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1. 发明授权

US4440801A Method for depositing a metal layer on polyesters 失效
标题翻译：在聚酯上沉积金属层的方法
公开(公告)号：US4440801A
公开(公告)日：1984-04-03
申请号：US396922
申请日：1982-07-09
申请人： Ari Aviram , Veronica I. Mayne-Banton , Rangaswamy Srinivasan
发明人： Ari Aviram , Veronica I. Mayne-Banton , Rangaswamy Srinivasan
IPC分类号： C23C18/20 , C23C18/16 , H05K1/03 , H05K3/18 , C23C3/02
CPC分类号： H05K3/185 , C23C18/1608 , C23C18/1612 , H05K1/0326
摘要： A method for selective electroless deposition of a metal (Cu, Ni, Au, Ag) onto a polyester substrate, such as poly(ethylene terephthalate) is described. A combination of ultraviolet exposure of wavelengths
摘要翻译：描述了将金属（Cu，Ni，Au，Ag）选择性地无电沉积到聚酯基材上的方法，例如聚（对苯二甲酸乙二醇酯）。使用波长<220nm的紫外线曝光与预处理步骤的组合来获得选择性无电沉积。首先用波长<220nm的紫外线照射聚酯层，然后用碱性溶液进行预镀预处理。之后，通过常规的无电沉积沉积所需的金属。仅在那些暴露于紫外线并进行预镀处理的区域中才会发生明显的沉积。

2. 发明授权

US06348299B1 RIE etch resistant nonchemically amplified resist composition and use thereof 失效
标题翻译： RIE蚀刻抗化学放大抗蚀剂组合物及其用途
公开(公告)号：US06348299B1
公开(公告)日：2002-02-19
申请号：US09351428
申请日：1999-07-12
申请人： Ari Aviram , Inna V. Babich
发明人： Ari Aviram , Inna V. Babich
IPC分类号： G03C516
CPC分类号： G03F7/039 , G03F7/0042
摘要： Photoresist compositions of improved reactive ion etching comprising polymers of 2-hydroxyalkyl methacrylate and/or 2-hydroxyalkylacrylate and a titanate, zirconate and/or hafnate are provided. The photoresist compositions are used for forming positive lithographic patterns.
摘要翻译：提供了包括2-羟烷基甲基丙烯酸酯和/或2-羟基烷基丙烯酸酯和钛酸酯，锆酸酯和/或铪酸盐的聚合物的改进的反应离子蚀刻的光致抗蚀剂组合物。光致抗蚀剂组合物用于形成正的光刻图案。

3. 发明授权

US06197896B1 Graft polymers and use thereof 失效
标题翻译：接枝聚合物及其用途
公开(公告)号：US06197896B1
公开(公告)日：2001-03-06
申请号：US09351421
申请日：1999-07-12
申请人： Ari Aviram , Inna V. Babich
发明人： Ari Aviram , Inna V. Babich
IPC分类号： C08F842
CPC分类号： C08F8/42
摘要： Solutions of graft polymers of a polymer having reactive hydrogen groups and grafted through reactive hydrogen groups an alkoxy metallic compound wherein the metal is titanium, zirconium and/or hafnium are useful as photoresist materials which are resistant to plasma. Also, compounds and graft polymers wherein the alkoxy metallic compound also contains silicon, tin or germanium are provided.
摘要翻译：具有反应性氢基并通过反应性氢基接枝的聚合物的接枝聚合物的溶液是烷氧基金属化合物，其中金属是钛，锆和/或铪可用作耐等离子体的光致抗蚀剂材料。此外，提供了其中烷氧基金属化合物还含有硅，锡或锗的化合物和接枝聚合物。

