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1. 发明申请

US20080106527A1 Waveguide Configurations for Minimising Substrate Area 审中-公开
标题翻译：用于最小化基板面积的波导配置
公开(公告)号：US20080106527A1
公开(公告)日：2008-05-08
申请号：US11935124
申请日：2007-11-05
申请人： Benjamin Cornish , Robert Charters , Warwick Holloway , Ian Maxwell , Dax Kukulj
发明人： Benjamin Cornish , Robert Charters , Warwick Holloway , Ian Maxwell , Dax Kukulj
IPC分类号： G06F3/042 , G02B6/32 , G02B6/10
CPC分类号： G02B6/125 , G02B6/12004 , G02B6/1245 , G06F3/0421
摘要： The invention describes various optical waveguide layouts with reduced substrate area, with particular application to reducing bezel width in optical touch systems. In certain preferred embodiments the optical waveguide layouts include a plurality of waveguide crossings.
摘要翻译：本发明描述了具有减小的衬底面积的各种光波导布局，特别适用于减少光学触摸系统中的边框宽度。在某些优选实施例中，光波导布局包括多个波导交叉。

2. 发明申请

US20080074402A1 WAVEGUIDE CONFIGURATIONS FOR OPTICAL TOUCH SYSTEMS 失效
标题翻译：光学触摸系统的波形配置
公开(公告)号：US20080074402A1
公开(公告)日：2008-03-27
申请号：US11859331
申请日：2007-09-21
申请人： Benjamin Cornish , Robert Charters , Ian Maxwell , Graham Atkins , Dax Kukulj , Graeme Gordon
发明人： Benjamin Cornish , Robert Charters , Ian Maxwell , Graham Atkins , Dax Kukulj , Graeme Gordon
IPC分类号： G06F3/042
CPC分类号： G06F3/0421
摘要： The present invention relates to waveguide structures and optical elements for use in an optical touch screen sensor. The waveguide structures and optical elements allow for reduced bezel width and simplified assembly of optical touch screens sensors, and relaxed component tolerances.
摘要翻译：本发明涉及用于光学触摸屏传感器的波导结构和光学元件。波导结构和光学元件允许减少边框宽度和简化光学触摸屏传感器的组装以及放松的元件公差。

3. 发明申请

US20060088244A1 Planar lenses for integrated optics 失效
标题翻译：用于集成光学的平面透镜
公开(公告)号：US20060088244A1
公开(公告)日：2006-04-27
申请号：US11257736
申请日：2005-10-25
申请人： Dax Kukulj , Benjamin Cornish , Robert Charters , Graham Atkins , Barry Luther-Davies
发明人： Dax Kukulj , Benjamin Cornish , Robert Charters , Graham Atkins , Barry Luther-Davies
IPC分类号： G02B6/32 , G02B6/42
CPC分类号： G06F3/0421 , G02B6/12004 , G02B6/1221 , G02B6/124 , G02B6/1245 , G02B6/138 , G02B6/32 , G02B2006/12102
摘要： A planar lenses for integrated optics applications, in particular for use in optical touch screen sensors are disclosed. The disclosed planar lenses include a slab waveguide and an optical waveguide, preferably formed in unitary fashion, wherein the slab waveguide has a curved end face to focus light into or out of the optical waveguide, and wherein at least one additional lens is included within the slab waveguide. In one aspect of this disclosure, the additional lens is a diverging lens. In a second aspect the additional lens is a converging lens. The additional lens may match the acceptance angle of the optical waveguide to the curved end face of the slab waveguide. Alternatively, it may improve the tolerance of the planar lens to design or assembly errors and/or temperature variations. Preferably, the planar lenses are composed of a photo-patternable polymer, and the additional lenses are composed of air.
摘要翻译：公开了用于集成光学应用的平面透镜，特别是用于光学触摸屏传感器。所公开的平面透镜包括平板波导和光波导，其优选地以单一方式形成，其中平板波导具有弯曲的端面以将光聚焦入或流出光波导，并且其中至少一个附加透镜包括在平板波导。在本公开的一个方面，附加透镜是发散透镜。在第二方面，附加透镜是会聚透镜。附加透镜可以匹配光波导对平板波导的弯曲端面的接受角度。或者，可以提高平面透镜对设计或组装误差和/或温度变化的公差。优选地，平面透镜由可光图案化的聚合物组成，并且附加透镜由空气组成。

