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1. 发明授权

US07846316B2 Method for supplying a plating composition with deposition metal ion during a plating operation 有权
标题翻译：在电镀操作期间向电镀组合物供给沉积金属离子的方法
公开(公告)号：US07846316B2
公开(公告)日：2010-12-07
申请号：US11420339
申请日：2006-05-25
申请人： Axel Koenig , Andreas Möbius , Franz-Josef Stark
发明人： Axel Koenig , Andreas Möbius , Franz-Josef Stark
IPC分类号： C25D21/06 , C25D21/18
CPC分类号： C23C18/1617 , B01D61/243 , C25D21/22
摘要： Method and plating bath apparatus for setting the ionic strength of a plating composition using Donnan dialysis by flowing the plating composition along a first surface of a membrane while simultaneously flowing a deposition metal ion exchange composition along a second surface of the membrane such that the deposition metal ion crosses the membrane from the deposition metal ion exchange composition to the plating composition while an exchange cation different from the deposition metal ion crosses the membrane from the plating composition to the deposition metal ion exchange composition.
摘要翻译：方法和电镀浴装置，用于通过使电镀组合物沿着膜的第一表面流动，同时使沉积金属离子交换组合物沿膜的第二表面流动，从而使得使用Donnan透析设置电镀组合物的离子强度，使得沉积金属离子从沉积金属离子交换组合物穿过膜到镀覆组合物，而不同于沉积金属离子的交换阳离子从镀覆组合物穿过膜到沉积金属离子交换组合物。

2. 发明申请

US20060266654A1 METHOD FOR SUPPLYING A PLATING COMPOSITION WITH DEPOSITION METAL ION DURING A PLATING OPERATION 有权
标题翻译：在镀层操作期间提供具有沉积金属离子的镀层组合物的方法
公开(公告)号：US20060266654A1
公开(公告)日：2006-11-30
申请号：US11420339
申请日：2006-05-25
申请人： Axel Koenig , Andreas Mobius , Franz-Josef Stark
发明人： Axel Koenig , Andreas Mobius , Franz-Josef Stark
IPC分类号： C25D21/06 , C25B15/00
CPC分类号： C23C18/1617 , B01D61/243 , C25D21/22
摘要： Method and plating bath apparatus for setting the ionic strength of a plating composition using Donnan dialysis by flowing the plating composition along a first surface of a membrane while simultaneously flowing a deposition metal ion exchange composition along a second surface of the membrane such that the deposition metal ion crosses the membrane from the deposition metal ion exchange composition to the plating composition while an exchange cation different from the deposition metal ion crosses the membrane from the plating composition to the deposition metal ion exchange composition.
摘要翻译：方法和电镀浴装置，用于通过使电镀组合物沿着膜的第一表面流动，同时使沉积金属离子交换组合物沿膜的第二表面流动，从而使得使用Donnan透析设置电镀组合物的离子强度，使得沉积金属离子从沉积金属离子交换组合物穿过膜到镀覆组合物，而不同于沉积金属离子的交换阳离子从镀覆组合物穿过膜到沉积金属离子交换组合物。

