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    • 4. 发明申请
    • GAS PULSE GENERATOR FOR BASELINE DRIFT CORRECTION AND RELATED SYSTEM AND METHOD
    • 用于基线修正的气体脉冲发生器及相关系统及方法
    • US20100101301A1
    • 2010-04-29
    • US12260007
    • 2008-10-28
    • Adam Dewey McBradyJ. David ZookAlex GuMichael L. Rhodes
    • Adam Dewey McBradyJ. David ZookAlex GuMichael L. Rhodes
    • G01N30/00
    • G01N33/0011G01N2030/122G01N2030/623Y10T436/25Y10T436/25375Y10T436/255
    • A method includes acquiring a chemical sample and modulating the chemical sample at a frequency greater than a drift frequency of a sensor. The method also includes determining at least one of a presence and a concentration of the analyte within the modulated chemical sample using the sensor. Modulating the chemical sample could include alternately absorbing at least some of the analyte into a sorbent material and releasing at least some of the analyte from the sorbent material. Modulating the chemical sample could also include heating the sorbent material, absorbing part of the analyte into the sorbent material, and passing a remaining portion of the analyte into the sensor. Modulating the chemical sample could further include stopping the heating of the sorbent material, releasing the part of the analyte from the sorbent material, and passing the sample with the released part of the analyte into the sensor.
    • 一种方法包括获取化学样品并以大于传感器的漂移频率的频率调制化学样品。 该方法还包括使用传感器确定调制的化学样品中的分析物的存在和浓度中的至少一种。 调制化学样品可以包括交替地将至少一些分析物吸收到吸附材料中并从吸附剂材料中释放至少一些分析物。 调制化学样品还可以包括加热吸附剂材料,将分析物的一部分吸收到吸附剂材料中,并将分析物的剩余部分传递到传感器中。 调制化学样品可进一步包括停止吸附剂材料的加热,将分析物的一部分从吸附剂材料中释放出来,并将样品与分析物的释放部分一起传递到传感器中。
    • 7. 发明授权
    • Acoustic wave etch rate sensor system
    • 声波蚀刻率传感器系统
    • US07322243B2
    • 2008-01-29
    • US11156012
    • 2005-06-16
    • James Z T LiuMichael L. RhodesAziz Rahman
    • James Z T LiuMichael L. RhodesAziz Rahman
    • G01H13/00G01N17/04
    • G01N17/02G01N29/022G01N33/2888G01N2291/0224G01N2291/0226G01N2291/0256G01N2291/0422G01N2291/0423G01N2291/0426G01N2291/0427
    • An acoustic wave sensor system for monitoring the etch rate or etch ability of a selective material has an acoustic wave sensing device having a piezoelectric substrate and at least one electrode coupled to the substrate for generating a propagating acoustic wave and for detecting changes in frequency or other propagation characteristics of the acoustic wave. A selective material is disposed on the substrate. Changes in propagation characteristics of the wave caused by etching of the selective material by an etchant can be analyzed to evaluate the etching rate or etch ability of the selective material. The sensing system can have a wireless sensing device which device is mountable in an oil filter system for monitoring the corrosion of the engine. The sensing device can be configured as BAW, SH-SAW, SH-APM, FPM devices or other acoustic wave devices.
    • 用于监测选择性材料的蚀刻速率或蚀刻能力的声波传感器系统具有声波感测装置,其具有压电衬底和耦合到衬底的至少一个电极,用于产生传播声波并用于检测频率或其它变化 声波的传播特性。 选择性材料设置在基板上。 可以分析通过蚀刻剂蚀刻选择性材料引起的波的传播特性的变化,以评估选择性材料的蚀刻速率或蚀刻能力。 感测系统可以具有无线感测装置,该装置可安装在用于监测发动机腐蚀的机油滤清器系统中。 感测装置可以配置为BAW,SH-SAW,SH-APM,FPM装置或其他声波装置。