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1. 发明申请

US20050068510A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050068510A1
公开(公告)日：2005-03-31
申请号：US10946333
申请日：2004-09-22
申请人： Arno Bleeker , Dominicus Adrianus Franken , Peter Kochersperger , Kars Troost
发明人： Arno Bleeker , Dominicus Adrianus Franken , Peter Kochersperger , Kars Troost
IPC分类号： G02B26/08 , G02B5/10 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/707 , G03F7/70283 , G03F7/70291 , G03F7/703 , G03F7/70783
摘要： One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
摘要翻译：一个或多个图形阵列通过高度调节结构安装到安装板，使得能够控制图案化阵列的有效表面的平坦度。高度调节结构可以包括压电致动器或螺钉的阵列。或者，可以将图案形成装置的背面抛光到光学平面度，并通过晶体结合键合到刚性安装体的光学平坦表面。

2. 发明申请

US20060245033A1 Light patterning device using tilting mirrors in a superpixel form 有权
标题翻译：以超像素形式使用倾斜镜的光图案形成装置
公开(公告)号：US20060245033A1
公开(公告)日：2006-11-02
申请号：US11116338
申请日：2005-04-28
申请人： Nabila Baba-Ali , Arno Bleeker , Kars Troost
发明人： Nabila Baba-Ali , Arno Bleeker , Kars Troost
IPC分类号： G02B26/00
CPC分类号： G03F7/70291 , G02B26/0833 , G03F7/70283 , G03F7/70308 , G09G3/346 , H04N5/7458
摘要： A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (λ). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other; and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern.
摘要翻译：光图案化系统包括提供具有一定波长（λ）的辐射束的照明系统。反射像素阵列对光束进行图案化，其中阵列包括至少具有逻辑耦合到第二倾斜镜的第一倾斜镜的像素。在一个实施例中，第一和第二倾斜镜是（i）基本上彼此相邻; 和（ii）通过第一反射镜位移使高度彼此抵消。包括将图案化的光束投影到目标上的投影系统。在替代实施例中，反射像素阵列包括具有彼此逻辑耦合的第一至第四倾斜镜的像素。第一至第四倾斜镜（i）分别通过第一到第四镜面位移而偏离参考平面，并且（ii）分别以基本上正方形的图案顺时针地布置。

3. 发明申请

US20060115752A1 System and method for generating pattern data used to control a pattern generator 有权
标题翻译：用于生成用于控制图案生成器的图案数据的系统和方法
公开(公告)号：US20060115752A1
公开(公告)日：2006-06-01
申请号：US10998991
申请日：2004-11-30
申请人： Azat Latypov , Arno Bleeker , Jang Chen , Kars Troost
发明人： Azat Latypov , Arno Bleeker , Jang Chen , Kars Troost
IPC分类号： G03C5/00
CPC分类号： G03F7/70441 , G03F7/70291 , G03F7/70508
摘要： A method and system are used to modify pattern data obtained in relation to a pattern on a static patterning device. It is suggested that, in an example when a maskless lithography tool is used, continuous OPC-enhanced features used for maskless lithography rasterization should include a variation in local amplitude and phase transmittance that matches modulation capabilities of a patterning device being used. The modified pattern data is used by a dynamic patterning device to pattern impinging light, which is then projected onto an object. The system and method comprise using a pattern data generating device, a modification device, a dynamic pattern generator, and a projection system. The pattern data generating device generates pattern data corresponding to a pattern on a static patterning device. The modification device receives the pattern data and modifies the pattern data using characteristics of a type of the dynamic pattern generator being used. The dynamic pattern generator receives the modified patterned data and uses the modified pattern data to pattern the beam of radiation. The projection system projects the patterned beam onto the object.
摘要翻译：使用方法和系统来修改相对于静态图案形成装置上的图案获得的图案数据。建议在使用无掩模光刻工具的示例中，用于无掩模光刻光栅化的连续OPC增强特征应包括与正在使用的图案形成装置的调制能力相匹配的局部振幅和相位透射率的变化。修改的图案数据由动态图案形成装置用于对入射光进行图案化，然后将其投影到物体上。该系统和方法包括使用图案数据生成装置，修改装置，动态图案生成器和投影系统。图案数据生成装置生成与静态图案形成装置上的图案对应的图案数据。修改设备接收图案数据，并使用所使用的动态图案生成器的类型的特征来修改图案数据。动态图案生成器接收经修改的图案数据并使用经修改的图案数据来对辐射束进行图案化。投影系统将图案化的光束投射到物体上。

