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1. 发明授权

US06294108B1 Composition for the controlled release of chlorine dioxide gas 有权
标题翻译：用于控制二氧化氯气体的组成
公开(公告)号：US06294108B1
公开(公告)日：2001-09-25
申请号：US09407519
申请日：1999-09-28
申请人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
发明人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
IPC分类号： C01B1102
CPC分类号： C02F1/76 , A01N59/00 , A23L3/3445 , A23L3/358 , A61L2/20 , A61L9/01 , B01D53/38 , C01B11/024 , C02F1/50 , Y02A40/945 , A01N2300/00
摘要： Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.
摘要翻译：通过将至少一种金属亚氯酸盐和干燥固体亲水性材料在控制释放的方式产生二氧化氯气体的方法，组合物和系统，其在水蒸气存在下与金属亚氯酸盐反应，但不与金属亚氯酸盐反应基本上不存在液态水或水蒸汽，以产生持续量为约0.001至1,000ppm的二氧化氯气体。

2. 发明授权

US06676850B2 Method, composition and system for the controlled release of chlorine dioxide gas 有权
标题翻译：控制二氧化氯气体的方法，组成和系统
公开(公告)号：US06676850B2
公开(公告)日：2004-01-13
申请号：US09996654
申请日：2001-11-28
申请人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
发明人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
IPC分类号： A62D300
CPC分类号： C02F1/76 , A01N59/00 , A23L3/3445 , A23L3/358 , A61L2/20 , A61L9/01 , B01D53/38 , C01B11/024 , C02F1/50 , Y02A40/945 , A01N2300/00
摘要： Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.
摘要翻译：通过将至少一种金属亚氯酸盐和干燥固体亲水性材料在控制释放的方式产生二氧化氯气体的方法，组合物和系统，其在水蒸气存在下与金属亚氯酸盐反应，但不与金属亚氯酸盐反应基本上不存在液态水或水蒸汽，以产生持续量为约0.001至1,000ppm的二氧化氯气体。

3. 发明授权

US07220367B2 Method and system for the controlled release of chlorine dioxide gas 有权
标题翻译：控制释放二氧化氯气体的方法和系统
公开(公告)号：US07220367B2
公开(公告)日：2007-05-22
申请号：US09879745
申请日：2001-06-12
申请人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
发明人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
IPC分类号： C01B11/02
CPC分类号： C02F1/76 , A01N59/00 , A23L3/3445 , A23L3/358 , A61L2/20 , A61L9/01 , B01D53/38 , C01B11/024 , C02F1/50 , Y02A40/945 , A01N2300/00
摘要： Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.
摘要翻译：通过将至少一种金属亚氯酸盐和干燥固体亲水性材料在控制释放的方式产生二氧化氯气体的方法，组合物和系统，其在水蒸气存在下与金属亚氯酸盐反应，但不与金属亚氯酸盐反应基本上不存在液态水或水蒸汽，以产生持续量为约0.001至1,000ppm的二氧化氯气体。

4. 发明授权

US6077495A Method, composition and system for the controlled release of chlorine dioxide gas 失效
公开(公告)号：US6077495A
公开(公告)日：2000-06-20
申请号：US22798
申请日：1998-02-13
申请人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
发明人： Barry K. Speronello , Appadurai Thangaraj , Xiaolin Yang
IPC分类号： A01N59/00 , A23L3/3445 , A23L3/358 , A61L2/06 , A61L2/20 , A61L9/01 , B01D53/38 , C01B11/02 , C02F1/50 , C02F1/76
CPC分类号： C02F1/76 , A01N59/00 , A23L3/3445 , A23L3/358 , A61L2/20 , A61L9/01 , B01D53/38 , C01B11/024 , C02F1/50
摘要： Method, composition and system for generating chlorine dioxide gas in a controlled release manner by combining at least one metal chlorite and a dry solid hydrophilic material that reacts with the metal chlorite in the presence of water vapor, but does not react with the metal chlorite in the substantial absence of liquid water or water vapor to produce chlorine dioxide gas in a sustained amount of from about 0.001 to 1,000 ppm.

