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1. 发明授权

US08262928B2 Etchant and method of manufacturing an array substrate using the same 有权
标题翻译：蚀刻剂和使用其制造阵列基板的方法
公开(公告)号：US08262928B2
公开(公告)日：2012-09-11
申请号：US12777532
申请日：2010-05-11
申请人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
发明人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
IPC分类号： H01L33/44 , C09K13/08
CPC分类号： C23F1/26 , C23F1/18 , H01L21/32134 , H01L27/124 , H01L29/458
摘要： An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.
摘要翻译：蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％的约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％的唑类化合物，剩余的水。因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。因此，可以提高制造裕度，从而可以降低制造成本。

2. 发明授权

US08354288B2 Etchant and method of manufacturing an array substrate using the same 有权
标题翻译：蚀刻剂和使用其制造阵列基板的方法
公开(公告)号：US08354288B2
公开(公告)日：2013-01-15
申请号：US13566239
申请日：2012-08-03
申请人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
发明人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
IPC分类号： H01L21/461
CPC分类号： C23F1/26 , C23F1/18 , H01L21/32134 , H01L27/124 , H01L29/458
摘要： An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.
摘要翻译：蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％的唑类化合物，剩余的水。因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。因此，可以提高制造裕度，从而可以降低制造成本。

3. 发明申请

US20100291722A1 ETCHANT AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：使用其制造阵列基板的蚀刻和方法
公开(公告)号：US20100291722A1
公开(公告)日：2010-11-18
申请号：US12777532
申请日：2010-05-11
申请人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
发明人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
IPC分类号： H01L33/44 , C09K13/08 , H01L33/00
CPC分类号： C23F1/26 , C23F1/18 , H01L21/32134 , H01L27/124 , H01L29/458
摘要： An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.
摘要翻译：蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％的约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％的唑类化合物，剩余的水。因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。因此，可以提高制造裕度，从而可以降低制造成本。

4. 发明申请

US20120295380A1 ETCHANT AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME 有权
标题翻译：使用其制造阵列基板的蚀刻和方法
公开(公告)号：US20120295380A1
公开(公告)日：2012-11-22
申请号：US13566239
申请日：2012-08-03
申请人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
发明人： Bong-Kyun Kim , Jong-Hyun Choung , Byeong-Jin Lee , Sun-Young Hong , Hong-Sick Park , Shi-Yul Kim , Ki-Beom Lee , Sam-Young Cho , Sang-Woo Kim , Hyun-Cheol Shin , Won-Guk Seo
IPC分类号： H01L33/08
CPC分类号： C23F1/26 , C23F1/18 , H01L21/32134 , H01L27/124 , H01L29/458
摘要： An etchant includes about 0.1 percent by weight to about 30 percent by weight of ammonium persulfate (NH4)2S2O8, about 0.1 percent by weight to about 10 percent by weight of an inorganic acid, about 0.1 percent by weight to about 10 percent by weight of an acetate salt, about 0.01 percent by weight to about 5 percent by weight of a fluorine-containing compound, about 0.01 percent by weight to about 5 percent by weight of a sulfonic acid compound, about 0.01 percent by weight to about 2 percent by weight of an azole compound, and a remainder of water. Accordingly, the etchant may have high stability to maintain etching ability. Thus, manufacturing margins may be improved so that manufacturing costs may be reduced.
摘要翻译：蚀刻剂包括约0.1重量％至约30重量％的过硫酸铵（NH 4）2 S 2 O 8，约0.1重量％至约10重量％的无机酸，约0.1重量％至约10重量％的约0.01重量％至约5重量％的含氟化合物的乙酸盐，约0.01重量％至约5重量％的磺酸化合物，约0.01重量％至约2重量％的唑类化合物，剩余的水。因此，蚀刻剂可能具有高稳定性以保持蚀刻能力。因此，可以提高制造裕度，从而可以降低制造成本。

