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1. 发明授权

US4344019A Penning discharge ion source with self-cleaning aperture 失效
标题翻译： Penning放电离子源具有自清洁孔径
公开(公告)号：US4344019A
公开(公告)日：1982-08-10
申请号：US205398
申请日：1980-11-10
申请人： Basil F. Gavin , Robert A. MacGill , Raymond K. Thatcher
发明人： Basil F. Gavin , Robert A. MacGill , Raymond K. Thatcher
IPC分类号： H01J27/04
CPC分类号： H01J27/04
摘要： An ion source of the Penning discharge type having a self-cleaning aperture is provided by a second dynode (24) with an exit aperture (12) in a position opposite a first dynode 10a, from which the ions are sputtered, two opposing cathodes (14, 16), each with an anode (18, 20) for accelerating electrons emitted from the cathodes into a cylindrical space defined by the first and second dynode. A support gas maintained in this space is ionized by the electrons. While the cathodes are supplied with a negative pulse to emit electrons, the first dynode is supplied with a negative pulse (e.g., -300 V) to attract atoms of the ionized gas (plasma). At the same time, the second dynode may also be supplied with a small voltage that is negative with respect to the plasma (e.g., -5 V) for tuning the position of the plasma miniscus for optimum extraction geometry. When the negative pulse to the first dynode is terminated, the second dynode is driven strongly negative (e.g., -600 V) thereby allowing heavy sputtering to take place for a short period to remove virtually all of the atoms deposited on the second dynode from material sputtered off the first dynode. An extractor (22) immediately outside the exit aperture of the second dynode is maintained at ground potential during this entire period of sputtering while the anode, dynode and cathode reference voltage is driven strongly positive (about +20 kV to +30 kV) so that ions accelerated through the aperture will be at ground potential. In that manner, material from the first dynode deposited on the second dynode will be sputtered, in time, to add to the ion beam. Atoms sputtered from the second dynode which do not become ionized and exit through the slit will be redeposited on the first dynode, and hence recycled for further ion beam generation during subsequent operating cycles.
摘要翻译：具有自清洁孔径的Penning放电型离子源由具有出口孔（12）的第二倍增电极（24）提供在与第一倍增电极10a相对的位置，离子被溅射出来，两个相对的阴极每个具有用于将从阴极发射的电子加速到由第一和第二倍增电极限定的圆柱形空间中的阳极（18,20）。保持在该空间中的支撑气体被电子电离。当阴极被提供有负脉冲以发射电子时，第一倍增电极被提供有负脉冲（例如，-300V）以吸引电离气体（等离子体）的原子。同时，也可以向第二倍增电极提供相对于等离子体为负的小电压（例如，-5V），用于调整等离子体液面的位置以获得最佳的提取几何形状。当第一倍增极的负脉冲终止时，第二倍增电极被强烈地负（例如，-600V），从而允许在很短的时间内发生重的溅射，从而从材料中去除几乎所有沉积在第二倍增极上的原子溅出第一个dynode。在整个溅射期间，紧邻第二倍增电极的出口孔外面的提取器（22）保持接地电位，而阳极，倍增极和阴极参考电压被强烈地驱动（约+ 20kV至+ 30kV），使得通过孔径加速的离子将处于地电位。以这种方式，沉积在第二倍增电极上的第一倍增电极的材料将被及时地溅射以添加到离子束。从第二倍增极溅射的不会离子化并通过狭缝出射的原子将重新沉积在第一倍增极上，因此在随后的操作循环期间再循环用于进一步的离子束产生。

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