4. 发明申请

US20070287212A1 Planar Waveguide with Patterned Cladding and Method for Producing Same 有权
标题翻译：带有图案包层的平面波导及其制作方法
公开(公告)号：US20070287212A1
公开(公告)日：2007-12-13
申请号：US11693357
申请日：2007-03-29
申请人： Ian Maxwell , Dax Kukulj , Robert Charters
发明人： Ian Maxwell , Dax Kukulj , Robert Charters
IPC分类号： H01L21/00
CPC分类号： G02B6/1245 , G02B6/1228 , G02B6/138
摘要： Methods for the production of integrated optical waveguides which have a patterned upper cladding with a defined opening to allow at least one side or at least one end of a light transmissive element to be air clad The at least one side or at least one end is, for preference, a lens structure unitary with the waveguide or a bend.
摘要翻译：用于生产集成光波导的方法，其具有带有限定开口的图案化上包层，以允许透光元件的至少一侧或至少一端为空气包层。至少一侧或至少一端，优选地，与波导或弯曲一体的透镜结构。

5. 发明申请

US20050089298A1 Planar waveguide with patterned cladding and method for producing same 有权
标题翻译：具有图案包层的平面波导及其制造方法
公开(公告)号：US20050089298A1
公开(公告)日：2005-04-28
申请号：US10694928
申请日：2003-10-27
申请人： Ian Maxwell , Dax Kukulj , Robert Charters
发明人： Ian Maxwell , Dax Kukulj , Robert Charters
IPC分类号： G02B6/122 , G02B6/124 , G02B6/138 , G02B6/10 , G02B6/00
CPC分类号： G02B6/1245 , G02B6/1228 , G02B6/138
摘要： Integrated optical waveguides and methods for the production thereof which have a patterned upper cladding with a defined opening to allow at least one side or at least one end of a light transmissive element to be air clad. The at least one side or at least one end is, for preference, a lens structure unitary with the waveguide or a bend. Also provided is a method of fabricating an optical waveguide with a patterned cladding which comprises forming a patterned blocking layer opaque to a predetermined wavelength on a portion of a substrate transparent to the predetermined wavelength; depositing a core layer on said patterned blocking layer and/or on an uncovered portion of the substrate; patterning the core layer from above to provide a light transmissive element; depositing an upper cladding layer, which comprises a material curable by exposure to light of the predetermined wavelength, on the light transmissive element, and/or on the patterned blocking layer and/or on an uncovered portion of the substrate; irradiating said upper cladding layer from below with light of the predetermined wavelength, to cure those portions of said upper cladding layer not positioned above said patterned blocking layer; and removing non-cured portions of said upper cladding layer.
摘要翻译：集成光波导及其制造方法，其具有带有限定开口的图案化上包层，以允许透光元件的至少一侧或至少一端为空气包层。优选地，至少一个侧面或至少一个端部是与波导或弯曲部一体的透镜结构。还提供了一种制造具有图案化包层的光波导的方法，其包括在对预定波长透明的基板的一部分上形成对预定波长不透明的图案化阻挡层; 在所述图案化的阻挡层上和/或在所述衬底的未覆盖部分上沉积芯层; 从上方构图芯层以提供透光元件; 沉积上部包层，其包括通过暴露于预定波长的光可固化的材料在光透射元件上和/或图案化阻挡层上和/或在衬底的未覆盖部分上; 用预定波长的光从下方照射所述上包层，以固化不位于所述图案化阻挡层上方的所述上覆层的部分; 以及去除所述上包层的未固化部分。

