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1. 发明申请

US20070030462A1 Low spring constant, pneumatic suspension with vacuum chamber, air bearing, active force compensation, and sectioned vacuum chambers 审中-公开
标题翻译：低弹簧常数，带真空室的气动悬架，空气轴承，主动力补偿和分段真空室
公开(公告)号：US20070030462A1
公开(公告)日：2007-02-08
申请号：US11197576
申请日：2005-08-03
申请人： Bausan Yuan , Martin Lee , Alton Phillips , Ping-Wei Chang , Akimitsu Ebihara
发明人： Bausan Yuan , Martin Lee , Alton Phillips , Ping-Wei Chang , Akimitsu Ebihara
IPC分类号： F16M1/00 , G03B27/00
CPC分类号： G02B7/005
摘要： Embodiments of the present invention are directed to an apparatus for providing a low spring constant, pneumatic suspension using vacuum for the lens in a projection system. In one embodiment, a pneumatic suspension system for a load comprises a frame; and a body movably disposed in the frame and spaced from a side wall of the frame by a gap to define a chamber in the frame above the body, the body being configured to be connected to the load. The frame includes an outlet to draw a gas from the chamber to lower the pressure in the chamber with respect to an ambient pressure outside the frame. An air bearing is formed in the gap between the body and the side wall of the frame to provide non-contact between the body and the frame. The pressure in the chamber is sufficiently lower than the ambient pressure to produce a lift force to lift the body and the load connected thereto with respect to the frame.
摘要翻译：本发明的实施例涉及一种用于在投影系统中为透镜提供使用真空的低弹簧常数气动悬架的装置。在一个实施例中，用于负载的气动悬挂系统包括框架; 以及主体，其可移动地设置在所述框架中并且通过间隙与所述框架的侧壁间隔开以在所述主体中的所述框架中限定室，所述主体被配置为连接到所述负载。该框架包括从腔室抽出气体的出口，以相对于框架外部的环境压力降低腔室中的压力。空气轴承形成在主体和框架的侧壁之间的间隙中，以在主体和框架之间提供非接触。室内的压力足够低于环境压力，以产生升高力以提升主体和相对于框架连接到其上的负载。

2. 发明申请

US20080068568A1 Projection Optical Device And Exposure Apparatus 审中-公开
标题翻译：投影光学装置和曝光装置
公开(公告)号：US20080068568A1
公开(公告)日：2008-03-20
申请号：US11662330
申请日：2005-07-18
申请人： Akimitsu Ebihara , Martin Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin Lee , Bausan Yuan
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support device having a flexible structure to support the projection optical system, and a positioning device having an actuator to position the projection optical system. The projection optical device can include a frame to which one end of the flexible structure is attached. The projection optical system may hang from the frame via the support device, or it may be supported from below by the support device. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译：投影光学装置包括投影图案的投影光学系统，具有柔性结构的支撑装置以支撑投影光学系统，以及具有用于定位投影光学系统的致动器的定位装置。投影光学装置可以包括附接有柔性结构的一端的框架。投影光学系统可以经由支撑装置从框架悬挂，或者可以由支撑装置从下方支撑投影光学系统。投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

3. 发明授权

US08767172B2 Projection optical device and exposure apparatus 有权
标题翻译：投影光学装置和曝光装置
公开(公告)号：US08767172B2
公开(公告)日：2014-07-01
申请号：US12926159
申请日：2010-10-28
申请人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
IPC分类号： G03B27/42
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译：投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

4. 发明申请

US20120127445A1 ISOLATION SYSTEM FOR AN OPTICAL ELEMENT OF AN EXPOSURE APPARATUS 审中-公开
标题翻译：曝光装置的光学元件隔离系统
公开(公告)号：US20120127445A1
公开(公告)日：2012-05-24
申请号：US12949130
申请日：2010-11-18
申请人： Akimitsu Ebihara , Yi-Ping Hsin , Kunitomo Fukai , Hideyuki Hashimoto , Bausan Yuan
发明人： Akimitsu Ebihara , Yi-Ping Hsin , Kunitomo Fukai , Hideyuki Hashimoto , Bausan Yuan
IPC分类号： G03F7/20 , G03B27/54 , G02B7/00
CPC分类号： G03F7/709 , G02B27/646 , G03F7/70258
摘要： An optical isolation assembly (30) for reducing the transmission of vibration from an optical barrel (25) to an optical element assembly (28) includes an optical mover assembly (256), a first measurement system (258), a second measurement system (260), and a control system (24). The optical mover assembly (256) moves, positions and supports the optical element assembly (28) relative to the optical barrel (25). The first measurement system (258) generates one or more first measurement signals that relate to the relative position between the optical element assembly (28) and the optical barrel (25). The second measurement system (260) generates one or more second measurement signals that relate to the absolute movement of the optical element assembly (28) along the first axis. The control system (24) controls the optical mover assembly (256) utilizing the first measurement signals and the second measurement signals.
摘要翻译：用于减少从光学镜筒（25）到光学元件组件（28）的振动传播的光学隔离组件（30）包括光学移动器组件（256），第一测量系统（258），第二测量系统 260）和控制系统（24）。光学移动器组件（256）相对于光学镜筒（25）移动，定位和支撑光学元件组件（28）。第一测量系统（258）产生与光学元件组件（28）和光学镜筒（25）之间的相对位置相关的一个或多个第一测量信号。第二测量系统（260）产生与光学元件组件（28）沿着第一轴线的绝对运动有关的一个或多个第二测量信号。控制系统（24）利用第一测量信号和第二测量信号来控制光学移动器组件（256）。

