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    • 10. 发明申请
    • PEELING LIQUID FOR A RESIST
    • 沾染液体
    • US20140179583A1
    • 2014-06-26
    • US14093737
    • 2013-12-02
    • Boe Technology Group Co., Ltd.
    • Shi SHULu LIUCan WangYonglian QIGuanbao HUI
    • G03F7/42
    • G03F7/425C11D11/0047
    • The invention discloses a peeling liquid for a resist, which relates to an optical element and is used for removing the color resist and the protective layer on a color filter rapidly and efficiently. The peeling liquid for a color resist on a color filter comprises an alkali metal alkoxide with a mass percentage of 10-45%, an organic amine with a mass percentage of 10-30%, a surfactant with a mass percentage of 5-30%, a solvent with a mass percentage of 20-60%, and an alcohol with a mass percentage of 1-55% in terms of the peeling liquid for a resist with a mass percentage of 100%. The peeling liquid for a resist in invention is used for removing the color resist and the protective layer of the substandard product in a color filter.
    • 本发明公开了一种抗蚀剂用剥离液,涉及一种光学元件,用于快速高效地除去滤色剂和保护层。 用于滤色器上的着色剂的剥离液包含质量百分比为10-45%的碱金属醇盐,质量百分比为10-30%的有机胺,质量百分比为5-30%的表面活性剂, ,质量百分比为20-60%的溶剂,质量百分比为100%的抗蚀剂剥离液的质量百分比为1-55%的醇。 用于本发明抗蚀剂的剥离液用于除去滤色器中的着色抗蚀剂和不合格产品的保护层。