4. 发明授权

US6100011A High sensitivity, photo-active polymer and developers for high resolution resist applications 失效
标题翻译：高灵敏度，光敏聚合物和显影剂，用于高分辨率抗蚀剂应用
公开(公告)号：US6100011A
公开(公告)日：2000-08-08
申请号：US179423
申请日：1998-10-27
申请人： Ari Aviram , Andrew T. S. Pomerene , David Earle Seeger
发明人： Ari Aviram , Andrew T. S. Pomerene , David Earle Seeger
IPC分类号： G03F7/039 , G03F7/32 , G03F7/38
CPC分类号： G03F7/38 , G03F7/039 , G03F7/322 , Y10S430/168
摘要： Positive lithographic patterns are produced by imagewise exposing to actinic light, x-ray or e-beam a polymer having pendant recurring groups selected from the group consisting of--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.x --H wherein x is 0-20;--COO--CH.sub.2 --CH(OH)--(CH.sub.2).sub.y --HE--(CH.sub.2).sub.z --H; and mixtures thereof; wherein HE is O or S; and each y and z individually is 1-18; and mixtures thereof; and then developing the polymer in an aqueous base developer. The developer can be any of the conventional or commonly used ones as well as the special developers discussed below.Positive lithographic patterns are also produced by imagewise exposing to actinic light, x-ray or e-beam a photosensitive polymeric material to provide free carboxylic acid groups; and then developing by contacting with an aqueous developer solution of about 0.001% to about 1% by weight of a compound containing at least one amino group and at least two sulfonate groups selected from the group consisting of alkali metal sulfonate group, ammonium sulfate group, and mixtures thereof; or developing by contacting with an amine in vapor form and contacting with an aqueous solvent.
摘要翻译：通过成像曝光于光化光，X射线或电子束来形成正极光刻图案，该聚合物具有选自-COO-CH 2 -CH（OH） - （CH 2）x H的侧基重复基团，其中x为0- 20; -COO-CH 2 -CH（OH） - （CH 2）y-HE-（CH 2）z -H; 及其混合物; 其中HE为O或S; 每个y和z分别为1-18; 及其混合物; 然后在含水碱性显影剂中显影聚合物。开发人员可以是常规或常用的任何开发者以及下面讨论的特殊开发者。通过成像暴露于光化光，X射线或电子束光敏聚合物材料以提供游离羧酸基团也产生正光刻图案。然后通过与含有至少一个氨基的化合物和至少两个选自碱金属磺酸盐基团，硫酸铵基团，硫酸铵基团，及其混合物; 或通过与蒸气形式的胺接触并与水性溶剂接触来显影。

5. 发明授权

US4692044A Interface resistance and knee voltage enhancement in resistive ribbon printing 失效
标题翻译：电阻丝带打印中的接口电阻和拐点电压增强
公开(公告)号：US4692044A
公开(公告)日：1987-09-08
申请号：US728996
申请日：1985-04-30
申请人： Ari Aviram , Kwang K. Shih
发明人： Ari Aviram , Kwang K. Shih
IPC分类号： B41J31/00 , B41J31/02 , B41J31/05 , B41M5/24 , B41M5/26 , B41M5/382 , B41M5/40 , B41M5/41
CPC分类号： B41M5/3825 , Y10S428/913 , Y10S428/914
摘要： An improved resistive ribbon for thermal transfer printing is provided, where the ribbon includes a resistive layer, a metal current-return layer, a fusible ink layer, and an electric interface layer located between the resistive layer and the metal layer. The electrical interface layer is sufficiently thin so as not to impair the required mechanical properties of the ribbon (such as flexibility, stability, durability, etc.), and has as its primary function the enhancement of the electrical porperties of the ribbon. Specifically, interface resistance and/or knee voltage of the current-voltage characteristics of the ribbon are enhanced by the electrical interface layer.Preferred compositions of the interface layer include alkylalkoxy silanes of a specific formula, and especially nonsymmetrical compounds of that formula.
摘要翻译：提供了一种用于热转印的改进的电阻带，其中带包括电阻层，金属电流返回层，易熔油墨层和位于电阻层和金属层之间的电接口层。电接口层足够薄，以免损坏带的所需机械性能（例如柔性，稳定性，耐久性等），并且作为其主要功能是增强带的电气性。具体地，通过电接口层增强了带的电流 - 电压特性的界面电阻和/或拐点电压。界面层的优选组成包括具体化学式的烷基烷氧基硅烷，特别是该式的非对称化合物。

6. 发明授权

US4609926A Ribbon transfer color-on-demand resistive ribbon printing 失效
标题翻译：色带转印彩色电阻色带打印
公开(公告)号：US4609926A
公开(公告)日：1986-09-02
申请号：US728713
申请日：1985-04-30
申请人： Ari Aviram , Derek B. Dove
发明人： Ari Aviram , Derek B. Dove
IPC分类号： B41J2/325 , B41J2/32 , B41J2/42 , B41J31/00 , B41J31/14 , B41J31/16 , B41J35/16 , B41M5/24 , B41M5/26 , B41M5/34 , B41M5/382 , G01D15/10
CPC分类号： B41M5/3825
摘要： An improved technique and apparatus for color-on-demand resistive ribbon printing is provided in which selected colored ink layers are transferred to a resistive printing ribbon from a color-bearing ribbon, prior to resistive ribbon printing. The color ribbon and the resistive printing ribbon both contain ink layers, the only difference being that the ink layer in the printing ribbon is preferrably uncolored. When the ink layers on the two ribbons are brought into contact with one another and heated, the ink layers will become tacky and will adhere to one another. The temperatures of these ink layers are then reduced and the printing ribbon and the color ribbon are separated from one another to cause the colored ink layer on the color ribbon to separate from that ribbon and adhere to the printing ribbon, thus causing a transfer of the colored ink layer to the printing ribbon. After this, the resistive printing ribbon can be used to print colors.
摘要翻译：提供了一种改进的彩色按需电阻色带打印技术和设备，其中在电阻色带打印之前，所选择的彩色油墨层从着色色带转印到电阻印刷色带。色带和电阻印刷色带都含有油墨层，唯一的区别在于，优选的是未着色的印刷色带中的油墨层。当两个带上的油墨层彼此接触并加热时，油墨层将变粘并且彼此粘附。然后，这些油墨层的温度降低，并且打印色带和色带彼此分离，使得色带上的着色油墨层与该色带分离并粘附到印刷色带上，从而导致转印彩色油墨层到打印色带。之后，电阻式打印色带可用于打印颜色。

