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1. 发明授权

US6105518A Durable plasma treatment apparatus and method 失效
标题翻译：耐久等离子体处理装置及方法
公开(公告)号：US6105518A
公开(公告)日：2000-08-22
申请号：US885720
申请日：1997-06-30
申请人： Anthony E. Robson , Ronald A. Rudder , Robert C. Hendry , Moses M. David , James V. Burt
发明人： Anthony E. Robson , Ronald A. Rudder , Robert C. Hendry , Moses M. David , James V. Burt
IPC分类号： H05H1/46 , C23C8/36 , C23C16/27 , C23C16/50 , C23C16/507 , C30B29/04 , H01J37/32 , H01L21/31 , H05H1/00
CPC分类号： C23C16/272 , C23C16/277 , C23C16/507 , C23C8/36 , H01J37/321 , H01J37/32458 , H01J37/32522
摘要： A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewalls transverse to the longitudinal axis, and wherein the chamber is sealed to allow pressure inside the chamber to be controlled. Also provided is an axially-extending array of current-carrying conductors which at least partially encircle the chamber, are transverse to the longitudinal axis, and establish a magnetic field parallel to the longitudinal axis of the chamber, and a power supply connected to the conductor array and adapted to provide high-frequency current in the conductors to magnetically induce ionization of the gaseous material in the chamber and form a plasma sheath that surrounds and extends along the longitudinal axis and conforms to the sidewalls of the chamber, and wherein the work surface is exposed to the plasma sheath and extends in the direction of the longitudinal axis.
摘要翻译：一种用于处理工作表面的方法和设备，其中设置有具有纵向轴线和纵向延伸的导电侧壁的室，至少一个侧壁具有至少一个纵向延伸的间隙，其中断通过横向于纵向的侧壁的电流路径轴，并且其中所述室被密封以允许控制所述室内的压力。还提供了轴向延伸的载流导体阵列，其至少部分地环绕腔室，横向于纵向轴线，并且建立平行于腔室的纵向轴线的磁场，以及连接到导体的电源阵列并且适于在导体中提供高频电流以磁性地诱导腔室中的气态材料的电离，并形成等离子体护套，其围绕并沿着纵向轴线延伸并且与腔的侧壁一致并且其中工作表面暴露于等离子体护套并沿着纵向轴线的方向延伸。

2. 发明授权

US5874014A Durable plasma treatment apparatus and method 失效
公开(公告)号：US5874014A
公开(公告)日：1999-02-23
申请号：US483982
申请日：1995-06-07
申请人： Anthony E. Robson , Ronald A. Rudder , Robert C. Hendry , Moses M. David , James V. Burt
发明人： Anthony E. Robson , Ronald A. Rudder , Robert C. Hendry , Moses M. David , James V. Burt
IPC分类号： H05H1/46 , C23C8/36 , C23C16/27 , C23C16/50 , C23C16/507 , C30B29/04 , H01J37/32 , H01L21/31 , H05H1/00
CPC分类号： C23C16/272 , C23C16/277 , C23C16/507 , C23C8/36 , H01J37/321 , H01J37/32458 , H01J37/32522
摘要： A method and apparatus for treating a work surface, wherein there is provided a chamber having a longitudinal axis and longitudinally extending electrically conductive sidewalls, at least one sidewall having at least one longitudinally extending gap that interrupts a current path through the sidewalls transverse to the longitudinal axis, and wherein the chamber is sealed to allow pressure inside the chamber to be controlled. Also provided is an axially-extending array of current-carrying conductors which at least partially encircle the chamber, are transverse to the longitudinal axis, and establish a magnetic field parallel to the longitudinal axis of the chamber, and a power supply connected to the conductor array and adapted to provide high-frequency current in the conductors to magnetically induce ionization of the gaseous material in the chamber and form a plasma sheath that surrounds and extends along the longitudinal axis and conforms to the sidewalls of the chamber, and wherein the work surface is exposed to the plasma sheath and extends in the direction of the longitudinal axis.

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