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1. 发明授权

US11056277B2 Magnetized substrate carrier apparatus with shadow mask for deposition 有权
公开(公告)号：US11056277B2
公开(公告)日：2021-07-06
申请号：US16289328
申请日：2019-02-28
申请人： APPLIED MATERIALS, INC.
发明人： Daniel Lee Diehl , Alexander Lerner , Roey Shaviv
IPC分类号： H01F41/34 , C23C14/04 , H01F41/18 , B32B3/00
摘要： Methods and apparatus for a magnetized substrate carrier apparatus are described herein. In some embodiments, a substrate carrier apparatus includes: a carrier plate having a support surface to support a substrate, a mask assembly disposed above the support surface, wherein the mask assembly includes an annular frame and a shadow mask disposed within the annular frame, and wherein the shadow mask includes one or more openings arranged in a predetermined pattern and disposed through the shadow mask, and one or more magnets disposed on or embedded within at least one of the carrier plate and the shadow mask to create a magnetic field above the support surface.

2. 发明授权

US11047039B2 Substrate carrier having hard mask 有权
公开(公告)号：US11047039B2
公开(公告)日：2021-06-29
申请号：US16232496
申请日：2018-12-26
申请人： APPLIED MATERIALS, INC.
发明人： Alexander Lerner , Kim Vellore , Ami Sade , Steven Sansoni , Andrew Constant , Kevin Moraes , Roey Shaviv , Niranjan Kumar , Jeffrey Brodine , Michael Karazim
IPC分类号： C23C14/50 , C23C14/04 , C23C14/24
摘要： Substrate carrier apparatus having a hard mask are disclosed herein. In some embodiments, a substrate carrier apparatus includes a carrier body having a support surface to support a substrate; and a mask assembly disposed above the support surface. The mask assembly includes an annular frame disposed atop the support surface; and a hard mask coupled to and disposed within the annular frame above the support surface, wherein the hard mask includes one or more openings arranged in a predetermined pattern and disposed through the hard mask, and wherein the hard mask includes a plurality of spacer elements extending from a bottom surface of the hard mask.

3. 发明授权

US08698049B2 Rapid thermal processing lamphead with improved cooling 有权
标题翻译：快速热处理灯头具有改进的冷却
公开(公告)号：US08698049B2
公开(公告)日：2014-04-15
申请号：US13657935
申请日：2012-10-23
申请人： Applied Materials, Inc.
发明人： Joseph M. Ranish , Khurshed Sorabji , Kedarnath Sangam , Alexander Lerner
IPC分类号： A21B1/00 , F21V29/00
CPC分类号： F27B17/0025 , F27D5/0037 , F27D21/0014 , H01L21/67109 , H01L21/67115
摘要： Embodiments of a lamphead and apparatus utilizing same are provided. In some embodiments, a lamphead for thermal processing may include a monolithic member having a plurality of coolant passages and a plurality of lamp passages and reflector cavities, wherein each lamp passage is configured to accommodate a lamp and each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for the lamp, and wherein the plurality of coolant passages are disposed proximate to the plurality of lamp passages; and at least one heat transfer member extending from the monolithic member into each coolant passage, wherein the at least one heat transfer member extends into each coolant passage up to the full height of each coolant passage. The lamphead may be disposed in an apparatus comprising a process chamber having a substrate support, wherein the lamphead is positioned to provide energy to the substrate support.
摘要翻译：提供了一种灯头和利用其的装置的实施例。在一些实施例中，用于热处理的灯头可以包括具有多个冷却剂通道和多个灯通道和反射器腔的整体构件，其中每个灯通道被配置为容纳灯，并且每个反射器腔被成形为充当反射器或接收用于灯的可替换反射器，并且其中所述多个冷却剂通道设置成靠近所述多个灯通道; 以及至少一个传热构件，其从所述整体构件延伸到每个冷却剂通道中，其中所述至少一个传热构件延伸到每个冷却剂通道中直到每个冷却剂通道的全高度。灯头可以设置在包括具有基板支撑件的处理室的设备中，其中灯头被定位成向基板支撑件提供能量。

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