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    • 3. 发明授权
    • Echo cancellation and echo channel estimation system using multiple antennas
    • 使用多个天线的回波消除和回波信道估计系统
    • US08184737B2
    • 2012-05-22
    • US12137697
    • 2008-06-12
    • Yong-Hoon LeeJin-Gon JoungEui-Rim Jeong
    • Yong-Hoon LeeJin-Gon JoungEui-Rim Jeong
    • H04B15/00
    • H04B7/015H04B7/04H04L5/0007H04L25/0224
    • Disclosed herein is an echo cancellation and echo channel estimation system that can relay transmit signals without interference with echo signals by canceling the undesired echo signals received by a relay. The echo cancellation and echo channel estimation system is designed to relay signals between a transmitter and a receiver through a relay using multiple antennas. The echo cancellation and echo channel estimation system includes a receive antenna, a preprocessing vector generation module, an echo cancellation module, and a transmit array antenna. The receive antenna receives a transmit signal from the transmitter and an echo signal via an echo channel. The preprocessing vector generation module generates a preprocessing vector and applies the preprocessing vector, the transmit signal and the echo signal, received from the receive antenna, to the echo cancellation module. The echo cancellation module cancels only the echo signal by multiplying the preprocessing vector, the transmit signal, and the echo signal. The transmit array antenna receives a retransmit signal from the echo cancellation module and resends the retransmit signal to the receiver.
    • 本文公开了一种回波消除和回波信道估计系统,其可以通过消除由继电器接收到的不期望的回波信号来中继发射信号而不干扰回波信号。 回波消除和回波信道估计系统被设计成通过使用多个天线的中继站在发射机和接收机之间中继信号。 回波消除和回波信道估计系统包括接收天线,预处理向量生成模块,回波消除模块和发射阵列天线。 接收天线通过回波信道接收来自发射机的发射信号和回波信号。 预处理向量生成模块生成预处理向量,并且将从接收天线接收的预处理向量,发送信号和回波信号应用于回声消除模块。 回波消除模块通过将预处理矢量,发射信号和回波信号相乘来仅消除回波信号。 发射阵列天线从回波消除模块接收重传信号,并将重传信号重发到接收机。
    • 9. 发明申请
    • Exposure apparatus for manufacturing semiconductors and method for inspecting pellicles
    • 制造半导体的曝光装置及检查薄膜的方法
    • US20070035715A1
    • 2007-02-15
    • US11502400
    • 2006-08-11
    • Hyung-Seok ChoiYong-Hoon LeeYo-Han AhnOk-Sun Lee
    • Hyung-Seok ChoiYong-Hoon LeeYo-Han AhnOk-Sun Lee
    • G03B27/62
    • G03F7/70933G03F7/707G03F7/70983
    • Example embodiments of the present invention relate to an apparatus for manufacturing semiconductors and a method of inspecting a pellicle. Other example embodiments of the present invention relate to an exposure apparatus for manufacturing semiconductors. The apparatus may include a reticle, a pellicle and a reticle chuck. The reticle may be mounted on an upper surface of the reticle chuck and the pellicle may be attached to a lower surface of the reticle chuck so that the pellicle may be detached again. There may be an empty space formed between the pellicle and the reticle. The reticle chuck may include holes for supplying or exhausting a purging gas from the empty space. Because a simpler yet more efficient purging system may be installed to the reticle chuck, an effective measure may be provided against contaminations on the pattern surface of the reticle.
    • 本发明的示例性实施例涉及半导体制造装置和检查防护薄膜组件的方法。 本发明的其他示例性实施例涉及用于制造半导体的曝光装置。 该设备可以包括掩模版,防护薄膜和掩模版卡盘。 标线片可以安装在标线盘卡盘的上表面上,并且防护薄膜组件可以附着在光罩卡盘的下表面上,从而可以再次剥离防护薄膜组件。 防护薄膜组件和掩模版之间可能存在空白空间。 标线卡盘可以包括用于从空的空间供给或排出净化气体的孔。 因为可以将更简单而更有效的清洗系统安装到标线盘卡盘上,所以可以提供对掩模版图案表面上的污染物的有效措施。