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1. 发明授权

US07029508B2 Catalyst attached to solid and used to promote free radical formation in CMP formulations 有权
标题翻译：催化剂附着在固体上，用于促进CMP制剂中的自由基形成
公开(公告)号：US07029508B2
公开(公告)日：2006-04-18
申请号：US10361822
申请日：2003-02-11
申请人： Brandon Shane Scott , Robert J. Small
发明人： Brandon Shane Scott , Robert J. Small
IPC分类号： C09G1/02 , C09G1/04 , B24B1/00
CPC分类号： H01L21/3212 , B24B37/044 , C03C19/00 , C09G1/02 , C09K3/1436 , C09K3/1445 , C09K3/1463 , C23F3/00 , C23F3/04 , G11B5/3163 , G11B5/3169 , Y02P20/582
摘要： The present invention provides a composition for chemical-mechanical polishing which comprises at least one abrasive particle having a surface at least partially coated by a activator. The activator comprises a metal other than a metal of Group 4(b), Group 5(b) or Group 6(b). The composition further comprises at least one oxidizing agent. The composition is believed to be effective by virtue of the interaction between the activator coated on the surface of the abrasive particles and the oxidizing agent, at the activator surface, to form free radicals. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced this method.
摘要翻译：本发明提供了一种用于化学机械抛光的组合物，其包括至少一种具有至少部分地被活化剂涂覆的表面的磨料颗粒。活化剂包括不同于第4组（b），第5组（b）或第6组（b）组的金属的金属。组合物还包含至少一种氧化剂。认为组合物由于在活化剂表面上涂覆在磨料颗粒表面上的活化剂与氧化剂之间的相互作用而有效，以形成自由基。本发明进一步提供了一种在基底表面上抛光特征或层如金属膜的组合物的方法。本发明另外提供了制造这种方法的基材。

2. 发明申请

US20090029553A1 Free radical-forming activator attached to solid and used to enhance CMP formulations 审中-公开
标题翻译：自由基形成活化剂连接到固体上并用于增强CMP配方
公开(公告)号：US20090029553A1
公开(公告)日：2009-01-29
申请号：US12232712
申请日：2008-09-23
申请人： Brandon Shane Scott , Robert J. Small
发明人： Brandon Shane Scott , Robert J. Small
IPC分类号： H01L21/304 , C09K13/00
CPC分类号： H01L21/3212 , B24B37/044 , C03C19/00 , C09G1/02 , C09K3/1436 , C09K3/1445 , C09K3/1463 , C23F3/00 , C23F3/04 , G11B5/3163 , G11B5/3169 , Y02P20/582
摘要： The present invention provides a composition for chemical-mechanical polishing which comprises at least one abrasive particle having a surface at least partially coated by a activator. The activator comprises a metal other than a metal of Group 4(b), Group 5(b) or Group 6(b). The composition further comprises at least one oxidizing agent. The composition is believed to be effective by virtue of the interaction between the activator coated on the surface of the abrasive particles and the oxidizing agent, at the activator surface, to form free radicals. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced this method.
摘要翻译：本发明提供了一种用于化学机械抛光的组合物，其包括至少一种具有至少部分地被活化剂涂覆的表面的磨料颗粒。活化剂包括不同于第4组（b），第5组（b）或第6组（b）组的金属的金属。组合物还包含至少一种氧化剂。认为组合物由于在活化剂表面上涂覆在磨料颗粒表面上的活化剂与氧化剂之间的相互作用而有效，以形成自由基。本发明进一步提供了一种在基底表面上抛光特征或层如金属膜的组合物的方法。本发明另外提供了制造这种方法的基材。

3. 发明授权

US07427305B2 Free radical-forming activator attached to solid and used to enhance CMP formulations 失效
标题翻译：自由基形成活化剂连接到固体上并用于增强CMP配方
公开(公告)号：US07427305B2
公开(公告)日：2008-09-23
申请号：US11405485
申请日：2006-04-18
申请人： Brandon Shane Scott , Robert J. Small
发明人： Brandon Shane Scott , Robert J. Small
IPC分类号： C09G1/02 , C09G1/04
CPC分类号： H01L21/3212 , B24B37/044 , C03C19/00 , C09G1/02 , C09K3/1436 , C09K3/1445 , C09K3/1463 , C23F3/00 , C23F3/04 , G11B5/3163 , G11B5/3169 , Y02P20/582
摘要： This invention relates to a method of making selected oxidizers or other free radical-producing compounds become more effective chemical etchants and/or oxidizers for CMP activities by promoting the formation of the free radicals in a CMP composition with one or more activators. The activator comprises iron, copper or combinations thereof. The activator coated abrasive is particularly effective as it brings the activator in close proximity to the targeted material on the substrate surface, and thus facilitates or accelerates the removal reaction substantially at the site of the targeted material. The activator reacts with the per-type oxidizer to form at least one oxygen-containing free radical. The invention further provides a method that employs the composition in the polishing of a feature or layer, such as a metal film, on a substrate surface. The invention additionally provides a substrate produced by this method.
摘要翻译：本发明涉及使用一种或多种活化剂促进在CMP组合物中形成自由基，使选择的氧化剂或其它产生自由基的化合物变成更有效的化学蚀刻剂和/或氧化剂用于CMP活性的方法。活化剂包括铁，铜或其组合。活化剂涂覆的磨料是特别有效的，因为其使活化剂紧邻基材表面上的目标材料，因此基本上在目标材料的位置促进或加速除去反应。活化剂与每种类型的氧化剂反应以形成至少一种含氧自由基。本发明进一步提供了一种在基底表面上抛光特征或层如金属膜的组合物的方法。本发明另外提供了通过该方法制造的基板。

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