3. 发明授权

US08962070B2 Method for the deposition of a metal layer comprising a beta-amino acid 有权
标题翻译：沉积包含β-氨基酸的金属层的方法
公开(公告)号：US08962070B2
公开(公告)日：2015-02-24
申请号：US13382131
申请日：2010-07-06
申请人： Franz-Josef Stark , Christoph Werner
发明人： Franz-Josef Stark , Christoph Werner
IPC分类号： B05D5/12 , C23C18/16 , C07C229/08 , C07C229/12 , C07C229/16 , C07C229/22 , C07C237/06 , C07C309/14 , C23C18/31 , C23C18/32 , C23C18/34 , C23C18/36 , C23C18/38 , C23C18/40 , C23C18/42 , C23C18/44 , C23C18/48 , C23C18/50
CPC分类号： C23C18/44 , C07C229/08 , C07C229/12 , C07C229/16 , C07C229/22 , C07C237/06 , C07C309/14 , C23C18/1601 , C23C18/31 , C23C18/32 , C23C18/34 , C23C18/36 , C23C18/38 , C23C18/40 , C23C18/42 , C23C18/48 , C23C18/50
摘要： The present invention relates to an electrolyte for the electroless deposition of a metal layer on a substrate, wherein the electrolyte is free of heavy metal stabilizers, cyanides, selenium compounds and sulfur compounds comprising sulfur in an oxidation state between −2 and +5, and in which instead a β-amino acid is used as stabilizer. In particular, the inventive electrolyte can comprise 3-aminopropionic acid, 3-aminobutyric acid, 3-amino-4-methylvaleric acid, and 2-aminoethane-sulfonic acid. Furthermore, the invention is directed to a method for the electroless deposition of metal layers utilizing an inventive electrolyte as well as the use of β-amino acids as stabilizer in electrolytes for the electroless deposition of metal layers in general.
摘要翻译：本发明涉及用于在基底上无电沉积金属层的电解质，其中电解质不含重金属稳定剂，氰化物，硒化合物和包含-2和+5之间氧化态的硫的硫化合物，和其中相反，使用“ - 氨基酸”作为稳定剂。特别地，本发明的电解质可以包含3-氨基丙酸，3-氨基丁酸，3-氨基-4-甲基戊酸和2-氨基乙磺酸。此外，本发明涉及一种利用本发明电解质的金属层的无电沉积方法，以及在电解质中用作金属层的无电沉积的电解质中的“氨基酸”作为稳定剂的方法。

4. 发明授权

US07846503B2 Process and electrolytes for deposition of metal layers 有权
标题翻译：用于沉积金属层的工艺和电解质
公开(公告)号：US07846503B2
公开(公告)日：2010-12-07
申请号：US10678601
申请日：2003-10-03
申请人： Franz-Josef Stark , Helmut Horsthemke , Ulrich Treuner
发明人： Franz-Josef Stark , Helmut Horsthemke , Ulrich Treuner
IPC分类号： C23C18/36 , C23C18/50 , B05D1/18
CPC分类号： C23C18/36 , C23C18/1617 , C23C18/1662
摘要： The invention concerns an electrolyte for electroless deposition of metal layers with internal compressive stresses containing a metal base salt, a reducing agent, a complexing agent, an accelerator and a stabilizer. In order to make available an electrolyte of the said kind, from which uniform pore-free and crack-free metal-phosphorus coatings can be deposited with constant layers properties and high phosphorus contents at an elevated deposition rate over a long period of time, it is proposed by means of the invention that the electrolyte contain as metal base salt a metal salt whose anions contain at least one carbon atom and that is present in a starting concentration from 0.01 to 0.3 mol/L. At least one salt consisting of metal acetate, metal formate, metal oxalate, metal propionate, metal citrate and metal ascorbate, especially preferably metal acetate, is used as the metal salt whose anion contains at least one carbon atom. In addition, a method that is especially suitable for the use of the said electrolyte is proposed, where this method advantageously has a closed material circulation. Through the use of the invention especially pore-free and crack-free metal coatings with constant layer properties are uniformly deposited over a long time of use of the bath of at least 14-22 MTO.
摘要翻译：本发明涉及一种用于无电沉积具有含有金属碱盐，还原剂，络合剂，促进剂和稳定剂的内部压应力的金属层的电解质。为了提供所述种类的电解质，可以在较长的时间内以升高的沉积速率沉积具有恒定层性质和高磷含量的均匀无孔隙和无裂纹的金属 - 磷涂层，通过本发明提出，电解质含有阴离子含有至少一个碳原子并且以0.01至0.3mol / L的起始浓度存在的金属盐作为金属碱盐。使用由金属乙酸盐，金属甲酸盐，金属草酸盐，金属丙酸盐，金属柠檬酸盐和金属抗坏血酸盐，特别优选金属乙酸盐组成的至少一种盐作为阴离子含有至少一个碳原子的金属盐。此外，提出了特别适用于所述电解质的方法，其中该方法有利地具有封闭的材料循环。通过使用本发明，特别是具有恒定层性质的无孔和无裂纹金属涂层在使用至少14-22MTO的浴的长时间内均匀沉积。

