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1. 发明授权

US07764687B1 Longest prefix match search technique 有权
标题翻译：最长前缀匹配搜索技术
公开(公告)号：US07764687B1
公开(公告)日：2010-07-27
申请号：US10401904
申请日：2003-03-28
申请人： Biao Gao , Yibin Yang , Charles Chen
发明人： Biao Gao , Yibin Yang , Charles Chen
IPC分类号： H04L12/56
CPC分类号： H04L45/04 , H04L45/7457
摘要： A router identifies in a data packet an address of a network device. An algorithm determines that the address and a first prefix in a tree data structure match up to a first mask length of the first prefix. The algorithm maintains the first prefix in a temporary storage location if there is a match, and determines whether the address and a second prefix in the tree data structure match up to a second mask length of the second prefix, wherein an external node of the second prefix is linked below an external node of the first prefix, and wherein the second mask length is longer than the first mask length. The algorithm maintains the second prefix as a better match of the address, if the address and the second prefix match up to the mask length of the second prefix.
摘要翻译：路由器在数据包中标识网络设备的地址。算法确定树数据结构中的地址和第一前缀匹配到第一前缀的第一掩码长度。如果存在匹配，该算法将第一前缀保持在临时存储位置，并且确定树数据结构中的地址和第二前缀是否匹配到第二前缀的第二掩码长度，其中第二前缀的外部节点前缀链接在第一前缀的外部节点的下方，并且其中第二掩码长度比第一掩码长度长。如果地址和第二个前缀匹配到第二个前缀的掩码长度，则该算法将第二个前缀保持为地址的更好的匹配。

2. 发明授权

US07606489B2 System control and management of passive optical networks 有权
标题翻译：无源光网络的系统控制和管理
公开(公告)号：US07606489B2
公开(公告)日：2009-10-20
申请号：US11420467
申请日：2006-05-25
申请人： Charles Chen , Yibin Yang
发明人： Charles Chen , Yibin Yang
IPC分类号： H04J14/00
CPC分类号： H04J14/0227 , H04J14/0238 , H04J14/0278 , H04J14/0282 , H04L41/00 , H04Q11/0067 , H04Q2011/0079 , H04Q2011/0081
摘要： A highly reliable, carrier class passive optical network and associated devices which employs multiple instances of operating software in host systems, as well as mechanisms to automatically determine whether an individual OLT device has entered or left the system without disruption to overall system operation.
摘要翻译：一种高度可靠的运营商级无源光网络和在主机系统中采用多种操作软件的相关设备，以及自动确定单个OLT设备是否进入或离开系统而不中断整个系统运行的机制。

3. 发明授权

US08150915B1 Personalized access using near field communication 有权
标题翻译：使用近场通信的个性化访问
公开(公告)号：US08150915B1
公开(公告)日：2012-04-03
申请号：US13251115
申请日：2011-09-30
申请人： Tiruvilwamalai Venkatraman Raman , Charles Chen
发明人： Tiruvilwamalai Venkatraman Raman , Charles Chen
IPC分类号： G06F15/16 , G06F12/00
CPC分类号： G07F19/20 , G06Q20/18 , G06Q20/3278 , G09B19/0038
摘要： Methods and systems for personalizing access to client devices using near field communication is disclosed. In a transaction between a client and a server, the client may detect the presence of a computing device using near field communication, and the device may be identified as an assistive computing device. Based on this information, the client may send the assistive computing device user interface data such that the transaction can be completed on the assistive computing device instead of the client.
摘要翻译：公开了使用近场通信个性化访问客户端设备的方法和系统。在客户机和服务器之间的事务中，客户端可以使用近场通信来检测计算设备的存在，并且该设备可以被识别为辅助计算设备。基于该信息，客户端可以发送辅助计算设备用户界面数据，使得事务可以在辅助计算设备而不是客户端上完成。

4. 发明申请

US20110073367A1 COMBINING BELIEF NETWORKS TO GENERATE EXPECTED OUTCOME 有权
标题翻译：组合BELIEF网络产生预期成果
公开(公告)号：US20110073367A1
公开(公告)日：2011-03-31
申请号：US12940253
申请日：2010-11-05
申请人： Clinton D. Chapman , Charles Chen
发明人： Clinton D. Chapman , Charles Chen
IPC分类号： E21B44/00 , G06N5/02
CPC分类号： E21B44/00 , E21B2041/0028 , G06N7/005
摘要： A computer usable medium including computer usable program code for determining an oilfield parameter for a drilling operation. The computer usable program code when executed causing a processor to identify first decision factors and second decision factors about the drilling operation, where each of the first decision factors is contained within first nodes, and where each of the second decision factors is contained within second nodes, where the first and second nodes contain common nodes. The computer usable program code further causing the processor to associate the first nodes to create a first belief network and associate the second nodes to create a second belief network, associate the common nodes of the first belief network with the common nodes of the second belief network to form a multinet belief network, and generate at least one oilfield parameter from the multinet belief network.
摘要翻译：一种计算机可用介质，包括用于确定用于钻井操作的油田参数的计算机可用程序代码。所述计算机可用程序代码在执行时导致处理器识别关于钻井操作的第一决策因素和第二决策因素，其中所述第一决策因素中的每一个包含在第一节点内，并且其中每个所述第二决策因素包含在所述第二节点内，其中第一和第二节点包含公共节点。所述计算机可用程序代码进一步使所述处理器关联所述第一节点以创建第一置信网络并关联所述第二节点以创建第二置信网络，将所述第一置信网络的公共节点与所述第二置信网络的公共节点相关联以形成多信任信念网络，并且从多信任信念网络生成至少一个油田参数。