5. 发明授权

US07182883B2 Massive bodies containing free halogen source for producing highly converted solutions of chlorine dioxide 有权
标题翻译：含有游离卤素源的大量物质用于生产高度转化的二氧化氯溶液
公开(公告)号：US07182883B2
公开(公告)日：2007-02-27
申请号：US10744481
申请日：2003-12-23
申请人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
发明人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
IPC分类号： C01B11/10 , C01B11/06 , C01B11/02
CPC分类号： C01B11/024 , A01N59/00 , A01N25/34 , A01N2300/00
摘要： A massive body, e.g., a tablet, for producing a solution of chlorine dioxide when the massive body is added to liquid water. The massive body comprises a metal chlorite such as sodium chlorite, an acid source such as sodium bisulfate and a source of free halogen such as the sodium salt of dichloroisocyanuric acid or a hydrate thereof. The concentration of free halogen in the solution will be: (a) less than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.25:1 by weight; or (b) equal to or greater than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.50:1 by weight.
摘要翻译：当块体被添加到液态水中时，用于产生二氧化氯溶液的大块体例如片剂。大块体包括金属亚氯酸盐如亚氯酸钠，酸源如硫酸氢钠和游离卤素源如二氯异氰尿酸钠盐或其水合物。溶液中游离卤素的浓度将是：（a）小于所述溶液中二氧化氯浓度的重量，二氧化氯浓度与二氧化氯和亚氯酸盐阴离子的浓度之比所述溶液的重量至少为0.25:1; 或（b）等于或大于所述溶液中二氧化氯浓度的重量，并且二氧化氯浓度与所述溶液中二氧化氯和亚氯酸盐阴离子的浓度之和的比例为至少0.50： 1重量。

6. 发明授权

US07160484B2 Method and device for the production of an aqueous solution containing chlorine dioxide 有权
标题翻译：用于生产含有二氧化氯的水溶液的方法和装置
公开(公告)号：US07160484B2
公开(公告)日：2007-01-09
申请号：US09760065
申请日：2001-01-12
申请人： Appadurai Thangaraj , Barry K. Speronello , Timothy D. Wildman
发明人： Appadurai Thangaraj , Barry K. Speronello , Timothy D. Wildman
IPC分类号： C01B11/02
CPC分类号： C01B11/028 , A61L2/18 , A61L2202/11 , C01B11/024
摘要： The present invention is generally directed to a method of producing an aqueous solution of chlorine dioxide from the reaction of a metal chlorite and an acid forming component which do not react to produce chlorine dioxide in the substantial absence of water. The reactants are separated from liquid water by a membrane which allows the controlled passage of liquid water and/or water vapor into contact with the reactants. The chlorine dioxide thus generated passes out through the membrane into the liquid water to produce the desired aqueous solution. Aqueous solutions containing chlorine dioxide produced in this manner can be conveniently used for commercial and domestic cleaning operations such as in the food industry.
摘要翻译：本发明一般涉及一种生产二氧化氯水溶液的方法，该方法是从金属亚氯酸盐和形成酸的组分的反应生成的二氧化氯水溶液在不存在水的情况下不反应生成二氧化氯。反应物通过允许液体水和/或水蒸气受控通过的反应物与膜与液体水分离。由此产生的二氧化氯通过膜流出到液体水中以产生所需的水溶液。以这种方式生产的含有二氧化氯的水溶液可以方便地用于商业和家庭清洁操作，例如在食品工业中。

7. 发明授权

US06238643B1 Method and device for the production of an aqueous solution containing chlorine dioxide 有权
公开(公告)号：US06238643B1
公开(公告)日：2001-05-29
申请号：US09306035
申请日：1999-05-06
申请人： Appadurai Thangaraj , Barry K. Speronello , Timothy D. Wildman
发明人： Appadurai Thangaraj , Barry K. Speronello , Timothy D. Wildman
IPC分类号： C01B1102
CPC分类号： C01B11/028 , A61L2/18 , A61L2202/11 , C01B11/024
摘要： The present invention is generally directed to a method of producing an aqueous solution of chlorine dioxide from the reaction of a metal chlorite and an acid forming component which do not react to produce chlorine dioxide in the substantial absence of water. The reactants are separated from liquid water by a membrane which allows the controlled passage of liquid water and/or water vapor into contact with the reactants. The chlorine dioxide thus generated passes out through the membrane into the liquid water to produce the desired aqueous solution. Aqueous solutions containing chlorine dioxide produced in this manner can be conveniently used for commercial and domestic cleaning operations such as in the food industry.

