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1. 发明授权

US08842293B2 Level sensor arrangement for lithographic apparatus and device manufacturing method 有权
标题翻译：用于光刻设备和装置制造方法的液位传感器装置
公开(公告)号：US08842293B2
公开(公告)日：2014-09-23
申请号：US12722955
申请日：2010-03-12
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
IPC分类号： G01B11/14 , G03F9/00
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译：液位传感器装置可用于测量光刻设备中的基板表面的高度。液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。

2. 发明申请

US20130077079A1 LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
标题翻译：水平传感器，光刻设备和基板表面定位方法
公开(公告)号：US20130077079A1
公开(公告)日：2013-03-28
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03F9/00 , G01B11/06
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

3. 发明授权

US08675210B2 Level sensor, lithographic apparatus, and substrate surface positioning method 有权
标题翻译：液位传感器，光刻设备和基板表面定位方法
公开(公告)号：US08675210B2
公开(公告)日：2014-03-18
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G01B11/14
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

4. 发明申请

US20100233600A1 LEVEL SENSOR ARRANGEMENT FOR LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：液晶显示装置的水平传感器装置和装置的制造方法
公开(公告)号：US20100233600A1
公开(公告)日：2010-09-16
申请号：US12722955
申请日：2010-03-12
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Lukasz Jerzy Macht
IPC分类号： G03F7/20 , G01B11/14 , G03B27/54
CPC分类号： G03F9/7034 , G03F9/7065 , G03F9/7088
摘要： A level sensor arrangement is useable for measuring a height of a surface of a substrate in a lithographic apparatus. The level sensor arrangement is provided with a light source emitting detection radiation towards the substrate, and a detector unit for measuring radiation reflected from the substrate in operation. The light source is arranged to emit detection radiation in a wavelength range in which a resist to be used for processing the substrate in the lithographic apparatus is sensitive.
摘要翻译：液位传感器装置可用于测量光刻设备中的基板表面的高度。液位传感器装置设置有朝向基板发射检测辐射的光源，以及用于在操作中测量从基板反射的辐射的检测器单元。光源布置成在光刻设备中用于处理基板的抗蚀剂敏感的波长范围内发射检测辐射。

5. 发明申请

US20120013879A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120013879A1
公开(公告)日：2012-01-19
申请号：US13178965
申请日：2011-07-08
申请人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
IPC分类号： G03B27/54 , G01B11/22
CPC分类号： G01B11/0608 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7034 , G03F9/7088
摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.
摘要翻译：本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开第一个方向。

6. 发明授权

US08488107B2 Lithographic apparatus and device manufacturing method involving a level sensor having multiple projection units and detection units 有权
标题翻译：涉及具有多个投影单元和检测单元的液位传感器的平版印刷设备和设备制造方法
公开(公告)号：US08488107B2
公开(公告)日：2013-07-16
申请号：US13178965
申请日：2011-07-08
申请人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
发明人： Arie Jeffrey Den Boef , Frank Staals , Lukasz Jerzy Macht
IPC分类号： G03B27/58
CPC分类号： G01B11/0608 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7034 , G03F9/7088
摘要： The invention provides a level sensor configured to determine a height level of a surface of a substrate supported on a movable substrate support, the level sensor including multiple projection units, multiple detection units, and a processing unit to calculate a height level for each of a plurality of measurement locations on the basis of the measurement beams from the projection units, wherein the level sensor is configured to measure height levels simultaneously at multiple measurement locations on the substrate, wherein the substrate support is configured to move the substrate in a first direction substantially parallel to the surface of the substrate to measure a height level at different locations on the substrate, and wherein at least part of the multiple measurement locations are at least spaced in a second direction that is substantially parallel to the surface of the substrate and perpendicular to the first direction.
摘要翻译：本发明提供了一种水平传感器，其被配置为确定支撑在可移动衬底支撑件上的衬底的表面的高度水平，所述液位传感器包括多个投影单元，多个检测单元和处理单元，以计算每个基于来自所述投影单元的测量光束的多个测量位置，其中所述液位传感器被配置为在所述基板上的多个测量位置处同时测量高度水平，其中所述基板支撑件被配置成基本上在第一方向上移动所述基板平行于衬底的表面以测量衬底上不同位置处的高度水平，并且其中多个测量位置的至少一部分在基本上平行于衬底的表面并且垂直于衬底的第二方向上至少间隔开第一个方向。

7. 发明申请

US20120242969A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20120242969A1
公开(公告)日：2012-09-27
申请号：US13414352
申请日：2012-03-07
申请人： Engelbertus Antonius Fransiscus VAN DER PASCH , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus VAN DER PASCH , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译：一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

8. 发明申请

US20140022527A1 LITHOGRAPHIC APPARATUS 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：US20140022527A1
公开(公告)日：2014-01-23
申请号：US14036991
申请日：2013-09-25
申请人： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus VAN DER PASCH , Joost Jeroen Ottens , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , William Peter Van Drent , Frank Staals , Lukasz Jerzy Macht , Erik Willem Bogaart
IPC分类号： G03F7/20
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译：一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

9. 发明授权

US08570492B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US08570492B2
公开(公告)日：2013-10-29
申请号：US13414352
申请日：2012-03-07
申请人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
发明人： Engelbertus Antonius Fransiscus Van Der Pasch , Emiel Jozef Melanie Eussen , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Frank Staals , Lukasz Jerzy Macht , William Peter Van Drent , Erik Willem Bogaart
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70716 , G03F7/70725 , G03F7/70775 , G03F7/70833 , G03F7/709
摘要： A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame.
摘要翻译：一种光刻设备，包括基板台位置测量系统和用于分别测量基板台和投影系统的位置的投影系统位置测量系统。衬底台位置测量系统包括安装在衬底台上的衬底台参考元件和第一传感器头。衬底台参考元件在基本上平行于衬底台上的衬底的保持平面的测量平面中延伸。保持平面布置在测量平面的一侧，第一传感器头布置在测量平面的相对侧。投影系统位置测量系统包括一个或多个投影系统参考元件和传感器组件。传感器头和传感器组件或相关联的投影系统测量元件安装在传感器框架上。

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