专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08609556B2 Thin film deposition apparatus with an expanding thermal plasma source and method for depositing a thin film using the same 有权
标题翻译：具有扩展的热等离子体源的薄膜沉积装置和使用其沉积薄膜的方法
公开(公告)号：US08609556B2
公开(公告)日：2013-12-17
申请号：US13496820
申请日：2010-09-17
申请人： Björn Van Gerwen , Roland Cornelis Maria Bosch , Franciscus Cornelius Dings
发明人： Björn Van Gerwen , Roland Cornelis Maria Bosch , Franciscus Cornelius Dings
IPC分类号： H01L21/31
CPC分类号： C23C16/513 , C23C16/54
摘要： Assembly and method for depositing a thin film including: providing an expanding thermal plasma plume, including at least one chemical component to be deposited; designating a first and a second deposition zone within the plasma plume, such that the first and second deposition zones have a mutually different relative content of the chemical component; providing a substrate, and transporting said substrate through the plasma plume along a substrate transport path having a substrate transport path direction; and providing a mask that is at least partly disposed in the plasma plume and that shields a portion of the substrate transport path from being deposited on, wherein said shielded portion of the substrate transport path extends in the direction of the substrate transport path and bridges at least the first deposition zone, while it starts or terminates in the second deposition zone.
摘要翻译：一种用于沉积薄膜的组装和方法，包括：提供膨胀的热等离子体羽流，其包括至少一种待沉积的化学组分; 指定等离子体羽流内的第一和第二沉积区，使得第一和第二沉积区具有相互不同的化学组分的相对含量; 提供基板，以及沿着具有基板输送路径方向的基板输送路径输送所述基板通过等离子体羽流; 并且提供至少部分地布置在等离子体羽流中并且屏蔽衬底传送路径的一部分的掩模，其中衬底传送路径的所述屏蔽部分沿着衬底传送路径的方向延伸并桥接在至少第一沉积区，而其在第二沉积区中开始或终止。

2. 发明申请

US20120220138A1 THIN FILM DEPOSITION APPARATUS AND METHOD FOR THE SAME 有权
标题翻译：薄膜沉积装置及其相关方法
公开(公告)号：US20120220138A1
公开(公告)日：2012-08-30
申请号：US13496820
申请日：2010-09-17
申请人： Björn Van Gerwen , Roland Cornelis Maria Bosch , Franciscus Cornelius Dings
发明人： Björn Van Gerwen , Roland Cornelis Maria Bosch , Franciscus Cornelius Dings
IPC分类号： H01L21/318 , C23C16/50
CPC分类号： C23C16/513 , C23C16/54
摘要： Assembly and method for depositing a thin film including: providing an expanding thermal plasma plume, including at least one chemical component to be deposited; designating a first and a second deposition zone within the plasma plume, such that the first and second deposition zones have a mutually different relative content of the chemical component; providing a substrate, and transporting said substrate through the plasma plume along a substrate transport path having a substrate transport path direction; and providing a mask that is at least partly disposed in the plasma plume and that shields a portion of the substrate transport path from being deposited on, wherein said shielded portion of the substrate transport path extends in the direction of the substrate transport path and bridges at least the first deposition zone, while it starts or terminates in the second deposition zone.
摘要翻译：一种用于沉积薄膜的组装和方法，包括：提供膨胀的热等离子体羽流，其包括至少一种待沉积的化学组分; 指定等离子体羽流内的第一和第二沉积区，使得第一和第二沉积区具有相互不同的化学组分的相对含量; 提供基板，以及沿着具有基板输送路径方向的基板输送路径输送所述基板通过等离子体羽流; 并且提供至少部分地布置在等离子体羽流中并且屏蔽衬底传送路径的一部分的掩模，其中衬底传送路径的所述屏蔽部分沿着衬底传送路径的方向延伸并桥接在至少第一沉积区，而其在第二沉积区中开始或终止。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式