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2. 发明授权

US08266553B1 System and method for detecting mask data handling errors 有权
标题翻译：用于检测掩码数据处理错误的系统和方法
公开(公告)号：US08266553B1
公开(公告)日：2012-09-11
申请号：US12141543
申请日：2008-06-18
申请人： Bang-Thu Nguyen , Yan Wang , Hong-tsz Pan , Xin Wu
发明人： Bang-Thu Nguyen , Yan Wang , Hong-tsz Pan , Xin Wu
IPC分类号： G06F17/50
CPC分类号： G03F1/84
摘要： An integrated circuit device layout and a method for detecting mask data handling errors are disclosed in which integrated circuit device layout includes a device region in which operable circuitry is disposed. Integrated circuit device layout also includes a verification region in which verification elements are disposed. The verification elements include cells that are duplicates of at least some of the different types of cells in device region and can include structures that are duplicates of at least some of the types of structures in the device region. The patterns in verification region are used in the final verification process to identify mask data handling errors in a mask job deck. Because the patterns in verification region are easy to locate and identify, the time required to perform the final verification process is reduced and the chance of error in the final verification process is reduced.
摘要翻译：公开了一种用于检测掩模数据处理错误的集成电路器件布局和方法，其中集成电路器件布局包括其中设置可操作电路的器件区域。集成电路装置布局还包括其中设置有验证元件的验证区域。验证元件包括在设备区域中是至少一些不同类型的单元的重复的单元，并且可以包括在设备区域中至少一些类型的结构的重复的结构。验证区域中的模式用于最终验证过程，以识别掩模工作台中的掩码数据处理错误。由于验证区域中的模式易于定位和识别，所以执行最终验证过程所需的时间减少，并且最终验证过程中的错误机会减少。

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