4. 发明申请

US20070153249A1 Lithographic apparatus and device manufacturing method using multiple exposures and multiple exposure types 审中-公开
标题翻译：平版印刷设备和使用多重曝光和多种曝光类型的设备制造方法
公开(公告)号：US20070153249A1
公开(公告)日：2007-07-05
申请号：US11311643
申请日：2005-12-20
申请人： Kars Troost , Johannes Baselmans , Arno Bleeker , James Greeneich
发明人： Kars Troost , Johannes Baselmans , Arno Bleeker , James Greeneich
IPC分类号： G03B27/54
CPC分类号： G03F7/70291 , G03F7/70275 , G03F7/70283 , G03F7/70466 , G03F7/70508
摘要： A lithographic apparatus and method in which a relatively high resolution exposure, for example of a repeating pattern, is trimmed using a relatively low resolution exposure. According, a compromise between provision of a high resolution pattern and flexibility in the pattern to be formed is provided.
摘要翻译：使用相对低分辨率曝光来修整例如重复图案的相对高分辨率曝光的光刻设备和方法。提供了提供高分辨率图案和形成的图案的灵活性之间的妥协。

5. 发明申请

US20060221320A1 Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate 有权
标题翻译：在基板上利用多个管芯设计的平版印刷设备和器件制造方法
公开(公告)号：US20060221320A1
公开(公告)日：2006-10-05
申请号：US11098607
申请日：2005-04-05
申请人： Arno Bleeker , Kars Troost , Adrianus Maas
发明人： Arno Bleeker , Kars Troost , Adrianus Maas
IPC分类号： G03B27/54
CPC分类号： G03F7/70508 , G03F7/70275 , G03F7/70291
摘要： A lithographic system in which multiple variations of a basic device design can be generated without substantially increasing the cost of the data path hardware.
摘要翻译：可以在不显着增加数据路径硬件的成本的情况下生成基本设备设计的多个变化的光刻系统。

6. 发明申请

US20060119815A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060119815A1
公开(公告)日：2006-06-08
申请号：US11005231
申请日：2004-12-07
申请人： Dominicus Jacobus Franken , Arno Bleeker , Wilhelmus Box , Martinus Hendricus Hoeks , Henricus Tegenbosch , Kars Troost , Lambertus Kessels
发明人： Dominicus Jacobus Franken , Arno Bleeker , Wilhelmus Box , Martinus Hendricus Hoeks , Henricus Tegenbosch , Kars Troost , Lambertus Kessels
IPC分类号： G03B27/42
CPC分类号： G03F7/70875 , G03F7/70291
摘要： A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.
摘要翻译：使用系统和方法来补偿单独可控元件阵列的热输出。这可以通过在不使用阵列投影光束来控制阵列的温度时将控制信号输入到阵列来完成。可以提供加热元件以保持阵列的温度。可以提供热储存器以保持阵列的温度或者可以提供冷却元件以在使用期间降低阵列的温度。

7. 发明申请

US20060082752A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20060082752A1
公开(公告)日：2006-04-20
申请号：US10966147
申请日：2004-10-18
申请人： Arno Bleeker , Kars Troost
发明人： Arno Bleeker , Kars Troost
IPC分类号： G03B27/72
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70425
摘要： Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.
摘要翻译：使用独立可控元件的阵列的平版印刷设备，其中通过单独可控元件的阵列图案化的辐射束的强度的一部分被转移到图像传感器，以验证所生成的图像的质量。

8. 发明申请

US20070252967A1 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US20070252967A1
公开(公告)日：2007-11-01
申请号：US11703823
申请日：2007-02-08
申请人： Arno Bleeker , Kars Troost
发明人： Arno Bleeker , Kars Troost
IPC分类号： G03B27/54
CPC分类号： G03F7/70516 , G03F7/70291 , G03F7/70425
摘要： Lithographic apparatus using an array of individually controllable elements in which a fraction of the intensity of the beam of radiation patterned by the array of individually controllable elements is diverted to an image sensor for verifying the quality of the image generated.