5. 发明申请

US20120156387A1 BETA-AMINO ACID COMPRISING ELECTROLYTE AND METHOD FOR THE DEPOSITION OF A METAL LAYER 有权
标题翻译：包含电解质的β-氨基酸和金属层沉积的方法
公开(公告)号：US20120156387A1
公开(公告)日：2012-06-21
申请号：US13382131
申请日：2010-07-06
申请人： Franz-Josef Stark , Christoph Werner
发明人： Franz-Josef Stark , Christoph Werner
IPC分类号： B05D1/18 , C09D7/12
CPC分类号： C23C18/44 , C07C229/08 , C07C229/12 , C07C229/16 , C07C229/22 , C07C237/06 , C07C309/14 , C23C18/1601 , C23C18/31 , C23C18/32 , C23C18/34 , C23C18/36 , C23C18/38 , C23C18/40 , C23C18/42 , C23C18/48 , C23C18/50
摘要： The present invention relates to an electrolyte for the electroless deposition of a metal layer on a substrate, wherein the electrolyte is free of heavy metal stabilizers, cyanides, selenium compounds and sulfur compounds comprising sulfur in an oxidation state between −2 and +5, and in which instead a β-amino acid is used as stabilizer. In particular, the inventive electrolyte can comprise 3-aminopropionic acid, 3-aminobutyric acid, 3-amino-4-methylvaleric acid, and 2-aminoethane-sulfonic acid. Furthermore, the invention is directed to a method for the electroless deposition of metal layers utilizing an inventive electrolyte as well as the use of β-amino acids as stabilizer in electrolytes for the electroless deposition of metal layers in general.
摘要翻译：本发明涉及用于在基底上无电沉积金属层的电解质，其中电解质不含重金属稳定剂，氰化物，硒化合物和包含-2和+5之间氧化态的硫的硫化合物，和其中相反，使用“ - 氨基酸”作为稳定剂。特别地，本发明的电解质可以包含3-氨基丙酸，3-氨基丁酸，3-氨基-4-甲基戊酸和2-氨基乙磺酸。此外，本发明涉及一种利用本发明电解质的金属层的无电沉积方法，以及在电解质中用作金属层的无电沉积的电解质中的“氨基酸”作为稳定剂的方法。

6. 发明申请

US20090324804A1 METHOD AND DEVICE FOR COATING SUBSTRATE SURFACES 审中-公开
标题翻译：用于涂覆基材表面的方法和装置
公开(公告)号：US20090324804A1
公开(公告)日：2009-12-31
申请号：US12278256
申请日：2007-01-26
申请人： Helmut Horsthemke , Franz-Josef Stark
发明人： Helmut Horsthemke , Franz-Josef Stark
IPC分类号： B05D1/18 , B05C11/00
CPC分类号： C23C18/1683 , C23C18/1617 , C23C18/36 , C25D21/12 , C25D21/14
摘要： The invention relates to a method for coating substrate surfaces with a metal or oxide layer in a coating bath. Said bath has at least one component the concentration of which changes during the coating process and which therefore has to be replenished or removed in order to maintain the quality of the bath. The method according to the invention is characterized in that the component is replenished and/or removed depending on the strength of the composition of the bath.
摘要翻译：本发明涉及一种在涂层浴中用金属或氧化物层涂覆基底表面的方法。所述浴具有至少一种组分，其浓度在涂布过程中变化，因此必须补充或除去，以保持浴的质量。根据本发明的方法的特征在于根据浴组合物的强度来补充和/或去除组分。

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