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    • 2. 发明申请
    • Planar circuit optimization
    • 平面电路优化
    • US20050031968A1
    • 2005-02-10
    • US10736295
    • 2003-12-15
    • Barthelemy FondeurAnca SalaRobert BrainardDavid NakamotoTom TruongSanjay ThekdiAnantharaman Vaidyanathan
    • Barthelemy FondeurAnca SalaRobert BrainardDavid NakamotoTom TruongSanjay ThekdiAnantharaman Vaidyanathan
    • G03C5/00G03F1/14G03F7/20G03F9/00
    • G03F7/70466G03F1/50G03F1/70
    • The present application relates to a method of fabricating planar circuits using a photolithographic mask set, to the photolithographic mask set, and to a planar circuit fabricated with the photolithographic mask set. The instant invention involves separating a photolithographic mask into two parts, namely, a master mask and one or more slave masks. The master mask and the one or more slave masks form a photolithographic mask set that is used iteratively to fabricate the planar circuits. In particular, the master mask is used as a template to provide the general layout for the planar circuit, while each slave mask is varied to tune and/or tailor the planar circuit. Since only a small portion of the planar circuit is redesigned and/or rewritten as a new mask (i.e., the slave mask), the instant invention provides a simple and cost effective method for optimizing planar circuits. Furthermore, since most mask errors will originate from the master mask, the instant invention provides an efficient method of correcting errors on planar circuits using the one or more slave masks.
    • 本申请涉及使用光刻掩模组,光刻掩模组以及用光刻掩模组制造的平面电路来制造平面电路的方法。 本发明涉及将光刻掩模分为两部分,即主掩模和一个或多个从属掩模。 主掩模和一个或多个从属掩模形成用于迭代地制造平面电路的光刻掩模组。 特别地,主掩模用作模板以提供用于平面电路的总体布局,而每个从屏蔽被改变以调谐和/或定制平面电路。 由于只有一小部分平面电路被重新设计和/或重写为新的掩模(即,从属掩模),本发明提供了一种用于优化平面电路的简单且成本有效的方法。 此外,由于大多数掩模错误将源自主掩模,本发明提供了使用一个或多个从属掩码来校正平面电路上的误差的有效方法。
    • 5. 发明授权
    • Controlling the dispersion and passband characteristics of an arrayed waveguide grating
    • 控制阵列波导光栅的色散和通带特性
    • US06728442B2
    • 2004-04-27
    • US09965677
    • 2001-09-27
    • Mark MisseyBart FondeurAnca Sala
    • Mark MisseyBart FondeurAnca Sala
    • G02B634
    • G02B6/12016
    • A method for designing an arrayed waveguide grating that includes input and output couplers, input and output slabs, and a plurality of arms connecting the input and output slabs includes steps of determining a desired amplitude response for the arrayed waveguide grating. A desired dispersion response for the arrayed waveguide grating is determined. Input and output couplers are designed to produce the desired amplitude response. The lengths of the arms of the arrayed waveguide grating are perturbed to produce a flat or linear dispersion. In addition, the polarity of a group delay, dispersion and dispersion slope response of an arrayed waveguide grating can also be changed by adjusting Individual lengths of the waveguide arms. The group delay, dispersion and dispersion slope of a multiplexer and a demultiplexer can be matched to substantially cancel.
    • 一种用于设计包括输入和输出耦合器,输入和输出板以及连接输入和输出板的多个臂的阵列波导光栅的方法包括确定阵列波导光栅所需幅度响应的步骤。 确定阵列波导光栅所需的色散响应。 输入和输出耦合器设计用于产生所需的幅度响应。 阵列波导光栅的臂的长度被扰动以产生平坦或线性色散。 此外,阵列波导光栅的群延迟,色散和色散斜率响应的极性也可以通过调整波导臂的单独长度来改变。 可以匹配多路复用器和解复用器的组延迟,色散和色散斜率以基本上消除。