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    • 2. 发明申请
    • POLYMER DISPERSED LIQUID CRYSTAL FILM AND METHOD FOR MANUFACTURING THE SAME
    • 聚合物分散液晶薄膜及其制造方法
    • US20120169987A1
    • 2012-07-05
    • US13338461
    • 2011-12-28
    • Wenbo LIZhuo ZHANGWang HUChunyan XIEGang WANG
    • Wenbo LIZhuo ZHANGWang HUChunyan XIEGang WANG
    • C09K19/38B32B38/08
    • G02F1/1334C09J9/02C09K19/544C09K2019/546G02F2001/13415
    • The disclosed technology involves a polymer dispersed liquid crystal film comprising: a first base substrate, a second base substrate, and a polymer dispersed liquid crystal film between the first base substrate and the second base substrate, wherein a first transparent conductive layer is formed on the first base substrate, the first transparent conductive layer is contacted with the first light permeable pressure-sensitive adhesive layer, and the polymer dispersed liquid crystal is adhered to the first base substrate through the first light permeable pressure-sensitive adhesive layer; and a second transparent conductive layer is formed on the second base substrate, the second transparent conductive layer is contacted with the second light permeable pressure-sensitive adhesive layer, and the polymer dispersed liquid crystal is adhered to the second base substrate through the second light permeable pressure-sensitive adhesive layer.
    • 所公开的技术涉及聚合物分散液晶膜,其包括:在第一基底基板和第二基底基板之间的第一基底基底,第二基底基底和聚合物分散液晶膜,其中第一透明导电层形成在 第一基底基板,第一透明导电层与第一透光性粘合剂层接触,并且聚合物分散液晶通过第一透光性压敏粘合剂层粘附到第一基底基板; 在第二基底基板上形成第二透明导电层,第二透明导电层与第二透光性粘合剂层接触,通过第二透光性粘合剂层使聚合物分散液晶粘附于第二基材 压敏粘合剂层。
    • 4. 发明申请
    • ARRAY SUBSTRATE AND A METHOD FOR FABRICATING THE SAME AND AN ELECTRONIC PAPER DISPLAY
    • 阵列基板及其制造方法和电子纸显示器
    • US20120138972A1
    • 2012-06-07
    • US13308752
    • 2011-12-01
    • Wenbo LIGang WANGZhuo ZHANG
    • Wenbo LIGang WANGZhuo ZHANG
    • H01L33/62
    • H01L29/78633G02F1/136227H01L29/78666H01L29/7869
    • The present disclosure discloses a method for fabricating an array substrate comprising: depositing a source/drain metallic film on a first base substrate, and forming a source electrode, a drain electrode and a data line; sequentially depositing a semiconductor layer film, a gate insulating layer film and a gate metallic film on the first base substrate, and forming a semiconductor layer, a gate insulating layer, a gate electrode and a gate line; depositing a gate protection layer film on the first base substrate, and forming a gate protection layer and a through hole, wherein the through hole is formed on the gate protection layer corresponding to the drain electrode to expose a portion of the drain electrode; and depositing a pixel electrode film on the first base substrate, and forming a pixel electrode, wherein the pixel electrode is connected to the drain electrode via the through hole.
    • 本公开公开了一种制造阵列基板的方法,包括:在第一基底基板上沉积源极/漏极金属膜,以及形成源电极,漏电极和数据线; 在第一基底基板上依次沉积半导体层膜,栅极绝缘层膜和栅极金属膜,以及形成半导体层,栅极绝缘层,栅电极和栅极线; 在所述第一基板上沉积栅极保护层膜,形成栅极保护层和通孔,其中所述通孔形成在与所述漏电极相对应的所述栅极保护层上以暴露所述漏极电极的一部分; 以及在所述第一基板上沉积像素电极膜,并且形成像素电极,其中所述像素电极经由所述通孔连接到所述漏电极。
    • 5. 发明申请
    • ARRAY SUBSTRATE AND MANUFACTURUING METHOD THEREOF, ACTIVE DISPLAY
    • 阵列基板及其制造方法,主动显示
    • US20120112195A1
    • 2012-05-10
    • US13292320
    • 2011-11-09
    • Wenbo LIGang WANGZhuo ZHANGYanbing WU
    • Wenbo LIGang WANGZhuo ZHANGYanbing WU
    • H01L33/08H01L33/36
    • H01L27/1288G02F1/136213G02F1/136227
    • A manufacturing method for an array substrate comprising: sequentially forming a gate metal film, a gate insulating layer and an active layer film; applying photoresist, and patterning the photoresist; etching the stacked layers corresponding to a photoresist-completely-removed region; ashing to remove the photoresist in a photoresist-partially-remained region and remain a part of photoresist in a photoresist-completely-remained region, etching the gate insulating layer and the active layer film in the photoresist-partially-remained region; forming an insulating layer film; lifting off the photoresist and the insulating layer film thereon; forming a conductive film, and patterning the conductive film to from a source electrode, a drain electrode, a data line, a pixel electrode and an active layer channel.
    • 一种阵列基板的制造方法,包括:依次形成栅极金属膜,栅极绝缘层和有源层膜; 施加光致抗蚀剂,并图案化光致抗蚀剂; 蚀刻对应于光致抗蚀剂完全去除区域的堆叠层; 灰化以除去光致抗蚀剂部分保留区域中的光致抗蚀剂,并保留在光致抗蚀剂完全残留区域中的光致抗蚀剂的一部分,蚀刻光致抗蚀剂部分保留区域中的栅极绝缘层和有源层膜; 形成绝缘层膜; 在其上剥离光致抗蚀剂和绝缘层膜; 形成导电膜,并且从源电极,漏电极,数据线,像素电极和有源层通道构图导电膜。