6. 发明授权

US07923071B2 Photolithographic patterning of polymeric materials 有权
标题翻译：聚合材料的光刻图案化
公开(公告)号：US07923071B2
公开(公告)日：2011-04-12
申请号：US11355668
申请日：2006-02-15
申请人： Robert Charters , Dax Kukulj
发明人： Robert Charters , Dax Kukulj
IPC分类号： B05D3/00 , B05D3/06 , B05D3/10 , B32B27/00 , B32B27/36
CPC分类号： G03F7/091 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , B32B2250/02 , B32B2255/10 , B32B2255/26 , B32B2307/41 , B32B2307/42 , B32B2307/71 , B32B2457/208 , G02B6/1221 , G02B6/138 , G03F7/11 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31507
摘要： The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
摘要翻译：本发明包括在涂覆在塑料基材上的可光固化聚合物组合物中光刻图案化特征的方法。在本发明的一个实施例中，塑料基板涂覆有诸如金属屏障的反射膜。在另一个实施方案中，将塑料基材与含有吸收光固化辐射的添加剂的聚合物阻挡层进行涂布或共挤出。在另一个实施方案中，塑料基材含有吸收光固化辐射的固有添加剂。这些实施方案的组合也在本发明的范围内。本发明的方法可以有利地应用于包括支撑在塑料基板上的可光固化聚合物的光波导的制造，但是可应用于制造包含支撑在塑料基板上的可光固化聚合物的任何装置或物体。

7. 发明申请

US20120219771A1 Photolithographic Patterning of Polymeric Materials 有权
标题翻译：聚合材料的光刻图案
公开(公告)号：US20120219771A1
公开(公告)日：2012-08-30
申请号：US13315538
申请日：2011-12-09
申请人： Robert Charters , Dax Kukulj
发明人： Robert Charters , Dax Kukulj
IPC分类号： B32B3/10
CPC分类号： G03F7/091 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , B32B2250/02 , B32B2255/10 , B32B2255/26 , B32B2307/41 , B32B2307/42 , B32B2307/71 , B32B2457/208 , G02B6/1221 , G02B6/138 , G03F7/11 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31507
摘要： The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
摘要翻译：本发明包括在涂覆在塑料基材上的可光固化聚合物组合物中光刻图案化特征的方法。在本发明的一个实施例中，塑料基板涂覆有诸如金属屏障的反射膜。在另一个实施方案中，将塑料基材与含有吸收光固化辐射的添加剂的聚合物阻挡层进行涂布或共挤出。在另一个实施方案中，塑料基材含有吸收光固化辐射的固有添加剂。这些实施方案的组合也在本发明的范围内。本发明的方法可以有利地应用于包括支撑在塑料基板上的可光固化聚合物的光波导的制造，但是可应用于制造包含支撑在塑料基板上的可光固化聚合物的任何装置或物体。

8. 发明授权

US09176384B2 Photolithographic patterning of polymeric materials 有权
标题翻译：聚合材料的光刻图案化
公开(公告)号：US09176384B2
公开(公告)日：2015-11-03
申请号：US13315538
申请日：2011-12-09
申请人： Robert Charters , Dax Kukulj
发明人： Robert Charters , Dax Kukulj
IPC分类号： B32B3/10 , G03F7/09 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , G02B6/122 , G02B6/138 , G03F7/11
CPC分类号： G03F7/091 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , B32B2250/02 , B32B2255/10 , B32B2255/26 , B32B2307/41 , B32B2307/42 , B32B2307/71 , B32B2457/208 , G02B6/1221 , G02B6/138 , G03F7/11 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31507
摘要： The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
摘要翻译：本发明包括在涂覆在塑料基材上的可光固化聚合物组合物中光刻图案化特征的方法。在本发明的一个实施例中，塑料基板涂覆有诸如金属屏障的反射膜。在另一个实施方案中，将塑料基材与含有吸收光固化辐射的添加剂的聚合物阻挡层进行涂布或共挤出。在另一个实施方案中，塑料基材含有吸收光固化辐射的固有添加剂。这些实施方案的组合也在本发明的范围内。本发明的方法可以有利地应用于包括支撑在塑料基板上的可光固化聚合物的光波导的制造，但是可应用于制造包含支撑在塑料基板上的可光固化聚合物的任何装置或物体。