5. 发明申请

US20110043781A1 Projection optical device and exposure apparatus 有权
标题翻译：投影光学装置和曝光装置
公开(公告)号：US20110043781A1
公开(公告)日：2011-02-24
申请号：US12926159
申请日：2010-10-28
申请人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
发明人： Akimitsu Ebihara , Martin E. Lee , Bausan Yuan
IPC分类号： G03B27/54 , G03B27/58
CPC分类号： G03F7/709 , G03F7/70808 , G03F7/70833 , G03F7/70891
摘要： A projection optical device includes a projection optical system which projects an image of a pattern, a support member attached to the projection optical system, and a plurality of coupling members connected to the support member. The coupling members suspend and support the projection optical system through the support member from an upper direction of the support member. The projection optical device can include a frame to which one end of each of the coupling members is attached, such that the projection optical system hangs from the frame via the support member and the coupling members. A projection optical device also can include a liquid supply which supplies a temperature-controlled liquid to a side surface of a projection optical system utilizing gravity to cause the temperature-controlled liquid to flow along the side surface of the projection optical system.
摘要翻译：投影光学装置包括投影图案的投影光学系统，附接到投影光学系统的支撑构件和连接到支撑构件的多个联接构件。联接构件从支撑构件的上方通过支撑构件悬挂并支撑投影光学系统。投影光学装置可以包括框架，每个联接构件的一端被附接到框架，使得投影光学系统经由支撑构件和联接构件从框架悬挂。投影光学装置还可以包括液体供应源，其利用重力将温度控制的液体供应到投影光学系统的侧表面，以使温度控制的液体沿着投影光学系统的侧表面流动。

6. 发明授权

US08705001B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08705001B2
公开(公告)日：2014-04-22
申请号：US12923717
申请日：2010-10-05
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An immersion liquid is supplied to a space between a projection system and a substrate, and a patterned beam of radiation is projected through the liquid onto a target portion of the substrate using the projection system. A liquid retaining member is replaced with a table member that holds the substrate at an opposite position to the projection system while the liquid is maintained in contact with the projection system so as to transit from a first state to a second state, the first state in which the liquid is maintained between the projection system and the liquid retaining member, the second state in which the liquid is maintained between the projection system and the table member.
摘要翻译：将浸没液体供应到投影系统和基板之间的空间，并且使用投影系统将图案化的辐射束通过液体投射到基板的目标部分上。液体保持构件被替换为将基板保持在与投影系统相对的位置的台面构件，同时液体保持与投影系统接触以便从第一状态转移到第二状态，液体保持在投影系统和液体保持构件之间的液体保持在投影系统和台面构件之间的第二状态。

7. 发明授权

US08027027B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08027027B2
公开(公告)日：2011-09-27
申请号：US11785716
申请日：2007-04-19
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes a substrate table that holds a substrate, a projection system that projects a patterned beam of radiation onto the substrate, and a liquid confinement structure that confines a liquid in a space between the projection system and the substrate, the substrate, the substrate table, or both, to form a part of a boundary of the space. In addition, a closing plate forms a part of a boundary of the space in place of the substrate, the substrate table, or both, when moved without substantially disturbing the liquid, the liquid confinement structure, or both.
摘要翻译：光刻投影装置包括：保持基板的基板台，将图案化的辐射束投影到基板上的投影系统，以及将液体限制在投影系统和基板之间的空间中的液体限制结构，衬底台或两者，以形成空间的边界的一部分。此外，当基本上不干扰液体，液体限制结构或两者时，闭合板形成空间的边界的一部分来代替基板，基板台或两者。

8. 发明授权

US07812925B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07812925B2
公开(公告)日：2010-10-12
申请号：US11339683
申请日：2006-01-26
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译：光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。液体密封装置在构件和衬底之间形成液体密封。

9. 发明申请

US20100164326A1 Motor device, apparatus and driving method for rotor 有权
标题翻译：电机装置，转子的驱动方法
公开(公告)号：US20100164326A1
公开(公告)日：2010-07-01
申请号：US12654546
申请日：2009-12-22
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： H02N2/12 , H01L41/04
CPC分类号： H02N2/101 , H02N2/16
摘要： A motor device includes a rotor, a transmission member wound around at least a portion of an outer periphery of the rotor, a moving part connected to the transmission member to move the transmission member, and a control unit which makes the moving part perform the driving operation of moving the transmission member by a predetermined distance in a state where a torque transmission state is brought between the rotor and the transmission member, and the returning operation of returning the transmission member to a predetermined position in a state where the torque transmission state is released.
摘要翻译：电动机装置包括转子，绕转子的外周的至少一部分卷绕的传动部件，连接到传动部件以移动传动部件的移动部件，以及使运动部件进行驱动的控制部在转子和传动部件之间转矩传递状态的状态下使传动部件移动预定距离的动作，以及在转矩传递状态为释放

10. 发明申请

US20090190112A1 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US20090190112A1
公开(公告)日：2009-07-30
申请号：US12382807
申请日：2009-03-24
申请人： Akimitsu Ebihara
发明人： Akimitsu Ebihara
IPC分类号： G03B27/32
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. a substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
摘要翻译：光刻投影设备包括调节辐射束的照明系统，保持图案形成装置的支撑结构，图案形成装置能够赋予辐射束图案。保持衬底的衬底台，以及将图案化的辐射束投影到衬底的目标部分上的投影系统。此外，液体供应系统向投影系统和基板之间的空间提供液体，液体供应系统具有一个构件。液体密封装置在构件和衬底之间形成液体密封。

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