5. 发明授权

US08377325B2 Etchant for metal wiring and method for manufacturing metal wiring using the same 有权
标题翻译：金属布线用蚀刻剂及使用其的金属布线的制造方法
公开(公告)号：US08377325B2
公开(公告)日：2013-02-19
申请号：US13032563
申请日：2011-02-22
申请人： Nam-Seok Suh , Sun-Young Hong , Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Jean-Ho Song , Wang-Woo Lee , Do-Won Kim , Sang-Woo Kim , Won-Guk Seo , Hyun-Cheol Shin , Ki-Beom Lee , Sam-Young Cho
发明人： Nam-Seok Suh , Sun-Young Hong , Jong-Hyun Choung , Bong-Kyun Kim , Hong-Sick Park , Jean-Ho Song , Wang-Woo Lee , Do-Won Kim , Sang-Woo Kim , Won-Guk Seo , Hyun-Cheol Shin , Ki-Beom Lee , Sam-Young Cho
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68 , C23F1/00 , C25F3/00
CPC分类号： C09K13/08 , C23F1/18 , C23F1/26 , C23F1/44 , H01L21/28088 , H01L21/32134 , H01L27/1214 , H01L27/124 , H05K3/067
摘要： Exemplary embodiments of the present invention provide a metal wiring etchant. A metal wiring etchant according to an exemplary embodiment of the present invention includes ammonium persulfate, an organic acid, an ammonium salt, a fluorine-containing compound, a glycol-based compound, and an azole-based compound.
摘要翻译：本发明的示例性实施方案提供金属线路蚀刻剂。根据本发明的示例性实施方式的金属线蚀刻剂包括过硫酸铵，有机酸，铵盐，含氟化合物，二醇类化合物和唑类化合物。

6. 发明授权

US07686968B2 Composition for removing conductive materials and manufacturing method of array substrate using the same 有权
标题翻译：用于除去导电材料的组合物及使用其的阵列基板的制造方法
公开(公告)号：US07686968B2
公开(公告)日：2010-03-30
申请号：US11452387
申请日：2006-06-14
申请人： Kye-Chan Song , Jong-Il Kim , Kyoung-Mook Lee , Sam-Young Cho , Hyun-Cheol Shin , Nam-Seo Kim
发明人： Kye-Chan Song , Jong-Il Kim , Kyoung-Mook Lee , Sam-Young Cho , Hyun-Cheol Shin , Nam-Seo Kim
IPC分类号： G02F1/1333
CPC分类号： C23F1/16 , C09K13/06 , C23F1/20 , C23F1/26 , G02F1/13439 , G02F2001/136295
摘要： A composition for removing a conductive material and a manufacturing method of an array substrate using the composition, wherein the composition may include a nitric acid of about 3 to 15 wt %, a phosphoric acid of about 40 to 70 wt %, an acetic acid of about 5 to 35 wt %. The composition may further include a chlorine compound of about 0.05 to 5 wt %, a chlorine stabilizer of about 0.01 to 5 wt %, a pH stabilizer of about 0.01 to 5 wt %, and water of residual quantity.
摘要翻译：用于除去导电材料的组合物和使用该组合物的阵列基板的制造方法，其中所述组合物可以包括约3至15重量％的硝酸，约40至70重量％的磷酸，约5〜35重量％。该组合物可以进一步包括约0.05-5重量％的氯化合物，约0.01至5重量％的氯稳定剂，约0.01至5重量％的pH稳定剂和残留量的水。

7. 发明授权

US07355785B2 Gain-clamped semiconductor optical amplifier 有权
标题翻译：增益钳位半导体光放大器
公开(公告)号：US07355785B2
公开(公告)日：2008-04-08
申请号：US10825816
申请日：2004-04-16
申请人： Ho-In Kim , Jeong-Seok Lee , In-Kuk Yun , Hyun-Cheol Shin , Seung-Woo Kim , Seong-Taek Hwang
发明人： Ho-In Kim , Jeong-Seok Lee , In-Kuk Yun , Hyun-Cheol Shin , Seung-Woo Kim , Seong-Taek Hwang
IPC分类号： H01S3/30
CPC分类号： H01S5/50 , H01S5/028 , H01S5/0654 , H01S5/1014 , H01S5/1203 , H01S5/227 , H01S5/5072
摘要： A gain-clamped semiconductor optical amplifier is disclosed. The amplifier includes a gain waveguide for amplifying an optical signal input to the gain waveguide, and a grating layer, in contact with the gain waveguide, having a first grating disposed at a first end portion.
摘要翻译：公开了一种增益钳位半导体光放大器。放大器包括用于放大输入到增益波导的光信号的增益波导和与增益波导接触的光栅层，其具有设置在第一端部处的第一光栅。