5. 发明申请

US20080207089A1 METHODS AND SYSTEMS FOR MONITORING A PARAMETER OF A MEASUREMENT DEVICE DURING POLISHING, DAMAGE TO A SPECIMEN DURING POLISHING, OR A CHARACTERISTIC OF A POLISHING PAD OR TOOL 有权
标题翻译：用于在抛光期间监测测量装置的参数的方法和系统，在抛光期间对样品的损害，或抛光抛光或工具的特性
公开(公告)号：US20080207089A1
公开(公告)日：2008-08-28
申请号：US12032112
申请日：2008-02-15
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： B24B49/12
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a polishing tool are provided. One method includes scanning a specimen with a measurement device during polishing of a specimen to generate output signals at measurement spots on the specimen. The method also includes determining if the output signals are outside of a range of output signals. Output signals outside of the range may indicate that a parameter of the measurement device is out of control limits. In a different embodiment, output signals outside of the range may indicate damage to the specimen. Another method includes scanning a polishing pad with a measurement device to generate output signals at measurement spots on the polishing pad. The method also includes determining a characteristic of the polishing pad from the output signals.
摘要翻译：提供了用于在抛光期间监测测量装置的参数的方法和系统，在抛光期间对样本的损坏，抛光垫的特性或抛光工具的特性。一种方法包括在样品抛光期间用测量装置扫描样品，以在样品上的测量点产生输出信号。该方法还包括确定输出信号是否在输出信号的范围之外。超出范围的输出信号可能表示测量设备的参数失控。在不同的实施例中，在该范围之外的输出信号可以指示对样本的损伤。另一种方法包括用测量装置扫描抛光垫以在抛光垫上的测量点产生输出信号。该方法还包括从输出信号确定抛光垫的特性。

6. 发明授权

US07175503B2 Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device 有权
标题翻译：用于从涡流装置的组合输出信号确定样品上的区域内的抛光特性的方法和系统
公开(公告)号：US07175503B2
公开(公告)日：2007-02-13
申请号：US10358069
申请日：2003-02-04
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： B24B49/00 , B24B51/00
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Systems and methods for characterizing polishing of a specimen are provided. One method includes scanning a specimen with an eddy current device during polishing to generate output signals at measurement spots across the specimen. The method also includes combining a portion of the output signals generated at the measurement spots located within a zone on the specimen. In addition, the method includes determining a characteristic of polishing within the zone from the combined portion of the output signals. In some instances, a zone may include a predetermined range of radial and azimuthal positions on the specimen. In one embodiment, the method may include determining a characteristic of polishing within more than one zone on the specimen. Some embodiments may include determining an additional characteristic of polishing from the characteristic of polishing within more than one zone on the specimen.
摘要翻译：提供了用于表征样品抛光的系统和方法。一种方法包括在抛光过程中用涡流装置扫描样品，以在样品上的测量点产生输出信号。该方法还包括组合在位于样品上的区域内的测量点处产生的输出信号的一部分。此外，该方法包括从输出信号的组合部分确定该区域内的抛光特性。在一些情况下，区域可以包括样品上的径向和方位位置的预定范围。在一个实施例中，该方法可以包括确定在样本上的多于一个区域内的抛光的特性。一些实施例可以包括从样品上的多于一个区域内的抛光特性确定抛光的附加特性。

7. 发明申请

US20060131273A1 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool 有权
公开(公告)号：US20060131273A1
公开(公告)日：2006-06-22
申请号：US11353899
申请日：2006-02-14
申请人： Kurt Lehman , Charles Chen , Ronald Allen , Robert Shinagawa , Anantha Sethuraman , Christopher Bevis , Thanassis Trikas , Haiguang Chen , Ching Meng
发明人： Kurt Lehman , Charles Chen , Ronald Allen , Robert Shinagawa , Anantha Sethuraman , Christopher Bevis , Thanassis Trikas , Haiguang Chen , Ching Meng
IPC分类号： C23F1/00 , H01L21/306 , B44C1/22 , C03C25/68
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, a characteristic of a polishing pad, or a characteristic of a polishing tool are provided. One method includes scanning a specimen with a measurement device during polishing of a specimen to generate output signals at measurement spots on the specimen. The method also includes determining if the output signals are outside of a range of output signals. Output signals outside of the range may indicate that a parameter of the measurement device is out of control limits. In a different embodiment, output signals outside of the range may indicate damage to the specimen. Another method includes scanning a polishing pad with a measurement device to generate output signals at measurement spots on the polishing pad. The method also includes determining a characteristic of the polishing pad from the output signals.

