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1. 发明授权

US06858359B2 Thermally sensitive, multilayer imageable element 失效
标题翻译：热敏多层可成像元件
公开(公告)号：US06858359B2
公开(公告)日：2005-02-22
申请号：US10264814
申请日：2002-10-04
申请人： Anthony P. Kitson , Kevin B. Ray , Eugene L. Sheriff
发明人： Anthony P. Kitson , Kevin B. Ray , Eugene L. Sheriff
IPC分类号： B41C1/10 , G03C1/52 , G03F7/004 , G03F7/021 , G03F7/26 , G03F7/30
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03C1/49863
摘要： Multi-layer, positive working, thermally sensitive imageable elements, useful as lithographic printing plate precursors, are disclosed. The elements comprises a substrate, an underlayer over the substrate, and a top layer over the underlayer. The top layer comprises polymeric material, which is a solvent soluble novolac resin or a derivative thereof. The polymeric material is a (a) novolac that has a weight average molecular weight of at least 10,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; (b) a solvent soluble m-cresol/p-cresol novolac resins that comprises at least 10 mol % p-cresol and has a weight average molecular weight of at least 8,000, a derivative thereof functionalized with polar groups, or a derivative thereof functionalized with quadruple hydrogen bonding entities; or (c) a mixture thereof. The imageable elements have increased scuff resistance and are thus less susceptible to damage during handling.
摘要翻译：公开了用作平版印刷版前体的多层，正性，热敏成像元件。元件包括衬底，衬底上的底层以及衬底上的顶层。顶层包括聚合物材料，其是溶剂可溶性酚醛清漆树脂或其衍生物。聚合物材料是重均分子量为至少10,000的（a）酚醛清漆，用极性基团官能化的衍生物或其用四氢键合实体官能化的衍生物; （b）溶剂可溶的间甲酚/对甲酚酚醛清漆树脂，其包含至少10摩尔％的对甲酚并且具有至少8,000的重均分子量，用极性基团官能化的衍生物或其官能化衍生物具有四氢氢键实体; 或（c）它们的混合物。可成像元件具有增加的抗磨损性，因此在处理期间不易受到损坏。

2. 发明授权

US07160653B1 Multilayer imageable element containing epoxy resin 有权
标题翻译：含有环氧树脂的多层可成像元件
公开(公告)号：US07160653B1
公开(公告)日：2007-01-09
申请号：US11257864
申请日：2005-10-25
申请人： Jianbing Huang , Shashikant Saraiya , Kevin B. Ray , Anthony P. Kitson , Eugene L. Sheriff , Andrew Krebs
发明人： Jianbing Huang , Shashikant Saraiya , Kevin B. Ray , Anthony P. Kitson , Eugene L. Sheriff , Andrew Krebs
IPC分类号： G03F7/11 , G03F7/14 , G03F7/038
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/368 , Y10S430/106 , Y10S430/111 , Y10S430/165
摘要： A positive-working imageable element comprises inner and outer layers and a radiation absorbing compound such as an IR absorbing dye. The inner layer includes a polymeric material that is removable using an alkaline developer. An ink receptive outer layer is not removable using an alkaline developer before its exposure to imaging radiation. The outer layer includes a polymer binder having pendant epoxy groups that are substantially unreacted during exposure.
摘要翻译：正面工作的可成像元件包括内层和外层以及辐射吸收化合物，例如IR吸收染料。内层包括使用碱性显影剂可去除的聚合物材料。在曝光成像辐射之前，使用碱性显影剂不能除去油墨接收外层。外层包括在曝光期间基本上未反应的侧链环氧基的聚合物粘合剂。