9. 发明申请

US20050270515A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20050270515A1
公开(公告)日：2005-12-08
申请号：US10862876
申请日：2004-06-08
申请人： Kars Troost , Arno Bleeker
发明人： Kars Troost , Arno Bleeker
IPC分类号： G02B26/08 , G03F7/20 , H01L21/027 , G03B27/72
CPC分类号： G03F7/70058 , G03F7/70275 , G03F7/70291 , G03F7/70383 , G03F7/70425
摘要： A system and method to manufacturing a device provide a substrate and perform at least one exposure step. Each exposure step projects a patterned beam of radiation, which was patterned using an individually controllable elements, onto a target portion of the substrate. The projected patterned beam includes a plurality of pixels. Each exposure step also: (a) ordinarily controls the elements, such that each pixel delivers a radiation dose no greater than a predetermined normal maximum dose to the target portion in the exposure step; and (b) exceptionally controls the elements, such that at least one selected pixel delivers an increased radiation dose, greater than the normal maximum dose. The increased dose may be delivered to compensate for the effect of a defective element at a known position in the array on a pixel adjacent a selected pixel. Alternatively, it may compensate for underexposure of the target portion at the location of a selected pixel resulting from exposure of that location to a pixel affected by a known defective element in another exposure step. The invention uses doses up to the predetermined normal maximum for normal printing, but reserves at least one increased dose for compensation purposes. Accordingly, even when a dead black pixel falls in the middle of a group of surrounding white pixels it can be compensated for by increasing the radiation dose delivered by one or more of those neighboring white pixels, above the normal fully white value.
摘要翻译：制造器件的系统和方法提供衬底并执行至少一个曝光步骤。每个曝光步骤将图案化的辐射束投射到基板的目标部分上，该辐射束使用独立可控元件进行图案化。投影图案化的波束包括多个像素。每个曝光步骤还：（a）通常控制元件，使得每个像素在曝光步骤中向目标部分传递不大于预定正常最大剂量的辐射剂量; 和（b）异常地控制元件，使得至少一个选择的像素传递增加的辐射剂量，大于正常最大剂量。可以递送增加的剂量以补偿阵列中与所选像素相邻的像素上的已知位置处的有缺陷元件的影响。或者，其可以补偿在另一个曝光步骤中由该位置暴露于受已知缺陷元件影响的像素所导致的所选像素的位置处的目标部分的曝光不足。本发明使用达到正常印刷的预定正常最大值的剂量，但是为了补偿目的而保留至少一个增加的剂量。因此，即使当死黑色像素落在一组周围的白色像素的中间时，也可以通过增加一个或多个这些相邻的白色像素所传送的辐射剂量来补偿高于正常的全白色值。

10. 发明申请

US20070273853A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070273853A1
公开(公告)日：2007-11-29
申请号：US11655999
申请日：2007-01-22
申请人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
发明人： Arno Bleeker , Donis Flagello , Robert Socha , James Greeneich , Kars Troost
IPC分类号： G03B27/32
CPC分类号： G03B27/54 , G03F7/70116 , G03F7/705
摘要： A method of transferring an image of a pattern layout onto a surface of a substrate including selecting a first illumination profile for a first area of the pattern layout and a second illumination profile for a second area of the pattern layout; switching illumination profile during transfer of the image of the pattern layout such that the first area of the pattern layout is illuminated with the first illumination profile and the second area is illuminated with the second illumination profile; and projecting an image of the illuminated first and second areas onto the surface of the substrate.
摘要翻译：将图案布局的图像转印到基板的表面上的方法，包括为图案布局的第一区域选择第一照明轮廓，以及为图案布局的第二区域选择第二照明轮廓; 在图案布局的图像传送期间切换照明轮廓，使得图案布局的第一区域被第一照明轮廓照亮，并且第二区域被第二照明轮廓照亮; 以及将照射的第一和第二区域的图像投影到基板的表面上。

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