7. 发明授权

US4491432A Chemical heat amplification in thermal transfer printing 失效
标题翻译：热转印中的化学热放大
公开(公告)号：US4491432A
公开(公告)日：1985-01-01
申请号：US454814
申请日：1982-12-30
申请人： Ari Aviram , Kwang K. Shih
发明人： Ari Aviram , Kwang K. Shih
IPC分类号： B41M5/392 , B41J31/00 , B41J31/02 , B41M5/26 , B41M5/382
CPC分类号： B41M5/392 , Y10S428/913 , Y10S428/914
摘要： Chemical heat amplification is provided in thermal transfer printing, wherein some of the heat necessary for melting and transferring ink from a solid fusible layer in a ribbon to a receiving medium is provided by an exothermic reaction. This chemical reaction is due to an exothermic material that is located in the ink layer, or in another layer of the ink bearing ribbon. The exothermic reaction reduces the amount of the input power which must be applied either electrically or with electromagnetic waves. Examples of suitable exothermic materials are those which will provide heat within the operative temperature range of the ink, and include nonaromatic azo compounds, peroxides, and strained valence compounds, such as monomers, dimers, trimers, of the type which change their chemical bonding when they decompose to either a valence isomer or break into a number of molecular species.
摘要翻译：在热转印中提供化学热放大，其中通过放热反应提供熔融和将油墨从带中的固体可熔层转移到接收介质所需的一些热。这种化学反应是由于位于油墨层中的放热材料或油墨支承带的另一层。放热反应减少必须通过电气或电磁波施加的输入功率的量。合适的放热材料的实例是在油墨的工作温度范围内提供热量的那些，并且包括非芳族偶氮化合物，过氧化物和应变化合价化合物，例如改变其化学键合的类型的单体，二聚体，三聚体，它们分解成价态异构体或分解成许多分子物质。

8. 发明授权

US06989290B2 Electrical contacts for molecular electronic transistors 有权
标题翻译：分子电子晶体管的电触点
公开(公告)号：US06989290B2
公开(公告)日：2006-01-24
申请号：US10714083
申请日：2003-11-15
申请人： Ari Aviram
发明人： Ari Aviram
IPC分类号： H01L51/40
CPC分类号： H01L51/0051 , B82Y10/00 , H01L51/0021 , H01L51/0036 , H01L51/0508 , H01L51/0595 , Y10S977/936
摘要： Electronic circuits based on molecular transistors, generally used in place of semiconductors. More particularly, the invention relates to a unique method of wiring of a three-terminal molecule (or an aggregate thereof) to serve as an electronic transistor, containing a gate electrode, a source electrode, and a drain electrode. The source electrode and drain electrode are fabricated from one metal and the gate electrode is fabricated from another metal. The usage of molecular properties in this context provides significant advantages over the fabrication methods of the prior art.
摘要翻译：基于分子晶体管的电子电路，通常用于代替半导体。更具体地说，本发明涉及一种三端分子（或其聚集体）布线的独特方法，以用作含有栅电极，源电极和漏电极的电子晶体管。源电极和漏极由一个金属制成，栅极由另一个金属制成。在这种情况下，分子性质的使用提供了优于现有技术的制造方法的显着优点。

9. 发明授权

US06653045B2 Radiation sensitive silicon-containing negative resists and use thereof 有权
标题翻译：辐射敏感含硅负极抗蚀剂及其用途
公开(公告)号：US06653045B2
公开(公告)日：2003-11-25
申请号：US09785609
申请日：2001-02-16
申请人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0045 , Y10S430/106
摘要： A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
摘要翻译：负性抗蚀剂组合物，其包含：（a）具有选自稠合脂族部分，稠环稠合芳族部分和杂环稠合芳族化合物的侧链稠合部分和与交联剂反应的位点的含硅聚合物，（b）酸敏感性交联剂，和（c）辐射敏感性酸发生剂。抗蚀剂组合物用于在基材中形成图案化的材料层。

10. 发明授权

US06503692B2 Antireflective silicon-containing compositions as hardmask layer 有权
公开(公告)号：US06503692B2
公开(公告)日：2003-01-07
申请号：US10165582
申请日：2002-06-07
申请人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
IPC分类号： G03F700
CPC分类号： C08G77/20 , C08G77/38 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.

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