9. 发明申请

US20110151197A1 Photolithographic Patterning of Polymeric Materials 审中-公开
标题翻译：聚合材料的光刻图案
公开(公告)号：US20110151197A1
公开(公告)日：2011-06-23
申请号：US12974858
申请日：2010-12-21
申请人： Robert Charters , Dax Kukulj
发明人： Robert Charters , Dax Kukulj
IPC分类号： B32B3/30
CPC分类号： G03F7/091 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , B32B2250/02 , B32B2255/10 , B32B2255/26 , B32B2307/41 , B32B2307/42 , B32B2307/71 , B32B2457/208 , G02B6/1221 , G02B6/138 , G03F7/11 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31507
摘要： The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention.The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
摘要翻译：本发明包括在涂覆在塑料基材上的可光固化聚合物组合物中光刻图案化特征的方法。在本发明的一个实施例中，塑料基板涂覆有诸如金属屏障的反射膜。在另一个实施方案中，将塑料基材与含有吸收光固化辐射的添加剂的聚合物阻挡层进行涂布或共挤出。在另一个实施方案中，塑料基材含有吸收光固化辐射的固有添加剂。这些实施方案的组合也在本发明的范围内。本发明的方法可以有利地应用于包括支撑在塑料基板上的可光固化聚合物的光波导的制造，但是可应用于制造包含支撑在塑料基板上的可光固化聚合物的任何装置或物体。

10. 发明申请

US20070190331A1 Photolithographic patterning of polymeric materials 有权
标题翻译：聚合材料的光刻图案化
公开(公告)号：US20070190331A1
公开(公告)日：2007-08-16
申请号：US11355668
申请日：2006-02-15
申请人： Robert Charters , Dax Kukulj
发明人： Robert Charters , Dax Kukulj
IPC分类号： H05B6/68 , B32B27/36
CPC分类号： G03F7/091 , B32B15/085 , B32B15/09 , B32B15/20 , B32B27/00 , B32B27/18 , B32B27/36 , B32B2250/02 , B32B2255/10 , B32B2255/26 , B32B2307/41 , B32B2307/42 , B32B2307/71 , B32B2457/208 , G02B6/1221 , G02B6/138 , G03F7/11 , Y10T428/24612 , Y10T428/24802 , Y10T428/24917 , Y10T428/31507
摘要： The invention comprises methods for the photolithographic patterning of features in a photo-curable polymer composition coated onto a plastic substrate. In one embodiment of this invention, the plastic substrate is coated with a reflective film such as a metallic barrier. In another embodiment, the plastic substrate is coated or co-extruded with a polymer barrier layer containing an additive that absorbs the photo-curing radiation. In yet another embodiment the plastic substrate contains an intrinsic additive that absorbs the photo-curing radiation. Combinations of these embodiments are also within the scope of this invention. The methods of the present invention may be advantageously applied to the fabrication of optical waveguides comprising a photo-curable polymer supported on a plastic substrate, but are applicable to the fabrication of any device or object comprising a photo-curable polymer supported on a plastic substrate.
摘要翻译：本发明包括在涂覆在塑料基材上的可光固化聚合物组合物中光刻图案化特征的方法。在本发明的一个实施例中，塑料基板涂覆有诸如金属屏障的反射膜。在另一个实施方案中，将塑料基材与含有吸收光固化辐射的添加剂的聚合物阻挡层进行涂布或共挤出。在另一个实施方案中，塑料基材含有吸收光固化辐射的固有添加剂。这些实施方案的组合也在本发明的范围内。本发明的方法可以有利地应用于包括支撑在塑料基板上的可光固化聚合物的光波导的制造，但是可应用于制造包含支撑在塑料基板上的可光固化聚合物的任何装置或物体。

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