8. 发明授权

US07052369B2 Methods and systems for detecting a presence of blobs on a specimen during a polishing process 有权
公开(公告)号：US07052369B2
公开(公告)日：2006-05-30
申请号：US10358104
申请日：2003-02-04
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： B24B49/00
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Systems and methods for detecting a presence of blobs on a specimen are provided. One method may include scanning measurement spots across a specimen during polishing of the specimen. The method may also include determining if the blobs are present on the specimen at the measurement spots. Each of the blobs may include unwanted material disposed upon a contiguous portion of the measurement spots. In some instances, the blobs may include copper. In some embodiments, scanning the measurement spots may include measuring an optical property and/or an electrical property of the specimen at the measurement spots. Another embodiment includes dynamically determining a signal threshold distinguishing a presence of the blobs from an absence of the blobs. An additional embodiment includes determining an endpoint of polishing if, for example, blobs are not determined to be present on the specimen.

9. 发明授权

US06884146B2 Systems and methods for characterizing a polishing process 有权
标题翻译：表征抛光过程的系统和方法
公开(公告)号：US06884146B2
公开(公告)日：2005-04-26
申请号：US10358105
申请日：2003-02-04
申请人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
发明人： Kurt Lehman , Charles Chen , Ronald L. Allen , Robert Shinagawa , Anantha Sethuraman , Christopher F. Bevis , Thanassis Trikas , Haiguang Chen , Ching Ling Meng
IPC分类号： B24B37/04 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12 , B24D49/00
CPC分类号： B24B37/013 , B24B37/042 , B24B41/04 , B24B49/04 , B24B49/10 , B24B49/12
摘要： Systems and methods for characterizing a polishing process are provided. One method includes scanning a specimen with two or more measurement devices during polishing. In one embodiment, the two or more measurement devices may include a reflectometer and a capacitance probe. In another embodiment, the two or more measurement devices may include an optical device and an eddy current device. An additional embodiment relates to a measurement device for scanning a specimen during polishing. The device includes a light source and a scanning assembly. The scanning assembly is configured to scan light from the light source across the specimen during polishing. Another measurement device includes a laser light source coupled to a first fiber optic bundle and a detector coupled to a second fiber optic bundle. An additional method includes scanning a specimen with different measurement devices during different steps of a polishing process.
摘要翻译：提供了表征抛光工艺的系统和方法。一种方法包括在抛光期间用两个或更多个测量装置扫描样品。在一个实施例中，两个或更多个测量装置可以包括反射计和电容探针。在另一个实施例中，两个或更多个测量装置可以包括光学装置和涡流装置。另外的实施例涉及用于在抛光期间扫描试样的测量装置。该装置包括光源和扫描组件。扫描组件被配置为在抛光期间扫描来自光源的光穿过样品。另一测量装置包括耦合到第一光纤束的激光光源和耦合到第二光纤束的检测器。另外的方法包括在抛光过程的不同步骤期间用不同的测量装置扫描试样。

10. 发明授权

US06867441B1 Metal fuse structure for saving layout area 有权
标题翻译：金属保险丝结构，节省布局面积
公开(公告)号：US06867441B1
公开(公告)日：2005-03-15
申请号：US10681656
申请日：2003-10-08
申请人： Chao-Hsiang Yang , Charles Chen , Wesley Lin , Harry Chuang , Ming-Hsin Li , Jeng-Long Huang
发明人： Chao-Hsiang Yang , Charles Chen , Wesley Lin , Harry Chuang , Ming-Hsin Li , Jeng-Long Huang
IPC分类号： H01L23/525 , H01L23/58 , H01L27/10
CPC分类号： H01L23/585 , H01L23/5258 , H01L2924/0002 , H01L2924/00
摘要： A fuse structure for a semiconductor device on a substrate includes a fuse having an electrically conductive fuse line of a standard fuse length formed in an electrically conductive layer disposed over the substrate, and a pair of electrically conductive, inwardly bent interconnects formed in a first plurality of electrically conductive layers disposed over the substrate, below the electrically conductive layer in which the fuse line is formed. The inwardly bent interconnects couple the fuse line to a circuit area of the substrate disposed under the fuse line. The fuse structure may further include a protective guard ring formed around the fuse. The guard ring includes a second plurality of electrically conductive interconnects.
摘要翻译：用于衬底上的半导体器件的熔丝结构包括具有形成在设置在衬底上的导电层中的标准熔丝长度的导电熔丝线的熔丝，以及形成在第一组中的一对导电的向内弯曲的互连的导电层设置在衬底上方，形成有熔丝线的导电层之下。向内弯曲的互连将熔丝线耦合到设置在熔丝线下方的衬底的电路区域。熔丝结构还可以包括围绕熔丝形成的保护保护环。保护环包括第二多个导电互连。

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