8. 发明申请

US20050135738A1 Broadband light source and broadband optical module using the same 审中-公开
标题翻译：宽带光源和宽带光模块使用相同
公开(公告)号：US20050135738A1
公开(公告)日：2005-06-23
申请号：US10852041
申请日：2004-05-24
申请人： Hyun-Cheol Shin , In-Kuk Yun , Seong-Taek Hwang , Jeong-Seok Lee
发明人： Hyun-Cheol Shin , In-Kuk Yun , Seong-Taek Hwang , Jeong-Seok Lee
IPC分类号： H01S5/40 , G02B6/12 , G02B6/42 , H01S5/022 , G02B6/26
CPC分类号： G02B6/4206
摘要： Disclosed are a broadband light source and a broadband optical module using the broadband light source. The broadband light source includes a substrate, a plurality of waveguides including active layers for generating light of mutually differing wavelength bands, and formed on the substrate in order to extend from a first end to a second end of the broadband light source, a plurality of trenches located between waveguides in order to electrically and optically insulate the waveguides from each other, and a plurality of electrode devices for operating each of the waveguides.
摘要翻译：公开了宽带光源和使用宽带光源的宽带光模块。宽带光源包括基板，多个波导，包括用于产生相互不同的波长带的光的有源层，并且形成在基板上以便从宽带光源的第一端延伸到第二端，多个位于波导之间的沟槽，以便使波导彼此电和光学绝缘;以及多个用于操作每个波导的电极装置。

9. 发明申请

US20050122571A1 Gain-clamped semiconductor optical amplifier 有权
标题翻译：增益钳位半导体光放大器
公开(公告)号：US20050122571A1
公开(公告)日：2005-06-09
申请号：US10825816
申请日：2004-04-16
申请人： Ho-In Kim , Jeong-Seok Lee , In-Kuk Yun , Hyun-Cheol Shin , Seung-Woo Kim , Seong-Taek Hwang
发明人： Ho-In Kim , Jeong-Seok Lee , In-Kuk Yun , Hyun-Cheol Shin , Seung-Woo Kim , Seong-Taek Hwang
IPC分类号： H01S5/50 , H01S3/30 , H01S5/028 , H01S5/12 , H01S5/20 , H01S5/227 , H01S5/30
CPC分类号： H01S5/50 , H01S5/028 , H01S5/0654 , H01S5/1014 , H01S5/1203 , H01S5/227 , H01S5/5072
摘要： A gain-clamped semiconductor optical amplifier is disclosed. The amplifier includes a gain waveguide for amplifying an optical signal input to the gain waveguide, and a grating layer, in contact with the gain waveguide, having a first grating disposed at a first end portion.
摘要翻译：公开了一种增益钳位半导体光放大器。放大器包括用于放大输入到增益波导的光信号的增益波导和与增益波导接触的光栅层，其具有设置在第一端部处的第一光栅。

10. 发明授权

US07398021B2 Optical transmitter and passive optical network using the same 有权
标题翻译：光发射机和无源光网络使用相同
公开(公告)号：US07398021B2
公开(公告)日：2008-07-08
申请号：US11052400
申请日：2005-02-07
申请人： Hong-Seok Shin , Hyun-Cheol Shin , Seong-Taek Hwang , Dae-Kwang Jung
发明人： Hong-Seok Shin , Hyun-Cheol Shin , Seong-Taek Hwang , Dae-Kwang Jung
IPC分类号： H04J14/00
CPC分类号： H04J14/0282 , H04J14/02 , H04J14/0226 , H04J14/0246 , H04J14/025 , H04J2014/0253
摘要： An optical transmitter including a multi-lambda source to output injection light consisting of a plurality of injection wavelengths in channels, a circulator having a first port, a second port, and a third port, the circulator receiving the injection light at the first port, and outputting the received injection light to the second port, and further receiving signal light at the second port, and outputting the received signal light to the third port, an arrayed waveguide grating having a multiplexing port connected to the second port of the circulator, and a plurality of demultiplexing ports, spectrum-slicing injection light received from the circulator at the multiplexing port into a plurality of injection channels, and outputting the injection channels to the demultiplexing ports and further receiving and multiplexing a plurality of signal channels at the demultiplexing ports, into a signal light, and outputting the signal light to the multiplexing port, and a plurality of reflective semiconductor optical amplifiers connected to the demultiplexing ports of the arrayed waveguide grating, respectively, each of the reflective semiconductor optical amplifiers receiving an associated one of the injection channels, and amplifying the associated injection channel to generate an associated one of the signal channels.
摘要翻译：一种光发射机，包括多λ源，以输出由通道中的多个注入波长组成的注入光，具有第一端口，第二端口和第三端口的循环器，所述循环器在第一端口处接收注入光，并将所接收的注入光输出到第二端口，并且还在第二端口处接收信号光，并将接收到的信号光输出到第三端口;阵列波导光栅，具有连接到循环器的第二端口的多路复用端口;以及多个解复用端口，从多路复用端口的循环器接收的频谱分片注入光分成多个注入通道，并且将注入通道输出到解复用端口，并进一步在多路分用端口处接收和复用多个信号通道，信号光，并将信号光输出到多路复用端口，以及多个反射分别连接到阵列波导光栅的解复用端口的半导体光放大器，反射半导体光放大器中的每一个接收相关联的一个注入通道，以及放大关联的注入通道以产生相关联的一个信号通道。

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