8. 发明授权

US08262929B2 Massive bodies containing free halogen source for producing highly converted solutions of chlorine dioxide 有权
标题翻译：含有游离卤素源的大量物质用于生产高度转化的二氧化氯溶液
公开(公告)号：US08262929B2
公开(公告)日：2012-09-11
申请号：US13041393
申请日：2011-03-05
申请人： Barry K Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
发明人： Barry K Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
IPC分类号： C01B11/10 , C01B11/06 , C01B11/02
CPC分类号： C01B11/024 , A01N59/00 , A01N25/34 , A01N2300/00
摘要： A massive body, e.g., a tablet, for producing a thickened solution of chlorine dioxide when the massive body is added to liquid water is disclosed. The massive body comprises a metal chlorite, an acid source and a thickener (incorporated directly into the massive body or added as a component separate from the massive body) and optionally a source of free halogen. The concentration of free chlorine in the solution will be: (a) less than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.25:1 by weight; or (b) equal to or greater than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.50:1 by weight.
摘要翻译：公开了一种大块体，例如片剂，当将大体积添加到液体水中时，用于生产二氧化氯增稠溶液。大块体包括金属亚氯酸盐，酸源和增稠剂（直接掺入到块状体中或作为与块体分离的组分加入）和任选的游离卤素源。溶液中游离氯的浓度为：（a）小于所述溶液中二氧化氯浓度的重量，二氧化氯浓度与二氧化氯和亚氯酸根阴离子的浓度之比所述溶液的重量至少为0.25:1; 或（b）等于或大于所述溶液中二氧化氯浓度的重量，并且二氧化氯浓度与所述溶液中二氧化氯和亚氯酸盐阴离子的浓度之和的比例为至少0.50： 1重量。

9. 发明申请

US20110159115A1 Massive Bodies Containing Free Halogen Source For Producing Highly Converted Solutions of Chlorine Dioxide 有权
标题翻译：含有自由卤素源的大规模生物体用于生产二氧化氯高度转化的溶液
公开(公告)号：US20110159115A1
公开(公告)日：2011-06-30
申请号：US13041393
申请日：2011-03-05
申请人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
发明人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
IPC分类号： A01N59/00 , A01P1/00
CPC分类号： C01B11/024 , A01N59/00 , A01N25/34 , A01N2300/00
摘要： A massive body, e.g., a tablet, for producing a thickened solution of chlorine dioxide when the massive body is added to liquid water is disclosed. The massive body comprises a metal chlorite, an acid source and a thickener (incorporated directly into the massive body or added as a component separate from the massive body) and optionally a source of free halogen. The concentration of free chlorine in the solution will be: (a) less than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.25:1 by weight; or (b) equal to or greater than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.50:1 by weight.
摘要翻译：公开了一种大块体，例如片剂，当将大体积添加到液体水中时，用于生产二氧化氯增稠溶液。大块体包括金属亚氯酸盐，酸源和增稠剂（直接掺入到块状体中或作为与块体分离的组分加入）和任选的游离卤素源。溶液中游离氯的浓度为：（a）小于所述溶液中二氧化氯浓度的重量，二氧化氯浓度与二氧化氯和亚氯酸根阴离子的浓度之比所述溶液的重量至少为0.25:1; 或（b）等于或大于所述溶液中二氧化氯浓度的重量，并且二氧化氯浓度与所述溶液中二氧化氯和亚氯酸盐阴离子的浓度之和的比例为至少0.50： 1重量。

10. 发明授权

US06699404B2 Massive bodies containing free halogen source for producing highly converted solutions of chlorine dioxide 有权
标题翻译：含有游离卤素源的大量物质用于生产高度转化的二氧化氯溶液
公开(公告)号：US06699404B2
公开(公告)日：2004-03-02
申请号：US10173224
申请日：2002-06-17
申请人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
发明人： Barry K. Speronello , Gerald S. Koermer , Appadurai Thangaraj , Ahmad Moini
IPC分类号： C01B1110
CPC分类号： C01B11/024 , A01N59/00 , A01N25/34 , A01N2300/00
摘要： A massive body, e.g., a tablet, for producing a solution of chlorine dioxide when the massive body is added to liquid water. The massive body comprises a metal chlorite such as sodium chlorite, an acid source such as sodium bisulfate and a source of free halogen such as the sodium salt of dichloroisocyanuric acid or a hydrate thereof. The concentration of free halogen in the solution will be: (a) less than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.25:1 by weight; or (b) equal to or greater than the concentration of chlorine dioxide in said solution on a weight basis and the ratio of the concentration of chlorine dioxide to the sum of the concentrations of chlorine dioxide and chlorite anion in said solution is at least 0.50:1 by weight.
摘要翻译：当块体被添加到液态水中时，用于产生二氧化氯溶液的大块体例如片剂。大块体包括金属亚氯酸盐如亚氯酸钠，酸源如硫酸氢钠和游离卤素源如二氯异氰尿酸钠盐或其水合物。溶液中游离卤素的浓度为：（a）小于所述溶液中二氧化氯浓度的重量，二氧化氯浓度与二氧化氯和亚氯酸盐阴离子的浓度之比所述溶液的重量至少为0.25:1; 或（b）等于或大于所述溶液中二氧化氯浓度的重量，并且二氧化氯浓度与所述溶液中二氧化氯和亚氯酸盐阴离子的浓度之和的比例为至少0.50： 1重量份。

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