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    • 1. 发明申请
    • Device and method for detecting stress migration properties
    • 用于检测应力迁移特性的装置和方法
    • US20050211980A1
    • 2005-09-29
    • US11132665
    • 2005-05-19
    • Armin FischerAlexander von GlasowJochen von Hagen
    • Armin FischerAlexander von GlasowJochen von Hagen
    • H01L21/66H01L23/544H01L23/58
    • H01L22/34H01L2924/0002H01L2924/00
    • A device and method are provided for detecting stress migration properties of a semiconductor module mounted in a housing. A stress migration test (SMT) structure is formed in the semiconductor module. An integrated heating (IH) device is formed within or in direct proximity to the SMT structure. The SMT structure includes a first interconnect region in a first interconnect layer, a second interconnect region in a second interconnect layer, and a connecting region electrically connecting the interconnect regions through a first insulating layer. The IH device includes a heating interconnect region through which a heating current flows. The heating interconnect region is within or outside the first or second interconnect region or connecting region. When the heating current is applied, a measurement voltage is applied to the SMT structure, and a current through the SMT structure is measured to detect stress migration properties of the semiconductor module.
    • 提供了一种用于检测安装在壳体中的半导体模块的应力迁移特性的装置和方法。 在半导体模块中形成应力迁移试验(SMT)结构。 集成加热(IH)装置形成在SMT结构内或者直接靠近SMT结构。 SMT结构包括第一互连层中的第一互连区域,第二互连层中的第二互连区域和通过第一绝缘层电连接互连区域的连接区域。 IH装置包括加热互连区域,加热电流流过该区域。 加热互连区域在第一或第二互连区域或连接区域内或之外。 当施加加热电流时,向SMT结构施加测量电压,并且测量通过SMT结构的电流以检测半导体模块的应力迁移特性。
    • 2. 发明授权
    • Device for detecting stress migration properties
    • 用于检测应力迁移特性的装置
    • US07888672B2
    • 2011-02-15
    • US11132665
    • 2005-05-19
    • Armin FischerAlexander von GlasowJochen von Hagen
    • Armin FischerAlexander von GlasowJochen von Hagen
    • G01R31/26G01R27/08
    • H01L22/34H01L2924/0002H01L2924/00
    • A device and method are provided for detecting stress migration properties of a semiconductor module mounted in a housing. A stress migration test (SMT) structure is formed in the semiconductor module. An integrated heating (IH) device is formed within or in direct proximity to the SMT structure. The SMT structure includes a first interconnect region in a first interconnect layer, a second interconnect region in a second interconnect layer, and a connecting region electrically connecting the interconnect regions through a first insulating layer. The IH device includes a heating interconnect region through which a heating current flows. The heating interconnect region is within or outside the first or second interconnect region or connecting region. When the heating current is applied, a measurement voltage is applied to the SMT structure, and a current through the SMT structure is measured to detect stress migration properties of the semiconductor module.
    • 提供了一种用于检测安装在壳体中的半导体模块的应力迁移特性的装置和方法。 在半导体模块中形成应力迁移试验(SMT)结构。 集成加热(IH)装置形成在SMT结构内或者直接靠近SMT结构。 SMT结构包括第一互连层中的第一互连区域,第二互连层中的第二互连区域和通过第一绝缘层电连接互连区域的连接区域。 IH装置包括加热互连区域,加热电流流过该区域。 加热互连区域在第一或第二互连区域或连接区域内或之外。 当施加加热电流时,向SMT结构施加测量电压,并且测量通过SMT结构的电流以检测半导体模块的应力迁移特性。