3. 发明授权

US07060415B2 Printing plate precursor comprising solvent-resistant copolymer 失效
标题翻译：包含耐溶剂共聚物的印版前体
公开(公告)号：US07060415B2
公开(公告)日：2006-06-13
申请号：US11130797
申请日：2005-05-17
申请人： Anthony P. Kitson , Kevin B. Ray , Joanne Ray , Mathias Jarek , Celin Savariar-Hauck
发明人： Anthony P. Kitson , Kevin B. Ray , Joanne Ray , Mathias Jarek , Celin Savariar-Hauck
IPC分类号： G03F7/039 , G03F7/11 , G03F7/14 , G03F7/30
CPC分类号： B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/111 , Y10S430/165
摘要： The present invention provides a positive-working, thermally imageable element generally comprising a multi-layered imageable coating. The invention provides an imageable element comprising a substrate, an ink-receptive top layer, and an underlayer, the underlayer including a specific copolymer described herein. The copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a monomer comprising an N-substituted maleimide; c) a (meth)acrylamide or (meth)acrylate monomer; and d) a (meth)acrylic acid or vinyl benzoic acid monomer. In another embodiment, the copolymer can be a polymer comprising constitutional units derived from: a) a monomer having a cyclic urea group; b) a (meth)acrylic acid or vinyl benzoic acid monomer; c) and a (meth)acrylonitrile monomer. The imageable element may be used to prepare a lithographic printing plate that is resistant to press chemistry and can optionally be baked to increase press runlength.
摘要翻译：本发明提供了通常包括多层可成像涂层的正性加工的可热成像元件。本发明提供了一种可成像元件，其包括基底，油墨接受顶层和底层，底层包括本文所述的特定共聚物。共聚物可以是包含衍生自以下的结构单元的聚合物：a）具有环状脲基团的单体; b）包含N-取代的马来酰亚胺的单体; c）（甲基）丙烯酰胺或（甲基）丙烯酸酯单体; 和d）（甲基）丙烯酸或乙烯基苯甲酸单体。在另一个实施方案中，共聚物可以是包含衍生自以下的结构单元的聚合物：a）具有环状脲基团的单体; b）（甲基）丙烯酸或乙烯基苯甲酸单体; c）和（甲基）丙烯腈单体。可成像元件可以用于制备耐压制化学的平版印刷版，并且可以任选地烘烤以增加压制长度。

4. 发明申请

US20090186301A1 METHOD OF MAKING LITHOGRAPHIC PRINTING PLATES 有权
标题翻译：制作平版印刷版的方法
公开(公告)号：US20090186301A1
公开(公告)日：2009-07-23
申请号：US12017408
申请日：2008-01-22
申请人： Kevin B. Ray , Anthony P. Kitson
发明人： Kevin B. Ray , Anthony P. Kitson
IPC分类号： G03F7/26
CPC分类号： G03F7/322 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/10 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A multi-layer, positive-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution that has a pH greater than 6 and up to about 11. This single processing solution both develops the imaged precursor and provides a protective coating that need not be rinsed off before lithographic printing.
摘要翻译：可以使用红外辐射成像多层正性平版印刷版原版，并使用pH大于6且高达约11的单一处理溶液在单一步骤中进行处理。该单一处理溶液既可以显影并提供在平版印刷之前不需要冲洗掉的保护涂层。

5. 发明授权

US07291440B2 Bakeable multi-layer imageable element 失效
标题翻译：可烘烤多层可成像元件
公开(公告)号：US07291440B2
公开(公告)日：2007-11-06
申请号：US11129844
申请日：2005-05-16
申请人： Kevin B. Ray , Anthony P. Kitson
发明人： Kevin B. Ray , Anthony P. Kitson
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： B41C1/1016 , B41C2201/04 , B41C2201/14 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146
摘要： Thermally imageable multilayer imageable elements useful as lithographic printing plate precursors that have good solvent resistance are disclosed. The underlayer of the imageable element comprises an acidic copolymer that comprises, in polymerized form, about 10 mol % to about 75 mol % of one or more monomers of the formula: CH2═CH(R1)-Z-X—NH—CO—NH—C6H3—(R2)(CO2H); in which: R1 is H or CH3; R2 is H or OH; Z is —C6H4— or —C(O) —Y—; Y is —O— or —NH—; and X is selected from —C(CH3)2—, —CH(CH3)— and —(CH2)n—, in which n is an integer from 1 to 12.
摘要翻译：公开了可用于具有良好耐溶剂性的平版印刷版前体的可热成像的多层可成像元件。可成像元件的底层包含酸性共聚物，其以聚合形式包含约10mol％至约75mol％的一种或多种下式的单体：<β在线配方描述=“在线配方” 末端=“铅”→CH 2 -CH（R 1） - ZX-NH-CO-NH-C 6 H

