This requires the step size to be less than half the beam width. A smaller step size reduces throughput and increases costs. The special laser profile used in accordance with the systems and methods described herein can increase the step size and thereby increase throughput and reduce costs.
    • 在配置退火的薄光束定向晶化系统中,玻璃基板上的硅层使用在一个边缘具有强度峰值的特殊激光束分布。 该系统被配置为完全熔化导致横向晶体生长的硅层的空间受控部分。 通过使衬底或激光器前进一定的步长并使硅层经受连续的激光照射,整个硅层被结晶。 横向晶体生长在熔体区域的中心产生突起。 该突起必须再熔化。 因此,台阶尺寸必须使得连续的镜头即熔体区域之间存在足够的重叠,以确保突起被熔化。 这需要步长小于波束宽度的一半。 较小的步距可以减少吞吐量并增加成本。 根据本文所述的系统和方法使用的特殊激光轮廓可以增加步长,从而增加产量并降低成本。