6. 发明授权

US08936902B2 Positive-working imageable elements and method of use 有权
标题翻译：积极的可成像元素和使用方法
公开(公告)号：US08936902B2
公开(公告)日：2015-01-20
申请号：US12274488
申请日：2008-11-20
申请人： Anthony P. Kitson , Kevin B. Ray , Shashikant Saraiya , Frederic E. Mikell , Jayanti Patel
发明人： Anthony P. Kitson , Kevin B. Ray , Shashikant Saraiya , Frederic E. Mikell , Jayanti Patel
IPC分类号： G03F7/00 , G03F7/26 , B41C1/10
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266
摘要： An infrared radiation-sensitive positive-working imageable element has a substrate and single imageable layer that includes a first polymeric binder having urethane or urea moieties in its backbone. The first polymeric binder is also insoluble in water and soluble in a weakly alkaline solution. This imageable element can be imaged and processed using weakly alkaline processing solutions that are free of silicates and metasilicates, which processing solutions may also be used to “gum” the imaged and developed printing surface.
摘要翻译：红外辐射敏感的正性可成像元件具有基底和单一可成像层，其包含在其主链中具有氨基甲酸酯或脲部分的第一聚合物粘合剂。第一聚合物粘合剂也不溶于水并溶于弱碱性溶液。该可成像元件可以使用不含硅酸盐和偏硅酸盐的弱碱性处理溶液进行成像和处理，该处理溶液也可以用于“胶合”成像和显影的印刷表面。

7. 发明申请

US20100124721A1 POSITIVE-WORKING IMAGEABLE ELEMENTS AND METHOD OF USE 有权
标题翻译：积极成像的成像元件和使用方法
公开(公告)号：US20100124721A1
公开(公告)日：2010-05-20
申请号：US12274488
申请日：2008-11-20
申请人： Anthony P. Kitson , Kevin B. Ray , Shashikant Saraiya , Frederic E. Mikell , Jayanti Patel
发明人： Anthony P. Kitson , Kevin B. Ray , Shashikant Saraiya , Frederic E. Mikell , Jayanti Patel
IPC分类号： G03F7/027 , G03F7/004 , G03F7/20
CPC分类号： B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41C2210/266
摘要： An infrared radiation-sensitive positive-working imageable element has a substrate and single imageable layer that includes a first polymeric binder having urethane or urea moieties in its backbone. The first polymeric binder is also insoluble in water and soluble in a weakly alkaline solution. This imageable element can be imaged and processed using weakly alkaline processing solutions that are free of silicates and metasilicates, which processing solutions may also be used to “gum” the imaged and developed printing surface.
摘要翻译：红外辐射敏感的正性可成像元件具有基底和单一可成像层，其包含在其主链中具有氨基甲酸酯或脲部分的第一聚合物粘合剂。第一聚合物粘合剂也不溶于水并溶于弱碱性溶液。该可成像元件可以使用不含硅酸盐和偏硅酸盐的弱碱性处理溶液进行成像和处理，该处理溶液也可以用于“胶合”成像和显影的印刷表面。

8. 发明授权

US07186482B2 Multilayer imageable elements 有权
标题翻译：多层可成像元件
公开(公告)号：US07186482B2
公开(公告)日：2007-03-06
申请号：US11144315
申请日：2005-06-03
申请人： Anthony P. Kitson , Kevin B. Ray , Socrates P. Pappas , Celin Savariar-Hauck
发明人： Anthony P. Kitson , Kevin B. Ray , Socrates P. Pappas , Celin Savariar-Hauck
IPC分类号： G03F7/039 , G03F7/11 , G03F7/14 , G03F7/30
CPC分类号： B41M5/368 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , B41M5/42 , B41M5/44 , B41M5/46 , B41M5/465 , B41M2205/38 , Y10S430/165
摘要： Multilayer, positive working, thermally imageable, bakeable imageable elements have a substrate, an underlayer, and a top layer. The underlayer comprises a polymeric material that comprises, in polymerized form from about 5 mol % to about 30 mol % of recurring units derived from an ethylenically unsaturated polymerizable monomer having a carboxy group; from about 20 mol % to about 75 mol % of recurring units derived from N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; and from about 3 mol % to about 50 mol % of recurring units derived from a compound represented by the formula: CH2═C(R2)—C(O)—NH—CH2—OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is hydrogen or methyl. Other materials, such as a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, may be present in the underlayer. The elements can be used to produce bakeable lithographic printing plates that are resistant to press chemistries.
摘要翻译：多层，正面工作，可热成像的可烘烤成像元件具有基底，底层和顶层。底层包含聚合物，其聚合形式为约5mol％至约30mol％的衍生自具有羧基的烯属不饱和可聚合单体的重复单元; 约20mol％至约75mol％的衍生自N-苯基马来酰亚胺，N-环己基马来酰亚胺，N-苄基马来酰亚胺或其混合物的重复单元; 和约3mol％至约50mol％的由下式表示的化合物的重复单元：<？in-line-formula description =“In-line formula”end =“lead”？> CH 2 -C（R 2） - C（O）-NH-CH 2 -OR 1，＆lt; -formulae description =“In-line Formulas”end =“tail”？>其中R 1是C 1至C 12烷基的C 1〜苯基，C 1至C 12取代的苯基，C 1至C 12芳烷基，或Si（CH 3） 3> 3 3; R 2是氢或甲基。其它材料，例如具有活性羟甲基和/或活化的烷基化羟甲基的树脂或树脂，例如甲阶酚醛树脂，可存在于底层中。这些元素可用于生产耐压印化学品的可烘烤平版印刷版。

9. 发明授权

US06218083B1 Pattern-forming methods 有权
标题翻译：图案形成方法
公开(公告)号：US06218083B1
公开(公告)日：2001-04-17
申请号：US09263605
申请日：1999-03-05
申请人： Christopher D. McCullough , Kevin B. Ray , Alan S. Monk , Stuart Bayes , Anthony P. Kitson
发明人： Christopher D. McCullough , Kevin B. Ray , Alan S. Monk , Stuart Bayes , Anthony P. Kitson
IPC分类号： G03F730
CPC分类号： G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method for producing a predetermined resist pattern on e.g. a lithographic printing plate, circuit board or mask comprises the imagewise exposure of a radiation sensitive diazide-containing coating (conventionally considered as a UV sensitive material), to non-UV radiation, such as direct heat radiation or infra-red radiation. A positive of the exposed image is revealed on development. Additionally, it has been found that a flood exposure to UV radiation after the imagewise exposure to the non-UV radiation means that a negative of the exposed image is revealed, on development.
摘要翻译：一种制备例如预定抗蚀剂图案的方法。平版印刷版，电路板或掩模包括将辐射敏感的含二氮化物的涂层（通常被认为是UV敏感材料）成像曝光于非UV辐射，例如直接热辐射或红外辐射。曝光图像的积极性在开发中被揭示。此外，已经发现在成像曝光到非UV辐射之后的紫外线辐射的泛滥暴露意味着在显影时显露出曝光图像的负面。

10. 发明授权

US08323874B2 Method of making lithographic printing plates 有权
标题翻译：平版印刷版的制作方法
公开(公告)号：US08323874B2
公开(公告)日：2012-12-04
申请号：US12017408
申请日：2008-01-22
申请人： Kevin B. Ray , Anthony P. Kitson
发明人： Kevin B. Ray , Anthony P. Kitson
IPC分类号： G03F7/00 , G03F7/26 , B41F7/00
CPC分类号： G03F7/322 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/10 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262
摘要： A multi-layer, positive-working lithographic printing plate precursor can be imaged with infrared radiation and processed in a single step using a single processing solution that has a pH greater than 6 and up to about 11. This single processing solution both develops the imaged precursor and provides a protective coating that need not be rinsed off before lithographic printing.
摘要翻译：可以使用红外辐射成像多层正性平版印刷版原版，并使用pH大于6且高达约11的单一处理溶液在单一步骤中进行处理。该单一处理溶液既可以显影并提供在平版印刷之前不需要冲洗掉的保护涂层。

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